A'a.1 Ƙa'idar babban iko mai ƙarfi magnetron sputtering
The high ikon pulsed magnetron sputtering dabara yana amfani da high ganiya bugun jini ikon (2-3 oda na girma mafi girma fiye da na al'ada magnetron sputtering) da kuma low bugun jini wajibi sake zagayowar (0.5% -10%) don cimma high karfe dissociation rates (> 50%), wanda aka samu daga da high ganiya bugun jini ikon (2-3 oda na girma girma fiye da na al'ada magnetron sputtering) da kuma low bugun jini aiki sake zagayowar (0.5% -10%) don cimma high karfe dissociation rates (> 50%), wanda aka samu daga ma'aunin zafi da sanyio sputtering halaye, kamar yadda aka nuna a cikin niyya pec. Ƙarfin nth mai ƙarfi na ƙarfin fitarwa U, I = kUn (n shine akai-akai mai alaƙa da tsarin cathode, filin maganadisu da abu). A ƙananan ƙananan ƙarfin wuta (ƙananan ƙarfin lantarki) ƙimar n yawanci yana cikin kewayon 5 zuwa 15; tare da haɓaka ƙarfin fitarwa, ƙarfin halin yanzu da ƙarfin ƙarfin yana ƙaruwa da sauri, kuma a babban ƙarfin wutan darajar n ya zama 1 saboda asarar kariyar filin maganadisu. Idan a ƙananan ƙarancin wutar lantarki, ana ƙaddamar da fitar da iskar gas ta ions gas wanda ke cikin yanayin fitarwa na yau da kullun; idan a high iko yawa, da rabo daga karfe ions a cikin plasma karuwa da kuma wasu kayan canza, wato a cikin kai sputtering yanayin, watau The plasma ana kiyaye ta ionization na sputtered tsaka tsaki barbashi da secondary karfe ions, da inert gas atom kamar Ar ana amfani ne kawai don ƙone da plasma, bayan haka sputtered karfe bam kusa da niyya barbashi da aka yi niyya zuwa ga barbashi da aka yi niyya. manufa sputtered karkashin aikin Magnetic da lantarki filayen don kula da high halin yanzu fitarwa, kuma plasma ne sosai ionized karfe barbashi. Saboda sputtering aiwatar da dumama sakamako a kan manufa, domin tabbatar da barga aiki na manufa a cikin masana'antu aikace-aikace, da ikon yawa kai tsaye shafi manufa ba zai iya zama ma girma, gabaɗaya kai tsaye ruwa sanyaya da manufa abu thermal watsin ya kamata a cikin yanayin 25 W / cm2 a kasa, kaikaitacce ruwa sanyaya, manufa abu thermal watsin ne matalauta, manufa abu da aka yi nufi da kasawa abubuwa lalacewa ta hanyar da kasawa abubuwan da aka lalacewa ta hanyar kasawa abubuwan da ke haifar da rashin ƙarfi da rashin ƙarfi. sauran lokuta na yawan ƙarfin wutar lantarki na iya zama kawai a cikin 2 ~ 15 W / cm2 a ƙasa, ƙasa da buƙatun babban ƙarfin ƙarfin. Za'a iya magance matsalar zafi mai zafi ta hanyar amfani da kunkuntar bugun jini mai ƙarfi. Anders ya bayyana babban ƙarfin bugun magnetron sputtering a matsayin wani nau'i na sputtering pulsed inda mafi girma ikon yawa ya wuce matsakaicin ƙarfin ƙarfin da 2 zuwa 3 umarni na girma, da kuma manufa ion sputtering ya mamaye tsarin sputtering, da manufa sputtering atoms suna da rarrabuwa sosai.
No.2 Halayen babban iko pulsed magnetron sputtering shafi jijiya
High iko pulsed magnetron sputtering iya samar da plasma tare da high dissociation kudi da kuma high ion makamashi, kuma zai iya amfani da son zuciya matsa lamba don hanzarta da caje ions, da kuma shafi jita-jita tsari da aka bombarded da high-makamashi barbashi, wanda yake shi ne na hali IPVD fasaha. Ƙarfin ion da rarrabawa suna da tasiri mai mahimmanci akan ingancin sutura da aiki.
Game da IPVD, dangane da sanannen tsarin yanki na tsarin Thorton, Anders ya ba da shawarar tsarin tsarin yanki wanda ya haɗa da ƙaddamarwar plasma da ion etching, ya ƙaddamar da dangantaka tsakanin tsarin sutura da zafin jiki da matsa lamba na iska a cikin tsarin tsarin tsarin Thorton zuwa dangantakar da ke tsakanin tsarin sutura, zafin jiki da makamashin ion, kamar yadda aka nuna a cikin hoto 2. A cikin yanayin yanayin ƙananan makamashi ion tsari na tsarin tsari, tsarin tsarin shinge na Thorton. Tare da karuwar yawan zafin jiki, sauyawa daga yankin 1 (lu'ulu'u masu laushi masu laushi) zuwa yankin T (kyawawan lu'ulu'u masu yawa), yanki 2 (lu'ulu'u na columnar) da yanki 3 (yankin recrystallization); tare da ƙara yawan adadin kuzarin ion, canjin yanayin zafi daga yankin 1 zuwa yankin T, yanki na 2 da yanki 3 ya ragu. Za a iya shirya lu'ulu'u na fiber mai girma da lu'ulu'u na columnar a ƙananan zafin jiki. Lokacin da makamashi na ions da aka ajiye ya karu zuwa tsari na 1-10 eV, bombardment da etching na ions a kan shimfidar kayan da aka ajiye yana haɓaka kuma an ƙara yawan kauri.
No.3 Shiri da wuya shafi Layer da high ikon pulsed magnetron sputtering fasaha
Rubutun da aka shirya ta babban ikon pulsed magnetron sputtering fasaha ne mai yawa, tare da mafi inji Properties da high zafin jiki kwanciyar hankali. Kamar yadda aka nuna a cikin Hoto 3, abin rufe fuska na Magnetron na al'ada sputtered TiAlN shine tsarin lu'ulu'u na ginshiƙi tare da taurin 30 GPa da ma'aunin matashi na 460 GPa; rufin HIPIMS-TiAlN shine taurin GPa 34 yayin da ma'aunin matashin shine 377 GPa; rabon da ke tsakanin taurin da ma'aunin matashi shine ma'auni na taurin rufin. Maɗaukakin taurin da ƙarami na matashin matashi yana nufin mafi kyawu. Rubutun HIPIMS-TiAlN yana da mafi kyawun kwanciyar hankali na zafin jiki, tare da yanayin AlN hexagonal wanda aka haɗe a cikin abin rufewar TiAlN na al'ada bayan babban maganin annealing zafin jiki a 1,000 °C na sa'o'i 4. Taurin rufin yana raguwa a babban zafin jiki, yayin da HIPIMS-TiAlN shafi ya kasance baya canzawa bayan maganin zafi a cikin zafin jiki da lokaci guda. HIPIMS-TiAlN shafi kuma yana da mafi girma farkon zafin jiki na high zafin jiki hadawan abu da iskar shaka fiye da na al'ada shafi. Saboda haka, HIPIMS-TiAlN shafi yana nuna mafi kyawun aiki a cikin kayan aikin yankan sauri fiye da sauran kayan aikin da aka rufe ta hanyar PVD.
Lokacin aikawa: Nuwamba-08-2022