Hoʻolauna ʻenehana HiPIMS

Kumumanaʻo No.1 o ka sputtering magnetron pulsed mana kiʻekiʻe
Hoʻohana ke ʻano hana pulsed magnetron sputtering kiʻekiʻe i ka mana pulse kiʻekiʻe (2-3 mau kauoha o ka nui ma mua o ka magnetron sputtering maʻamau) a me ke kaʻina hana pulse haʻahaʻa (0.5%-10%) e hoʻokō i nā helu dissociation metala kiʻekiʻe (>50%), i loaʻa mai nā ʻano magnetron sputtering, e like me ka mea i hōʻike ʻia ma Pic 1, kahi i kūlike ai ka nui o ke au o ka pahuhopu I me ka mana exponential nth o ka voltage hoʻokuʻu U, I = kUn (ʻo n kahi paʻa e pili ana i ka ʻano cathode, ke kahua magnetic a me nā mea). Ma nā densities mana haʻahaʻa (voltage haʻahaʻa) ʻo ka waiwai n maʻamau ma ka pae o 5 a 15; me ka piʻi ʻana o ka voltage hoʻokuʻu, piʻi koke ka nui o ke au a me ka nui o ka mana, a ma ke voltage kiʻekiʻe e lilo ka waiwai n i 1 ma muli o ka nalowale o ka hoʻopaʻa ʻana o ke kahua magnetic. Inā ma nā densities mana haʻahaʻa, ua hoʻoholo ʻia ka hoʻokuʻu kinoea e nā ion gas ma ke ʻano hoʻokuʻu pulsed maʻamau; Inā ma nā densities mana kiʻekiʻe, piʻi ka hapa o nā ion metala i loko o ka plasma a hoʻololi kekahi mau mea, ʻo ia hoʻi ke ʻano self-sputtering, ʻo ia hoʻi, mālama ʻia ka plasma e ka ionization o nā ʻāpana kūʻokoʻa sputtered a me nā ion metala lua, a hoʻohana wale ʻia nā ʻātoma kinoea inert e like me Ar e hoʻā i ka plasma, ma hope o ka ionized ʻana o nā ʻāpana metala sputtered kokoke i ka pahuhopu a hoʻolalelale ʻia i hope e hoʻopō i ka pahuhopu sputtered ma lalo o ka hana o nā kahua magnetic a me nā uila e mālama i ka hoʻokuʻu ʻana o kēia manawa kiʻekiʻe, a ʻo ka plasma he mau ʻāpana metala ionized kiʻekiʻe. Ma muli o ke kaʻina hana sputtering o ka hopena hoʻomehana ma ka pahuhopu, i mea e hōʻoia ai i ka hana paʻa o ka pahuhopu i nā noi ʻoihana, ʻaʻole hiki ke nui loa ka mana o ka mana i hoʻopili pololei ʻia i ka pahuhopu, ma ke ʻano laulā, ʻo ka hoʻoluʻu wai pololei a me ka conductivity thermal o ka mea pahuhopu ma ke ʻano he 25 W / cm2 ma lalo, ka hoʻoluʻu wai ʻole pololei, ʻaʻole maikaʻi ka conductivity thermal o ka mea pahuhopu, ʻo ka mea pahuhopu i hoʻokumu ʻia e ka fragmentation ma muli o ke kaumaha wela a i ʻole ka mea pahuhopu he mau ʻāpana alloy volatile haʻahaʻa a me nā hihia ʻē aʻe o ka mana o ka mana hiki ke 2 ~ 15 W / cm2 ma lalo, ma lalo loa o nā koi o ka mana kiʻekiʻe. Hiki ke hoʻoponopono ʻia ka pilikia o ka overheating o ka pahuhopu ma ka hoʻohana ʻana i nā pulse mana kiʻekiʻe haiki loa. Ho'ākāka ʻo Anders i ka pulsed magnetron sputtering kiʻekiʻe-mana he ʻano pulsed sputtering kahi i ʻoi aku ai ka mana kiʻekiʻe ma mua o ka mana awelika ma 2 a 3 mau kauoha o ka nui, a ʻo ka ion sputtering target e hoʻomalu i ke kaʻina sputtering, a ua hoʻokaʻawale nui ʻia nā ʻātoma sputtering target.

ʻAʻole.2 Nā ʻano o ka hoʻopaʻa ʻana o ka magnetron sputtering coating pulsed mana kiʻekiʻe

Hiki i ka mana kiʻekiʻe o ka magnetron sputtering ke hana i ka plasma me ka nui o ka dissociation a me ka ikehu ion kiʻekiʻe, a hiki ke hoʻopili i ke kaomi bias e hoʻolalelale i nā ion i hoʻopiʻi ʻia, a ua hoʻouka ʻia ke kaʻina hana waiho uhi e nā ʻāpana ikehu kiʻekiʻe, ʻo ia ka ʻenehana IPVD maʻamau. He hopena koʻikoʻi ko ka ikehu ion a me ka hoʻolaha ʻana i ka maikaʻi a me ka hana o ka uhi ʻana.
E pili ana i ka IPVD, ma muli o ke kumu hoʻohālike ʻāpana kūkulu kaulana ʻo Thorton, ua hāpai ʻo Anders i kahi kumu hoʻohālike ʻāpana kūkulu e komo pū ana me ka waiho ʻana o ka plasma a me ke kahakaha ʻana o ka ion, ua hoʻonui i ka pilina ma waena o ke ʻano uhi a me ka mahana a me ke kaomi ea ma ke kumu hoʻohālike ʻāpana kūkulu ʻo Thorton i ka pilina ma waena o ke ʻano uhi, ka mahana a me ka ikehu ion, e like me ka mea i hōʻike ʻia ma Pic 2. I ke ʻano o ka uhi waiho ʻana o ka ion ikehu haʻahaʻa, kūlike ke ʻano uhi me ke kumu hoʻohālike ʻāpana kūkulu ʻo Thorton. Me ka piʻi ʻana o ka mahana waiho ʻana, ka hoʻololi ʻana mai ka ʻāpana 1 (nā kristal fiber porous wehe) i ka ʻāpana T (nā kristal fiber dense), ka ʻāpana 2 (nā kristal columnar) a me ka ʻāpana 3 (ka ʻāpana recrystallization); me ka piʻi ʻana o ka ikehu ion waiho ʻana, emi ka mahana hoʻololi mai ka ʻāpana 1 a i ka ʻāpana T, ka ʻāpana 2 a me ka ʻāpana 3. Hiki ke hoʻomākaukau ʻia nā kristal fiber kiʻekiʻe-density a me nā kristal columnar ma ka mahana haʻahaʻa. Ke piʻi ka ikehu o nā ion i waiho ʻia i ke kauoha o 1-10 eV, hoʻonui ʻia ka hoʻouka kaua ʻana a me ke kahakaha ʻana o nā ion ma ka ʻili o nā uhi i waiho ʻia a hoʻonui ʻia ka mānoanoa o nā uhi.

ʻO ka hoʻomākaukau ʻana o ka papa uhi paʻakikī e ka ʻenehana sputtering magnetron pulsed mana kiʻekiʻe
ʻOi aku ka paʻa o ka uhi i hoʻomākaukau ʻia e ka ʻenehana magnetron sputtering pulsed mana kiʻekiʻe, me nā waiwai mechanical ʻoi aku ka maikaʻi a me ke kūpaʻa wela kiʻekiʻe. E like me ka mea i hōʻike ʻia ma Pic 3, ʻo ka uhi TiAlN sputtered magnetron maʻamau he ʻano kristal kolamu me ka paʻakikī o 30 GPa a me ka modulus Young o 460 GPa; ʻo ka uhi HIPIMS-TiAlN he 34 GPa ka paʻakikī ʻoiai ʻo ka modulus Young he 377 GPa; ʻo ka lakio ma waena o ka paʻakikī a me ka modulus Young kahi ana o ka paʻakikī o ka uhi. ʻOi aku ka paʻakikī kiʻekiʻe a me ka modulus Young liʻiliʻi ʻo ia hoʻi ka paʻakikī maikaʻi. ʻOi aku ka maikaʻi o ke kūpaʻa wela kiʻekiʻe o ka uhi HIPIMS-TiAlN, me ka pae hexagonal AlN i hoʻopaʻa ʻia i loko o ka uhi TiAlN maʻamau ma hope o ka mālama ʻana i ka mahana kiʻekiʻe ma 1,000 °C no 4 h. Hoʻemi ka paʻakikī o ka uhi i ka mahana kiʻekiʻe, ʻoiai ʻaʻole i loli ka uhi HIPIMS-TiAlN ma hope o ka mālama wela ʻana i ka mahana like a me ka manawa like. ʻOi aku ka kiʻekiʻe o ka mahana hoʻomaka o ka oxidation wela kiʻekiʻe ma mua o ka uhi maʻamau. No laila, hōʻike ka uhi HIPIMS-TiAlN i ka hana maikaʻi loa i nā mea hana ʻoki wikiwiki ma mua o nā mea hana ʻē aʻe i uhi ʻia i hoʻomākaukau ʻia e ke kaʻina hana PVD.