I-Hot filament CVD yeyona ndlela yakuqala kwaye idumileyo yokukhulisa idayimani kuxinzelelo oluphantsi. Ngowe-1982 uMatsumoto et al. fudumeza i-refractory filament yesinyithi ukuya ngaphezulu kwe-2000°C, apho iqondo lobushushu irhasi ye-H2 idlula kumsinga ivelisa iiathom ze-hydrogen. Ukuveliswa kwe-athom ye-hydrogen ngexesha le-hydrocarbon pyrolysis yonyuse izinga lokubekwa kweefilimu zedayimani. Idayimani ifakwa ngokukhethiweyo kwaye ukwenziwa kwegraphite kuyathintelwa, okukhokelela kumazinga okubekwa kwefilim yedayimani ngokomyalelo we-mm/h, elizinga eliphezulu kakhulu lokubekwa kweendlela eziqhele ukusetyenziswa kushishino. I-HFCVD inokwenziwa kusetyenziswa imithombo eyahlukeneyo yekhabhoni, efana ne-methane, ipropane, i-acetylene, kunye nezinye ii-hydrocarbons, kunye nezinye ii-hydrocarbons ezineoksijini, ezifana ne-acetone, i-ethanol, kunye ne-methanol. Ukongezwa kwamaqela aqulathe ioksijini kwandisa uluhlu lobushushu bokubekwa kwedayimani.
Ukongeza kwinkqubo ye-HFCVD eqhelekileyo, kukho inani lohlengahlengiso kwinkqubo ye-HFCVD. Eyona ixhaphakileyo yi-DC plasma edibeneyo kunye nenkqubo ye-HFCVD. Kule nkqubo, i-voltage ye-bias ingasetyenziswa kwi-substrate kunye ne-filament. I-bias ehlala ilungile kwi-substrate kunye ne-bias ethile engalunganga kwi-filament ibangela ukuba ii-electron zibhobhoze i-substrate, ivumela i-hydrogen yomhlaba ukuba i-desorb. Isiphumo se-desorption kukunyuka kweqondo lokubeka ifilimu yedayimane (malunga ne-10 mm / h), ubuchule olwaziwa ngokuba yi-electron-assisted HFCVD. xa i-voltage ye-bias iphezulu ngokwaneleyo ukudala ukukhutshwa kwe-plasma ezinzile, ukubola kwe-H2 kunye ne-hydrocarbons kwandisa kakhulu, ekugqibeleni kukhokelela ekunyukeni kwezinga lokukhula. Xa i-polarity ye-bias iguqulwa (i-substrate ithathwa ngokungalunganga), i-ion bombardment yenzeke kwi-substrate, ekhokelela ekwandeni kwe-diamond nucleation kwi-non-diamond substrates. Olunye uhlengahlengiso kukutshintshwa kwefilament enye eshushu enemicu eliqela eyahlukeneyo ukuze kuphunyezwe ideposition efanayo kwaye ekugqibeleni ibe yindawo enkulu yedayimani film.I-disadvantage ye-HFCVD kukuba i-thermal evaporation ye-filament inokwenza ungcoliseko kwifilimu yedayimani.
(2) iMicrowave Plasma CVD (MWCVD)
Ngeminyaka yoo-1970, izazinzulu zafumanisa ukuba ukuxinwa kwe-athom ye-hydrogen kunokunyuswa kusetyenziswa i-DC plasma. Ngenxa yoko, iplasma yaba yenye indlela yokukhuthaza ukwenziwa kweefilim zedayimani ngokubola iH2 ibe yi-athom ye-athom ye-hydrogen kunye nokuvula amaqela e-athomu esekwe kwikhabhoni. Ukongeza kwiplasma yeDC, ezinye iindidi ezimbini zeplasma nazo zifumene ingqalelo. Iplasma ye-microwave ye-CVD ine-excitation frequency ye-2.45 GHZ, kunye ne-RF plasma CVD ine-excitation frequency ye-13.56 MHz. Iiplasma ze-microwave zahlukile kuba i-microwave frequency yenza ii-electron vibrations. Xa ii-electron zingqubana ne-athomu yegesi okanye iimolekyuli, umlinganiselo ophezulu wokuqhawula uveliswa. Iplasma yeMicrowave idla ngokubhekiselwa kuyo njengombandela onee-electron "ezishushu", ii-ion "ezibandayo" kunye namasuntswana angathathi hlangothi. Ngexesha lokufakwa kwefilimu ecekethekileyo, ii-microwaves zingena kwi-plasma-ephuculweyo ye-CVD yegumbi le-synthesis ngefestile. I-plasma ye-luminescent idla ngokuba yingqukuva, kwaye ubungakanani besphere buyanda ngamandla e-microwave. Iifilimu zedayimane ezincinci zikhuliswe kwi-substrate kwikona yengingqi ye-luminescent, kwaye i-substrate ayifuni ukuba idibane ngqo nommandla we-luminescent.
–Eli nqaku likhutshwa nguumenzi womatshini wokugqumaGuangdong Zhenhua
Ixesha lokuposa: Jun-19-2024