No.1 Ka'idar amfani da magnetron mai ƙarfi mai ƙarfi
Fasahar sputtering mai ƙarfi ta amfani da ƙarfin bugun jini mai girma (tsarin girma 2-3 fiye da na magnetron na al'ada) da kuma ƙaramin zagayowar aikin bugun jini (0.5%-10%) don cimma ƙimar rabuwar ƙarfe mai girma (>50%), wanda aka samo daga halayen sputtering na magnetron, kamar yadda aka nuna a cikin Hoto na 1, inda yawan zafin da ake buƙata na yanzu I ya yi daidai da ƙarfin exponential nth na ƙarfin fitarwa U, I = kUn (n yana da alaƙa da tsarin cathode, filin maganadisu da kayan aiki). A ƙananan ƙarfin lantarki (ƙarancin ƙarfin lantarki) ƙimar n yawanci tana cikin kewayon 5 zuwa 15; tare da ƙaruwar ƙarfin fitarwa, yawan zafin da ƙarfin lantarki ke ƙaruwa da sauri, kuma a babban ƙarfin lantarki ƙimar n ta zama 1 saboda asarar ƙuntatawar filin maganadisu. Idan a ƙarancin ƙarfin lantarki, ana ƙayyade fitar da iskar gas ta hanyar ions na iskar gas waɗanda ke cikin yanayin fitarwa na yau da kullun; Idan a cikin yawan ƙarfin da ke da yawa, yawan ions na ƙarfe a cikin plasma yana ƙaruwa kuma wasu kayan suna canzawa, wato suna cikin yanayin fitar da kai, watau Ana kiyaye plasma ta hanyar ionization na ƙwayoyin da ba su da tsaka-tsaki da ions na ƙarfe na biyu, kuma ana amfani da ƙwayoyin iskar gas marasa aiki kamar Ar kawai don kunna plasma, bayan haka ana ionized ƙwayoyin ƙarfe da aka ionized kusa da abin da aka ionized kuma ana hanzarta mayar da su don jefa bom a kan abin da aka ionized a ƙarƙashin aikin filayen maganadisu da lantarki don kiyaye yawan fitar da wutar lantarki, kuma plasma shine ƙwayoyin ƙarfe masu ionized sosai. Saboda tsarin sputtering na tasirin dumama a kan manufa, domin tabbatar da ingantaccen aikin manufa a aikace-aikacen masana'antu, yawan wutar da aka yi amfani da ita kai tsaye ga manufa ba zai iya zama babba ba, gabaɗaya sanyaya ruwa kai tsaye da kuma ƙarfin wutar lantarki na kayan manufa ya kamata ya kasance idan akwai 25 W / cm2 a ƙasa, sanyaya ruwa a kaikaice, ƙarfin wutar lantarki na kayan manufa ba shi da kyau, kayan manufa da aka yi niyya saboda rarrabuwar kawuna saboda damuwa ta zafi ko kayan manufa sun ƙunshi ƙananan sassan ƙarfe masu canzawa kuma sauran lokuta na yawan wutar lantarki za a iya magance su ne kawai a cikin 2 ~ 15 W / cm2 a ƙasa, ƙasa da buƙatun yawan wutar lantarki mai yawa. Ana iya magance matsalar yawan zafi da aka yi niyya ta amfani da kunkuntar bugun wutar lantarki mai ƙarfi. Anders ya bayyana sputtering magnetron mai ƙarfi a matsayin nau'in sputtering mai ƙarfi inda yawan wutar lantarki mafi girma ya wuce matsakaicin yawan wutar lantarki da tsari 2 zuwa 3 na girma, kuma sputtering na ion mai manufa ya mamaye tsarin sputtering, kuma atom ɗin sputtering da aka yi niyya sun rabu sosai.
No.2 Halayen babban ƙarfin pulsed magnetron sputtering shafi ajiya
Manhajar magnetron mai ƙarfi mai ƙarfi za ta iya samar da plasma mai yawan rabuwa da kuzarin ion mai yawa, kuma za ta iya amfani da matsin lamba na son zuciya don hanzarta ions ɗin da aka caji, kuma tsarin ajiyar murfin yana fuskantar bama-bamai da ƙwayoyin makamashi masu yawa, wanda fasaha ce ta IPVD ta yau da kullun. Ƙarfin ion da rarrabawa suna da tasiri mai mahimmanci akan ingancin murfin da aikin sa.
Game da IPVD, bisa ga sanannen samfurin yankin Thorton, Anders ya gabatar da samfurin yankin tsari wanda ya haɗa da zubar jini da kuma ion etching, ya faɗaɗa alaƙar da ke tsakanin tsarin rufi da zafin jiki da matsin iska a cikin samfurin yankin Thorton zuwa ga alaƙar da ke tsakanin tsarin rufi, zafin jiki da kuzarin ion, kamar yadda aka nuna a Hoto na 2. Idan akwai ƙarancin ƙarfin ion deposition, tsarin rufi ya dace da samfurin yankin tsarin Thorton. Tare da ƙaruwar zafin ajiya, sauyawa daga yanki na 1 (lu'ulu'u masu laushi) zuwa yanki na T (lu'ulu'u masu yawa na fiber), yanki na 2 (lu'ulu'u masu shafi) da yanki na 3 (yankin sake yin amfani da su); tare da ƙaruwar kuzarin ion deposition, zafin canji daga yanki na 1 zuwa yanki na T, yanki na 2 da yanki na 3 yana raguwa. Ana iya shirya lu'ulu'u masu yawa na fiber da lu'ulu'u masu shafi a ƙananan zafin jiki. Lokacin da kuzarin ions da aka ajiye ya ƙaru zuwa tsari na 1-10 eV, fashewar ions da etching a saman rufin da aka ajiye yana ƙaruwa kuma kauri na rufin yana ƙaruwa.
No.3 Shiri na Layer mai tauri ta hanyar fasahar magnetron mai ƙarfi mai ƙarfi
Rufin da fasahar magnetron mai ƙarfi mai ƙarfi ta shirya ya fi kauri, yana da ingantattun halayen injiniya da kwanciyar hankali mai zafi. Kamar yadda aka nuna a cikin Hoto na 3, rufin TiAlN mai ƙarfin magnetron tsarin lu'ulu'u ne mai ginshiƙi tare da taurin 30 GPa da kuma tsarin Young na 460 GPa; rufin HIPIMS-TiAlN shine taurin 34 GPa yayin da tsarin Young shine 377 GPa; rabo tsakanin tauri da tsarin Young shine ma'aunin tauri na murfin. Tauri mafi girma da ƙaramin tsarin Young yana nufin mafi kyawun tauri. Rufin HIPIMS-TiAlN yana da ingantaccen kwanciyar hankali na zafin jiki, tare da matakin hexagonal na AlN da aka haifar a cikin rufin TiAlN na gargajiya bayan maganin rage zafi mai zafi a 1,000 °C na tsawon awanni 4. Tauri na rufin yana raguwa a babban zafin jiki, yayin da rufin HIPIMS-TiAlN ba ya canzawa bayan maganin zafi a daidai zafin jiki da lokaci. Rufin HIPIMS-TiAlN kuma yana da zafin farko na iskar shaka mai zafi fiye da na al'ada. Saboda haka, murfin HIPIMS-TiAlN yana nuna kyakkyawan aiki a cikin kayan aikin yankewa mai sauri fiye da sauran kayan aikin da aka rufe da tsarin PVD ya shirya.
Lokacin Saƙo: Nuwamba-08-2022