Nhanganyaya yeTekinoroji yeHiPIMS

Nhamba 1 Nheyo yekushandiswa kwemagnetron ine simba guru
Nzira yekupusha magnetron ine simba guru inoshandisa simba repamusoro repulse (2-3 orders of magnitude kupfuura magnetron sputtering yakajairika) uye low pulse duty cycle (0.5%-10%) kuti iwane high metal dissociation rates (>50%), iyo inobva mu magnetron sputtering characteristics, sezvakaratidzwa muPic 1, apo peak target current density I inoenderana nesimba re exponential nth re discharge voltage U, I = kUn (n i constant ine chekuita ne cathode structure, magnetic field uye material). Pa low power densities (low voltage) n value inowanzova pakati pe5 kusvika 15; nekuwedzera kwe discharge voltage, current density uye power density inowedzera nekukurumidza, uye pa high voltage n value inova 1 nekuda kwekurasikirwa kwe magnetic field confinement. Kana pa low power densities, gas discharge inosarudzwa ne gas ions iri mu normal pulsed discharge mode; Kana paine simba rakawanda, huwandu hwemaion esimbi muplasma hunowedzera uye zvimwe zvinhu zvinochinja, ndiko kuti, muchimiro chekuzviputira, kureva kuti, plasma inochengetwa ne ionization yezvikamu zvisina kusimba zvakaputswa uye maion esimbi echipiri, uye maatomu egasi asina simba akadai seAr anoshandiswa chete kubatidza plasma, mushure mezvo zvikamu zvesimbi zvakaputswa zvinoiswa maion pedyo nechinangwa uye zvinokurumidziswa kudzokera shure kuti zvirwise chinangwa chakaputswa pasi pesimba remagineti nemagetsi kuchengetedza kubuda kwemagetsi kwakakwira, uye plasma ine zvikamu zvesimbi zvine maion akawanda. Nekuda kwekuita kwekupupira kwekupisa pachinangwa, kuitira kuve nechokwadi chekuti chinangwa chinoshanda zvakanaka mumaindasitiri, huwandu hwesimba hunoshandiswa zvakananga kune chinangwa hahugone kuve hwakanyanya kukura, kazhinji kutonhora kwemvura zvakananga uye thermal conductivity yechinhu chakanangana inofanira kunge iri pa25 W / cm2 pazasi, kutonhora kwemvura zvisina kunanga, thermal conductivity yechinhu chakanangana haina kunaka, target material inokonzerwa nekupwanyika nekuda kwekumanikidzwa kwekupisa kana chinhu chakanangana chine zvikamu zve alloy zvishoma uye zvimwe zviitiko zve power density zvinogona kungove mu 2 ~ 15 W / cm2 pazasi, pasi pezvinodiwa zve high power density. Dambudziko rekunyanya kupisa kwechinangwa rinogona kugadziriswa nekushandisa ma pulses akamanikana kwazvo e high power. Anders anotsanangura high-power pulsed magnetron sputtering semhando ye pulsed sputtering apo peak power density inodarika avhareji ye power density ne 2 kusvika 3 orders of magnitude, uye target ion sputtering inotonga sputtering process, uye maatomu e target sputtering akaparadzaniswa zvakanyanya.

Nhamba 2 Hunhu hwepamusoro-soro pulsed magnetron sputtering coating deposition

Kusputtering kwemagnetron ine simba guru kunogona kugadzira plasma ine mwero wekuparadzanisa kwakanyanya uye simba remaion rakawanda, uye kunogona kushandisa biasus pressure kuti kukurumidzise maion ane chaji, uye maitiro ekuisa coating deposition anoputirwa nezvidimbu zvine simba rakawanda, inova tekinoroji yakajairika yeIPVD. Simba remaion nekugoverwa kwazvo zvine simba guru pamhando yecoating uye mashandiro ayo.
Nezve IPVD, zvichibva pamuenzaniso weThorton structural region wakakurumbira, Anders akakurudzira muenzaniso wenzvimbo yekuvaka unosanganisira plasma deposition uye ion etching, akawedzera hukama huripo pakati pechimiro chekufukidza uye tembiricha uye kumanikidzwa kwemhepo muThorton structural region model kusvika pahukama huripo pakati pechimiro chekufukidza, tembiricha uye ion energy, sezvakaratidzwa muPikicha 2. Panyaya yekuputira ion deposition ine simba shoma, chimiro chekufukidza chinoenderana neThorton structure zone model. Nekuwedzera kwekupisa kwekufukidza, shanduko kubva munzvimbo 1 (makristaro efiber asina porous) kuenda kunzvimbo T (makristaro efiber akasimba), nzvimbo 2 (makristaro ecolumnar) uye nzvimbo 3 (recrystallization region); nekuwedzera kwesimba rekuisa ion, tembiricha yekuchinja kubva munharaunda 1 kuenda kunzvimbo T, nzvimbo 2 nedunhu 3 inoderera. Makristaro efiber ane density yakakura uye makristaro ecolumnar anogona kugadzirwa patembiricha yakaderera. Kana simba remaion akaiswa rikawedzera kusvika pa1-10 eV, kubhomba uye kuputira kwemaion pamusoro pemachira akaiswa kunowedzera uye ukobvu hwemachira hunowedzerwa.

Nhamba 3 Kugadzirira kwechikamu chakaoma chekuputira nehunyanzvi hwepamusoro hwe pulsed magnetron sputtering
Kupfeka kwakagadzirwa nehunyanzvi hwemagnetron sputtering hwakanyanya kusimba, hune hunhu huri nani hwemakanika uye kugadzikana kwekupisa kwakanyanya. Sezvakaratidzwa muPikicha 3, kupfekedzwa kweTiAlN kwakajairwa nemagnetron ichimiro chekristaro checolumnar chine kuomarara kwe30 GPa uye modulus yeYoung ye460 GPa; kupfekedzwa kweHIPIMS-TiAlN kuomarara kwe34 GPa nepo modulus yeYoung iri 377 GPa; chiyero chiripo pakati pekuomarara neYoung's modulus chiyero chekusimba kwejira. Kuomarara kwakanyanya uye modulus diki yeYoung zvinoreva kuomarara kuri nani. Kupfekedzwa kweHIPIMS-TiAlN kune kugadzikana kuri nani kwekupisa kwakanyanya, neAlN hexagonal phase inokonzereswa mujira reTiAlN rakajairwa mushure mekurapa kwekupisa kwakanyanya pa1,000 °C kwemaawa mana. Kuomarara kwejira kunoderera pakupisa kwakanyanya, nepo kupfekedzwa kweHIPIMS-TiAlN kuchiramba kusina kuchinja mushure mekurapa kupisa panguva imwe chete yekupisa nenguva imwe chete. Kuputira kweHIPIMS-TiAlN kune tembiricha yepamusoro yekupiswa kwekupisa kwakanyanya kupfuura kuputira kwakajairika. Nokudaro, kuputira kweHIPIMS-TiAlN kunoratidza kushanda kuri nani muzvishandiso zvekucheka zvinomhanya zvakanyanya kupfuura zvimwe zvishandiso zvakaputirwa zvakagadzirwa nePVD process.