Kupisa filament CVD ndiyo yekutanga uye yakakurumbira nzira yekukura madhaimondi nekudzika kwakadzika. 1982 Matsumoto et al. yakapisa filament yesimbi inoramba ichidarika 2000°C, apo tembiricha yeH2 gasi rinopfuura nemu filament rinoburitsa maatomu ehydrogen zviri nyore. Kugadzirwa kweatomu yehydrogen panguva yehydrocarbon pyrolysis kwakawedzera mwero wekuiswa kwemafirimu edhaimani. Dhaimondi rinoiswa zvakasarudzwa uye kuumbwa kwegraphite kunodzivirirwa, zvichikonzera kuti madhaimondi emufirimu ekuisa mareti pahurongwa hwemm/h, inova mwero wepamusoro wekuisa nzira dzinowanzo shandiswa muindasitiri. HFCVD inogona kuitwa pachishandiswa makabhoni akasiyana-siyana, akadai semethane, propane, acetylene, nemamwe mahydrocarbon, uye kunyange mamwe mahydrocarbon ane oxygen, akadai seacetone, ethanol, uye methanol. Kuwedzerwa kwemapoka ane okisijeni kunowedzera tembiricha yekuisa madhaimani.
Pamusoro peiyo yakajairika HFCVD system, kune akati wandei magadzirirwo kuHFCVD system. Iyo inonyanya kuzivikanwa ndeye yakasanganiswa DC plasma uye HFCVD system. Mune ino system, bias voltage inogona kuiswa kune substrate uye filament. A anogara akarerekera yakanaka pamusoro substrate uye kumwe kwakaipa kurerekera pamusoro filamenti kunoita kuti maerekitironi kubhomba substrate, kubvumira pamusoro wehydrogen kuti desorb. Mhedzisiro yedesorption ndeyekuwedzera kwedeposition rate yedhaimani firimu (inenge 10 mm/h), nzira inozivikanwa se electron-assisted HFCVD. apo iyo bias voltage yakakwira zvakakwana kuti igadzire kubuda kwakadzikama kweplasma, kuparara kweH2 uye mahydrocarboni kunowedzera zvakanyanya, izvo zvinozoita kuti kuwedzera kwekukura kwekukura. Kana iyo polarity yekurerekera ichidzoserwa (substrate yakashata yakarerekera), ion bombardment inoitika pane substrate, zvichiita kuti kuwedzera kwedhaimondi nucleation pane asiri madhaimani substrates. Imwe gadziriso ndeyekutsiva imwe chete inopisa filament ine akawanda akasiyana filaments kuitira kuti iwane yunifomu deposition uye pakupedzisira nzvimbo yakakura yedhaimondi film.The disadvantage yeHFCVD ndeyokuti thermal evaporation yefilament inogona kugadzira zvinosvibisa mudhaimani firimu.
(2) Microwave Plasma CVD (MWCVD)
Mumakore ekuma1970, masayendisiti akawana kuti kuwanda kweatomic hydrogen kwaigona kuwedzerwa pachishandiswa DC plasma. Nekuda kweizvozvo, plasma yakava imwe nzira yekusimudzira kuumbwa kwemafirimu edhaimondi nekuora H2 kuita atomic hydrogen uye activate carbon-based atomic mapoka. Pamusoro peDC plasma, mamwe marudzi maviri eplasma akawanawo kutariswa. Iyo microwave plasma CVD ine excitation frequency ye2.45 GHZ, uye RF plasma CVD ine excitation frequency ye13.56 MHz. microwave plasmas akasiyana mukuti microwave frequency induces maelectron vibrations. Apo maerekitironi anodhumhana nemaatomu egasi kana mamorekuru, chiyero chepamusoro chekuparadzanisa chinogadzirwa. Microwave plasma inowanzonzi nyaya ine "inopisa" maerekitironi, "inotonhora" ions uye mativi asina kwaakarerekera. Munguva yakatetepa yekuisa firimu, ma microwaves anopinda muplasma-inosimudzira CVD synthesis chamber nepahwindo. Iyo luminescent plasma inowanzoita denderedzwa muchimiro, uye saizi yedenderedzwa inowedzera nesimba remicrowave. Mafirimu edhaimani matete anokura pane substrate mukona yenzvimbo ine luminescent, uye iyo substrate haifanirwe kunge yakanangana neiyo luminescent dunhu.
-Chinyorwa ichi chakaburitswa navacuum coating machine mugadziriGuangdong Zhenhua
Nguva yekutumira: Jun-19-2024