Nambala 1 Mfundo ya kupopera kwa magnetron yamphamvu kwambiri
Njira yogwiritsira ntchito mphamvu ya magnetron pulsed sputtering imagwiritsa ntchito mphamvu ya pulse yapamwamba kwambiri (2-3 ma orders of magnitude kuposa magnetron sputtering yachizolowezi) ndi low pulse duty cycle (0.5%-10%) kuti ikwaniritse kuchuluka kwa kugawanika kwa zitsulo (>50%), komwe kumachokera ku makhalidwe a magnetron sputtering, monga momwe zasonyezedwera pa Chithunzi 1, komwe peak target current density I ikugwirizana ndi exponential nth power ya discharge voltage U, I = kUn (n ndi constant yogwirizana ndi kapangidwe ka cathode, magnetic field ndi zinthu). Pa mphamvu zochepa (low voltage) n nthawi zambiri imakhala pakati pa 5 mpaka 15; ndi kuwonjezeka kwa discharge voltage, current density ndi power density imawonjezeka mofulumira, ndipo pa high voltage n imakhala 1 chifukwa cha kutayika kwa magnetic field confinement. Ngati pa mphamvu zochepa, gasi imatuluka imatsimikiziridwa ndi ma ions a gasi omwe ali mu pulsed discharge mode yachibadwa; Ngati pa mphamvu zambiri, kuchuluka kwa ma ayoni achitsulo mu plasma kumawonjezeka ndipo zinthu zina zimasinthasintha, ndiko kuti, mu njira yodzipukutira yokha, mwachitsanzo, plasma imasungidwa ndi ionization ya tinthu tating'onoting'ono tomwe timapukutira ndi ma ayoni achitsulo achiwiri, ndipo maatomu a mpweya wopanda mphamvu monga Ar amagwiritsidwa ntchito poyatsa plasma, pambuyo pake tinthu tachitsulo topukutira timapukutidwa pafupi ndi cholinga ndikufulumizitsidwa kubwerera kuti tiphulitse cholinga chopukutira pogwiritsa ntchito mphamvu zamaginito ndi zamagetsi kuti tisunge kutuluka kwamphamvu kwamagetsi, ndipo plasma ndi tinthu tachitsulo topukutira kwambiri. Chifukwa cha njira yothira madzi yomwe imayatsira kutentha pa chandamale, kuti zitsimikizire kuti chandamale chikugwira ntchito bwino m'mafakitale, mphamvu yamagetsi yomwe imagwiritsidwa ntchito mwachindunji pa chandamale singakhale yayikulu kwambiri, nthawi zambiri kuziziritsa kwa madzi mwachindunji ndi kutentha kwa zinthu zomwe zili pachiwopsezo kuyenera kukhala 25 W / cm2 pansi, kuziziritsa kwa madzi mwachindunji, kutentha kwa zinthu zomwe zili pachiwopsezo ndi koyipa, zinthu zomwe zili pachiwopsezo chifukwa cha kupsinjika kwa kutentha kapena zinthu zomwe zili pachiwopsezo zimakhala ndi zigawo zochepa zosasunthika za alloy ndipo milandu ina yamphamvu yamagetsi imatha kukhala 2 ~ 15 W / cm2 pansi, yocheperako kwambiri pazofunikira za mphamvu yamagetsi yayikulu. Vuto la kutentha kwambiri kwa chandamale lingathe kuthetsedwa pogwiritsa ntchito ma pulse ochepa kwambiri amagetsi amphamvu. Anders amatanthauzira kuthira madzi kwamagetsi kwamphamvu kwambiri ngati mtundu wa kuthira madzi komwe mphamvu yamphamvu yamphamvu imaposa mphamvu yapakati ndi ma orders awiri mpaka atatu, ndipo kuthira madzi kwa chandamale kumalamulira njira yothira madzi, ndipo maatomu omwe ali pachiwopsezo amalekanitsidwa kwambiri.
No.2 Makhalidwe a pulasitiki yamphamvu ya magnetron sputtering plating deposition
Kutulutsa kwa magnetron kokhala ndi mphamvu zambiri kumatha kupanga plasma yokhala ndi kuchuluka kwakukulu kwa kugawanika ndi mphamvu yayikulu ya ma ion, ndipo kumatha kugwiritsa ntchito mphamvu ya bia kuti ifulumizitse ma ion omwe ali ndi mphamvu zambiri, ndipo njira yoyika ma ion imadzazidwa ndi tinthu tambiri ta mphamvu zambiri, zomwe ndi ukadaulo wamba wa IPVD. Mphamvu ya ma ion ndi kugawa kwake zimakhudza kwambiri khalidwe ndi magwiridwe antchito a kupaka.
Ponena za IPVD, kutengera chitsanzo chodziwika bwino cha dera la Thorton, Anders adapereka chitsanzo cha dera lopangidwa chomwe chimaphatikizapo plasma deposition ndi ion etching, chinakulitsa ubale pakati pa kapangidwe ka zokutira ndi kutentha ndi kuthamanga kwa mpweya mu chitsanzo cha dera la Thorton structural ku ubale pakati pa kapangidwe ka zokutira, kutentha ndi mphamvu ya ion, monga momwe zasonyezedwera pa Chithunzi 2. Pankhani ya low energy ion deposition coating, kapangidwe ka zokutira kamagwirizana ndi chitsanzo cha Thorton structure zone. Pamene kutentha kwa deposition kukukwera, kusintha kuchokera ku dera 1 (makristalo otayirira a ulusi) kupita ku dera T (makristalo a ulusi wandiweyani), dera 2 (makristalo a columnar) ndi dera 3 (recrystallization region); pamene mphamvu ya deposition ion ikukwera, kutentha kwa kusintha kuchokera ku dera 1 kupita ku dera T, dera 2 ndi dera 3 kumachepa. Makristalo a ulusi wambiri ndi makristalo a columnar amatha kukonzedwa pa kutentha kochepa. Pamene mphamvu ya ma ion oikidwa ikukwera kufika pa 1-10 eV, kuphulika ndi kujambulidwa kwa ma ion pamwamba pa zokutira zomwe zaikidwa kumawonjezeka ndipo makulidwe a zokutira amawonjezeka.
Nambala 3 Kukonzekera kwa wosanjikiza wolimba pogwiritsa ntchito ukadaulo wamphamvu kwambiri wa pulsed magnetron sputtering
Chophimba chokonzedwa ndi ukadaulo wa magnetron sputtering wamphamvu kwambiri ndi chokhuthala, chokhala ndi mawonekedwe abwino a makina komanso kukhazikika kwa kutentha kwambiri. Monga momwe zasonyezedwera pa Chithunzi 3, chophimba cha TiAlN chopangidwa ndi magnetron ndi kapangidwe ka kristalo kokhala ndi kuuma kwa 30 GPa ndi modulus ya Young ya 460 GPa; chophimba cha HIPIMS-TiAlN ndi kuuma kwa 34 GPa pomwe modulus ya Young ndi 377 GPa; chiŵerengero pakati pa kuuma ndi modulus ya Young ndi muyeso wa kuuma kwa chophimbacho. Kuuma kwakukulu ndi modulus yaying'ono ya Young zimatanthauza kulimba bwino. Chophimba cha HIPIMS-TiAlN chili ndi kukhazikika kwa kutentha kwakukulu, ndipo gawo la AlN hexagonal limakhazikika mu chophimba cha TiAlN chokhazikika pambuyo pa chithandizo cha kutentha kwakukulu pa 1,000 °C kwa maola 4. Kuuma kwa chophimbacho kumachepa kutentha kwakukulu, pomwe chophimba cha HIPIMS-TiAlN sichinasinthe pambuyo pa chithandizo cha kutentha pa kutentha komweko ndi nthawi yomweyo. Chophimba cha HIPIMS-TiAlN chilinso ndi kutentha kwakukulu koyambira kwa okosijeni wotentha kwambiri kuposa chophimba chachizolowezi. Chifukwa chake, chophimba cha HIPIMS-TiAlN chikuwonetsa magwiridwe antchito abwino kwambiri mu zida zodulira mwachangu kuposa zida zina zophimbidwa ndi PVD.
Nthawi yotumizira: Novembala-08-2022