Kub filament CVD yog qhov ntxov tshaj plaws thiab nrov tshaj plaws txoj kev loj hlob pob zeb diamond ntawm qis siab. 1982 Matsumoto et al. Ua kom sov lub refractory hlau filament mus tshaj 2000 ° C, ntawm qhov kub ntawm H2 roj dhau los ntawm cov filament nkag ua hydrogen atoms. Kev tsim cov atomic hydrogen thaum lub sij hawm hydrocarbon pyrolysis nce tus nqi deposition ntawm pob zeb diamond films. Pob zeb diamond yog xaiv tso thiab graphite tsim yog inhibited, ua rau pob zeb diamond zaj duab xis deposition nqi ntawm qhov kev txiav txim ntawm mm / h, uas yog ib tug heev deposition tus nqi rau cov txheej txheem uas feem ntau siv nyob rau hauv kev lag luam. HFCVD tuaj yeem ua tau siv ntau yam ntawm cov pa roj carbon monoxide, xws li methane, propane, acetylene, thiab lwm yam hydrocarbons, thiab txawm tias qee cov pa oxygen hydrocarbons, xws li acetone, ethanol, thiab methanol. Qhov sib ntxiv ntawm cov pab pawg uas muaj cov pa oxygen nthuav dav qhov kub thiab txias rau pob zeb diamond deposition.
Ntxiv nrog rau cov kab ke HFCVD raug, muaj ntau qhov kev hloov kho rau HFCVD system. Feem ntau yog kev sib xyaw DC plasma thiab HFCVD system. Nyob rau hauv cov ntaub ntawv no, ib tug bias voltage yuav siv tau rau lub substrate thiab filament. Ib qho kev tsis zoo tsis tu ncua ntawm lub substrate thiab qee qhov kev tsis zoo ntawm cov filament ua rau cov hluav taws xob tawg rau lub substrate, uas tso cai rau cov dej hydrogen desorb. Qhov tshwm sim ntawm desorption yog qhov nce ntawm qhov tso nyiaj ntawm cov pob zeb diamond zaj duab xis (txog 10 hli / h), cov txheej txheem hu ua electron-pab HFCVD. Thaum qhov kev tsis ncaj ncees voltage siab txaus los tsim kom muaj kev ruaj khov plasma tawm, qhov decomposition ntawm H2 thiab hydrocarbons nce ntau, uas thaum kawg ua rau kev loj hlob ntawm tus nqi. Thaum lub polarity ntawm qhov kev tsis ncaj ncees yog thim rov qab (substrate yog qhov tsis zoo), ion foob pob tshwm sim ntawm lub substrate, ua rau muaj kev nce hauv pob zeb diamond nucleation ntawm cov pob zeb diamond substrate. Lwm qhov kev hloov kho yog kev hloov ntawm ib qho kub filament nrog ntau qhov sib txawv filaments thiaj li ua tau zoo ib yam kev tso nyiaj thiab qhov kawg ntawm qhov loj ntawm pob zeb diamond zaj duab xis.Qhov tsis zoo ntawm HFCVD yog qhov thermal evaporation ntawm cov filament tuaj yeem tsim cov kab mob hauv cov pob zeb diamond zaj duab xis.
(2) Microwave Plasma CVD (MWCVD)
Nyob rau xyoo 1970, cov kws tshawb fawb pom tias qhov concentration ntawm atomic hydrogen tuaj yeem nce ntxiv siv DC plasma. Yog li ntawd, ntshav ntshav tau dhau los ua lwm txoj hauv kev los txhawb kev tsim cov pob zeb diamond films los ntawm decomposing H2 rau hauv atomic hydrogen thiab ua kom muaj cov pa roj carbon monoxide. Ntxiv rau DC plasma, ob hom ntshav ntshav kuj tau txais kev saib xyuas. Lub microwave plasma CVD muaj qhov excitation zaus ntawm 2.45 GHZ, thiab RF plasma CVD muaj qhov excitation zaus ntawm 13.56 MHz. microwave plasmas yog qhov tshwj xeeb hauv qhov microwave zaus induces electron vibrations. Thaum cov hluav taws xob sib tsoo nrog cov roj atoms lossis cov molecules, qhov kev sib cais siab yog tsim. Microwave plasma feem ntau hu ua teeb meem nrog "kub" electrons, "txias" ions thiab nruab nrab hais. Thaum lub sij hawm nyias zaj duab xis deposition, microwaves nkag mus rau hauv plasma-enhanced CVD synthesis chamber los ntawm lub qhov rais. Lub luminescent plasma feem ntau yog spherical nyob rau hauv cov duab, thiab qhov loj ntawm tus kheej nce nrog lub zog microwave. Pob zeb diamond nyias zaj duab xis yog zus nyob rau hauv ib tug substrate nyob rau hauv ib tug ces kaum ntawm lub luminescent cheeb tsam, thiab lub substrate yuav tsum tsis txhob nyob rau hauv ncaj qha kev sib cuag nrog lub luminescent cheeb tsam.
– Zaj lus no yog tso tawm los ntawmtshuab nqus tsev txheej tshuab manufacturersGuangdong Zhenhua
Post lub sij hawm: Jun-19-2024