A'a.1 Ƙa'idar babban iko mai ƙarfi magnetron sputtering
The high ikon pulsed magnetron sputtering dabara yana amfani da high ganiya bugun jini ikon (2-3 oda na girma sama da na al'ada magnetron sputtering) da kuma low bugun jini wajibi sake zagayowar (0.5% -10%) don cimma high karfe dissociation rates (> 50%), wanda An samo shi daga halayen sputtering magnetron, kamar yadda aka nuna a cikin Hoto 1, inda mafi girman maƙasudin maƙasudin halin yanzu I ya yi daidai da ƙarfin nth na ƙarfin fitarwa U, I = kUn (n shine akai-akai mai dangantaka da tsarin cathode, filin maganadisu. da kayan).A ƙananan ƙananan ƙarfin wuta (ƙananan ƙarfin lantarki) ƙimar n yawanci yana cikin kewayon 5 zuwa 15;tare da haɓaka ƙarfin fitarwa, ƙarfin halin yanzu da ƙarfin ƙarfin yana ƙaruwa da sauri, kuma a babban ƙarfin wutan darajar n ya zama 1 saboda asarar kariyar filin maganadisu.Idan a ƙananan ƙarancin wutar lantarki, ana ƙaddamar da fitar da iskar gas ta ions gas wanda ke cikin yanayin fitarwa na yau da kullun;Idan a babban ƙarfin ƙarfi, adadin ions na ƙarfe a cikin plasma yana ƙaruwa kuma wasu kayan suna canzawa, wato a cikin yanayin kai-tsaye, watau plasma ana kiyaye shi ta hanyar ionization na ionization na ƙwayoyin tsaka tsaki da ions na ƙarfe na biyu, da inert gas atoms. irin su Ar ana amfani da su kawai don kunna plasma, bayan haka ɓangarorin ƙarfe na sputtered suna ionized kusa da manufa kuma a hanzarta mayar da su zuwa bombard da sputtered manufa a ƙarƙashin aikin magnetic da lantarki filayen don kula da high halin yanzu fitarwa, da kuma plasma ne sosai. ionized karfe barbashi.Saboda sputtering aiwatar da dumama sakamako a kan manufa, domin tabbatar da barga aiki na manufa a masana'antu aikace-aikace, da ikon yawa kai tsaye shafi manufa ba zai iya zama ma babba, kullum kai tsaye ruwa sanyaya da manufa abu thermal watsin ya kamata ya kasance cikin yanayin 25 W / cm2 a ƙasa, sanyaya ruwa kai tsaye, ƙaddamar da ƙarancin wutar lantarki mai nisa ba shi da kyau, kayan da aka yi niyya ta hanyar rarrabuwar kawuna saboda damuwa ta thermal ko kayan da aka yi niyya ya ƙunshi abubuwan haɗin gwal mara ƙarfi da sauran lokuta na yawan ƙarfin wutar lantarki na iya kasancewa a cikin 2 ~ 15 W / cm2 a ƙasa, ƙasa da buƙatun ƙarfin ƙarfin ƙarfi.Za'a iya magance matsalar zafi mai zafi ta hanyar amfani da kunkuntar bugun jini mai ƙarfi.Anders ya bayyana babban ƙarfin bugun magnetron sputtering a matsayin wani nau'i na sputtering inda mafi girman ƙarfin ƙarfin ya wuce matsakaicin ƙarfin ƙarfin da 2 zuwa 3 umarni na girma, kuma maƙasudin ion sputtering ya mamaye tsarin sputtering, da kuma manufa sputtering atoms suna da rarrabuwa sosai. .
No.2 Halayen babban iko pulsed magnetron sputtering shafi jijiya
High iko pulsed magnetron sputtering iya samar da plasma tare da high dissociation kudi da kuma high ion makamashi, kuma zai iya amfani da son zuciya matsa lamba don hanzarta da caje ions, da kuma shafi jita-jita tsari da aka bombarded da high-makamashi barbashi, wanda yake shi ne na hali IPVD fasaha.Ƙarfin ion da rarrabawa suna da tasiri mai mahimmanci akan ingancin sutura da aiki.
Game da IPVD, dangane da sanannen tsarin yanki na tsarin Thorton, Anders ya ba da shawarar tsarin tsarin yanki wanda ya haɗa da jigilar jini da ion etching, haɓaka alaƙar da ke tsakanin tsarin sutura da zafin jiki da matsa lamba na iska a cikin tsarin yanki na Thorton zuwa dangantakar dake tsakanin tsarin sutura, zafin jiki da makamashin ion, kamar yadda aka nuna a cikin Hoton 2. A cikin yanayin ƙarancin ƙarancin ƙarfin ion, tsarin suturar ya dace da tsarin yankin Thorton.Tare da karuwar yawan zafin jiki, sauyawa daga yankin 1 (lu'ulu'u masu laushi masu laushi) zuwa yankin T (kyawawan lu'ulu'u masu yawa), yanki 2 (lu'ulu'u na columnar) da yanki 3 (yankin recrystallization);tare da ƙara yawan adadin kuzarin ion, canjin yanayin zafi daga yankin 1 zuwa yankin T, yanki na 2 da yanki 3 ya ragu.Za a iya shirya lu'ulu'u na fiber mai girma da lu'ulu'u na columnar a ƙananan zafin jiki.Lokacin da makamashi na ions da aka ajiye ya karu zuwa tsari na 1-10 eV, bombardment da etching na ions a kan shimfidar kayan da aka ajiye yana haɓaka kuma an ƙara yawan kauri.
No.3 Shiri da wuya shafi Layer da high ikon pulsed magnetron sputtering fasaha
Rubutun da aka shirya ta babban ikon pulsed magnetron sputtering fasaha ne mai yawa, tare da mafi inji Properties da high zafin jiki kwanciyar hankali.Kamar yadda aka nuna a cikin Hoto 3, abin rufe fuska na Magnetron na al'ada sputtered TiAlN shine tsarin lu'ulu'u na ginshiƙi tare da taurin 30 GPa da ma'aunin matashi na 460 GPa;rufin HIPIMS-TiAlN shine taurin GPa 34 yayin da ma'aunin matashin shine 377 GPa;rabon da ke tsakanin taurin da ma'aunin matashi shine ma'auni na taurin rufin.Maɗaukakin taurin da ƙarami na matashin matashi yana nufin mafi kyawu.Rubutun HIPIMS-TiAlN yana da mafi kyawun kwanciyar hankali na zafin jiki, tare da yanayin AlN hexagonal wanda aka haɗe a cikin abin rufewar TiAlN na al'ada bayan babban maganin annealing zafin jiki a 1,000 °C na sa'o'i 4.Taurin rufin yana raguwa a babban zafin jiki, yayin da HIPIMS-TiAlN shafi ya kasance baya canzawa bayan maganin zafi a cikin zafin jiki da lokaci guda.HIPIMS-TiAlN shafi kuma yana da mafi girma farkon zafin jiki na high zafin jiki hadawan abu da iskar shaka fiye da na al'ada shafi.Saboda haka, HIPIMS-TiAlN shafi yana nuna mafi kyawun aiki a cikin kayan aikin yankan sauri fiye da sauran kayan aikin da aka rufe ta hanyar PVD.
Lokacin aikawa: Nuwamba-08-2022