Kev Taw Qhia Txog Kev Siv Tshuab HiPIMS

No.1 Lub hauv paus ntsiab lus ntawm lub zog siab pulsed magnetron sputtering
Cov txheej txheem magnetron sputtering muaj zog siab siv lub zog siab tshaj plaws (2-3 qhov kev txiav txim siab siab dua li cov magnetron sputtering ib txwm muaj) thiab lub voj voog ua haujlwm qis (0.5% -10%) kom ua tiav cov nqi sib cais hlau siab (> 50%), uas yog los ntawm cov yam ntxwv magnetron sputtering, raws li pom hauv Pic 1, qhov twg qhov ceev tam sim no I yog proportional rau lub zog nth exponential ntawm qhov hluav taws xob tso tawm U, I = kUn (n yog qhov tsis hloov pauv cuam tshuam nrog cov qauv cathode, lub zog sib nqus thiab cov khoom siv). Ntawm qhov muaj zog qis dua (qhov hluav taws xob qis) tus nqi n feem ntau yog nyob rau hauv qhov ntau ntawm 5 txog 15; nrog rau qhov hluav taws xob tso tawm nce ntxiv, qhov ceev tam sim no thiab qhov ceev fais fab nce sai, thiab ntawm qhov hluav taws xob siab tus nqi n dhau los ua 1 vim yog qhov poob ntawm qhov chaw sib nqus. Yog tias ntawm qhov muaj zog qis, qhov tso tawm roj yog txiav txim siab los ntawm cov roj ions uas nyob hauv hom kev tso tawm pulsed ib txwm muaj; Yog tias ntawm qhov muaj zog siab, qhov sib piv ntawm cov hlau ions hauv cov plasma nce thiab qee cov ntaub ntawv hloov, uas yog nyob rau hauv hom kev hloov pauv tus kheej, piv txwv li Cov plasma yog tswj los ntawm ionization ntawm cov khoom nruab nrab sputtered thiab cov hlau ions theem nrab, thiab cov pa roj inert xws li Ar tsuas yog siv los taws cov plasma, tom qab ntawd cov hlau sputtered yog ionized ze ntawm lub hom phiaj thiab nrawm rov qab los bombard lub hom phiaj sputtered nyob rau hauv qhov kev ua ntawm cov hlau nplaum thiab hluav taws xob teb kom tswj tau qhov siab tam sim no tso tawm, thiab cov plasma yog cov hlau ionized heev. Vim yog cov txheej txheem sputtering ntawm cov cua sov nyhuv rau lub hom phiaj, txhawm rau kom ntseeg tau tias kev ua haujlwm ruaj khov ntawm lub hom phiaj hauv kev siv hauv kev lag luam, lub zog ceev ncaj qha rau lub hom phiaj tsis tuaj yeem loj dhau, feem ntau dej txias ncaj qha thiab lub hom phiaj cov khoom siv thermal conductivity yuav tsum nyob rau hauv cov ntaub ntawv ntawm 25 W / cm2 hauv qab no, dej txias tsis ncaj qha, lub hom phiaj cov khoom siv thermal conductivity tsis zoo, lub hom phiaj cov khoom siv los ntawm kev tawg vim yog thermal kev ntxhov siab lossis lub hom phiaj cov khoom siv muaj cov khoom sib xyaw tsis tshua muaj zog thiab lwm yam xwm txheej ntawm lub zog ceev tsuas yog nyob rau hauv 2 ~ 15 W / cm2 hauv qab no, deb qis dua qhov yuav tsum tau ntawm lub zog ceev siab. Qhov teeb meem ntawm lub hom phiaj overheating tuaj yeem daws tau los ntawm kev siv cov pulses siab nqaim heev. Anders txhais cov hwj chim siab pulsed magnetron sputtering ua ib hom pulsed sputtering qhov twg lub zog ceev tshaj qhov nruab nrab ntawm lub zog ceev los ntawm 2 txog 3 qhov kev txiav txim ntawm qhov loj, thiab lub hom phiaj ion sputtering dominates lub txheej txheem sputtering, thiab lub hom phiaj sputtering atoms yog dissociated heev.

No.2 Cov yam ntxwv ntawm lub zog siab pulsed magnetron sputtering txheej deposition

Lub zog siab pulsed magnetron sputtering tuaj yeem tsim cov plasma nrog tus nqi dissociation siab thiab lub zog ion siab, thiab tuaj yeem siv lub zog bias los ua kom cov ions them sai dua, thiab cov txheej txheem tso txheej txheem yog bombarded los ntawm cov khoom me me muaj zog, uas yog ib qho thev naus laus zis IPVD ib txwm muaj. Lub zog ion thiab kev faib tawm muaj qhov cuam tshuam tseem ceeb heev rau qhov zoo thiab kev ua tau zoo ntawm txheej.
Txog IPVD, raws li tus qauv thaj tsam Thorton nto moo, Anders tau tawm tswv yim txog tus qauv thaj tsam uas suav nrog plasma deposition thiab ion etching, txuas ntxiv kev sib raug zoo ntawm cov qauv txheej thiab qhov kub thiab txias thiab cua siab hauv Thorton tus qauv thaj tsam mus rau kev sib raug zoo ntawm cov qauv txheej, qhov kub thiab txias thiab lub zog ion, raws li pom hauv Pic 2. Hauv qhov xwm txheej ntawm cov txheej ion deposition qis zog, cov qauv txheej ua raws li Thorton tus qauv thaj tsam. Nrog rau kev nce ntawm qhov kub thiab txias deposition, kev hloov pauv ntawm thaj tsam 1 (xoob porous fiber crystals) mus rau thaj tsam T (dense fiber crystals), thaj tsam 2 (columnar crystals) thiab thaj tsam 3 (recrystallization throughput); nrog rau kev nce ntawm deposition ion zog, qhov kub thiab txias hloov pauv ntawm thaj tsam 1 mus rau thaj tsam T, thaj tsam 2 thiab thaj tsam 3 txo qis. Cov high-density fiber crystals thiab columnar crystals tuaj yeem npaj tau ntawm qhov kub qis. Thaum lub zog ntawm cov ions tso nce mus rau qhov kev txiav txim ntawm 1-10 eV, qhov kev foob pob thiab etching ntawm ions ntawm qhov chaw tso nyiaj tau txhim kho thiab qhov tuab ntawm cov txheej ntxiv nce.

No.3 Kev npaj txheej txheej tawv los ntawm kev siv tshuab hluav taws xob magnetron sputtering siab
Cov txheej txheej uas tau npaj los ntawm kev siv tshuab high power pulsed magnetron sputtering yog denser, nrog cov khoom siv kho tshuab zoo dua thiab kev ruaj khov kub siab. Raws li pom hauv Pic 3, cov txheej txheem magnetron sputtered TiAlN yog cov qauv siv lead ua ke nrog qhov nyuaj ntawm 30 GPa thiab Young's modulus ntawm 460 GPa; cov txheej txheem HIPIMS-TiAlN yog 34 GPa hardness thaum Young's modulus yog 377 GPa; qhov sib piv ntawm qhov nyuaj thiab Young's modulus yog qhov ntsuas ntawm qhov tawv ntawm cov txheej txheem. Qhov nyuaj dua thiab Young's modulus me dua txhais tau tias muaj zog dua. Cov txheej txheem HIPIMS-TiAlN muaj kev ruaj khov kub zoo dua, nrog AlN hexagonal theem precipitated hauv cov txheej txheem TiAlN tom qab kev kho mob kub siab ntawm 1,000 ° C rau 4 teev. Qhov nyuaj ntawm cov txheej txheem txo qis ntawm qhov kub siab, thaum cov txheej txheem HIPIMS-TiAlN tseem tsis hloov pauv tom qab kev kho cua sov ntawm tib qhov kub thiab lub sijhawm. Cov txheej txheem HIPIMS-TiAlN kuj muaj qhov kub siab dua ntawm kev oxidation kub siab dua li cov txheej txheem ib txwm muaj. Yog li ntawd, HIPIMS-TiAlN txheej qhia tau tias muaj kev ua tau zoo dua hauv cov cuab yeej txiav ceev ceev dua li lwm cov cuab yeej coated uas npaj los ntawm cov txheej txheem PVD.