Txais tos rau Guangdong Zhenhua Technology Co., Ltd.
ib leeg_banner

Nqus evaporation txheej txheem

Qhov chaw: Zhenhua nqus tsev
Nyeem: 10
Luam tawm: 24-09-27

Lub tshuab nqus tsev vapor deposition txheej txheem feem ntau suav nrog substrate deg tu, kev npaj ua ntej txheej, vapor deposition, loading, tom qab txheej kho, kuaj, thiab cov khoom tiav.

Cov duab 20240725085456
(1) Substrate deg tu. Nqus chamber phab ntsa, substrate thav duab thiab lwm yam roj nto, xeb, residual plating khoom yog ib qho yooj yim rau evaporate nyob rau hauv lub nqus tsev vacuum, ncaj qha cuam tshuam lub purity ntawm zaj duab xis txheej thiab lub zog sib txuas, yuav tsum tau ntxuav ua ntej plating.
(2) Kev npaj ua ntej txheej. Txheej lub tshuab nqus tsev vacuum mus rau qhov tsim nyog lub tshuab nqus tsev kawm ntawv, lub substrate thiab txheej txheej rau pretreatment. Ua kom sov lub substrate, lub hom phiaj yog kom tshem tawm cov dej noo thiab txhim khu lub hauv paus kev sib txuas ntawm lub zog. Cua sov lub substrate nyob rau hauv lub tshuab nqus tsev siab tuaj yeem desorb cov roj adsorbed rau ntawm qhov chaw ntawm lub substrate, thiab tom qab ntawd tso cov pa tawm ntawm lub tshuab nqus tsev los ntawm lub tshuab nqus tsev twj tso kua mis, uas yog qhov tsim nyog rau kev txhim kho lub nqus tsev kawm ntawv ntawm txheej txheej chamber, purity ntawm zaj duab xis txheej thiab lub zog sib txuas ntawm lub hauv paus zaj duab xis. Tom qab ncav cuag ib lub tshuab nqus tsev kawm ntawv, thawj qhov chaw evaporation nrog qis zog ntawm hluav taws xob, zaj duab xis preheating lossis pre-melting. Txhawm rau tiv thaiv evaporation mus rau lub substrate, npog cov evaporation qhov chaw thiab cov khoom siv nrog lub baffle, thiab tom qab ntawd nkag mus rau lub zog hluav taws xob ntau dua, cov khoom siv txheej txheej yog rhuab mus rau qhov kub thiab txias, evaporation thiab ces tshem tawm cov baffle.
(3) Evaporation. Ntxiv rau cov theem evaporation los xaiv qhov tsim nyog substrate kub, plating cov khoom evaporation kub sab nraum lub deposition ntawm huab cua siab kuj yog ib qho tseem ceeb parameter. Deposition ntawm cov roj siab uas yog txheej txheej chav nqus tsev vacuum, txiav txim siab qhov nruab nrab ntawm cov pa roj molecules txav mus rau hauv qhov chaw evaporation thiab ib qho evaporation nrug nyob rau hauv lub vapor thiab residual gas atoms thiab tus naj npawb ntawm kev sib tsoo ntawm cov vapor atoms.
(4) Unloading. Tom qab lub thickness ntawm cov zaj duab xis txheej kom tau raws li qhov yuav tsum tau, npog lub evaporation qhov chaw nrog ib tug baffle thiab nres cua sov, tab sis tsis tam sim ntawd coj cov huab cua, yuav tsum tau mus txuas ntxiv txias nyob rau hauv lub tshuab nqus tsev tej yam kev mob rau ib lub sij hawm kom txias, los tiv thaiv plating, residual plating khoom thiab kuj, evaporation qhov chaw thiab thiaj li nyob rau oxidized, thiab ces nres twj tso kua mis, thiab ces inflate lub tshuab nqus tsev vacuum qhib lub tshuab nqus tsev vacuum.

– Zaj lus no yog tso tawm los ntawmtshuab nqus tsev txheej tshuab manufacturersGuangdong Zhenhua


Post lub sij hawm: Sep-27-2024