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Plasma yakawedzera makemikari vapor deposition

Chinyorwa chinyorwa:Zhenhua vacuum
Verenga:10
Rakabudiswa:22-11-08

Plasma properties
Hunhu hweplasma muplasma-inokwidziridzwa kemikari vapor deposition ndeyekuti inotsamira pane kinetic simba remaerekitironi ari muplasma kumisa maitiro emakemikari muchikamu chegasi.Sezvo plasma iri muunganidzwa wemaoni, maerekitironi, maatomu asina kwaakarerekera uye mamorekuru, haina kwayakarerekera pamagetsi padanho remacroscopic.Mu plasma, simba guru rinochengetwa mukati mesimba re plasma.Plasma yakatanga yakakamurwa kuita inopisa plasma uye inotonhora plasma.mu PECVD system inotonhora plasma iyo inoumbwa nekushomeka kwegasi kubuda.Iyi plasma inogadzirwa neiyo low pressure discharge iri pasi pemazana mashoma Pa is non-equilibrium gas plasma.
Mamiriro eiyi plasma ndeaya anotevera:
(1)Irregular thermal motion of electrons and ions inodarika mafambiro avanoda.
(2) Maitiro ayo eionization anonyanya kukonzerwa nekudhumhana kwemaerekitironi nekukurumidza nemamorekuru egasi.
(3) Avhareji yekupisa simba rekufamba kwemaerekitironi i1 kusvika ku2 maodha ehukuru akakwira kupfuura aya ezvimedu zvinorema, zvakaita semamorekuru, maatomu, ayoni uye mahara radicals.
(4) Kurasikirwa kwesimba mushure mekudhumhana kwemaerekitironi uye zvidimbu zvinorema zvinogona kubhadharwa kubva kumunda wemagetsi pakati pekudhumhana.
Zvakaoma kuratidza yakaderera tembiricha nonequilibrium plasma ine nhamba shoma parameters, nokuti yakaderera-tembiricha nonequilibrium plasma ari PECVD hurongwa, apo erekitironi tembiricha Te haina kufanana tembiricha Tj yezvimedu zvinorema.Mune tekinoroji yePECVD, basa rekutanga replasma nderekugadzira makemikari anoshanda maion uye akasununguka-radicals.Aya maion uye ma-radicals akasununguka anopindirana nemamwe maion, maatomu uye mamorekuru muchikamu chegasi kana kukonzera kukuvadzwa kwelatisi uye maitiro emakemikari panzvimbo ye substrate, uye goho rezvinhu zvinoshanda ibasa re electron density, reactant concentration uye goho coefficient.Mune mamwe mazwi, zvibereko zvezvinhu zvinoshanda zvinoenderana nesimba remunda wemagetsi, gasi rinomanikidza, uye chiyero chemahara chezvikamu panguva yekudhumhana.Sezvo gasi rinoita muplasma rinoparadzana nekuda kwekudhumhana kwemaerekitironi ane simba guru, iyo activation barriers yemakemikari reaction inogona kukundwa uye tembiricha yegasi rinoita reactant inogona kuderedzwa.Musiyano mukuru pakati pePECVD uye yakajairika CVD ndeyekuti iyo thermodynamic misimboti yemakemikari reaction akasiyana.Kuparadzaniswa kwemamorekuru egasi muplasma hakusarudzi, saka iyo firimu layer yakaiswa nePECVD yakasiyana zvachose neyakajairwa CVD.Kuumbwa kwechikamu kunogadzirwa nePECVD kunogona kunge kusina kuenzana kwakasiyana, uye kuumbwa kwayo hakuchina kuganhurirwa ne equilibrium kinetics.Iyo yakajairika firimu layer ndeye amorphous state.

Plasma yakawedzera makemikari vapor deposition

PECVD zvinhu
(1) Low deposition tembiricha.
(2) Deredza kushushikana kwemukati kunokonzerwa nekusawirirana kwemutsara wekuwedzera kweyero ye membrane / base zvinhu.
(3) Chiyero chekuisa chakanyanya kukwirira, kunyanya kuderera kwekushisa kwekushisa, izvo zvinobatsira kuwana amorphous uye microcrystalline mafirimu.

Nekuda kweiyo yakaderera tembiricha maitiro ePECVD, kukuvadzwa kwemafuta kunogona kudzikiswa, kupararira kwepakati uye kuita pakati peiyo firimu layer uye substrate zvinhu zvinogona kuderedzwa, nezvimwe, kuitira kuti zvinhu zvemagetsi zviputirwe zvese zvisati zvagadzirwa kana nekuda kwechido. kuti rework.Pakugadzirwa kwema-ultra-large scale integrated circuits (VLSI, ULSI), tekinoroji yePECVD inoshandiswa zvinobudirira pakuumbwa kwesilicon nitride firimu (SiN) sefirimu rekupedzisira rekudzivirira mushure mekuumbwa kweAl electrode wiring, pamwe nekubata bata uye kuumbwa kwesilicon oxide firimu se interlayer insulation.Semidziyo yefirimu yakaonda, tekinoroji yePECVD yakashandiswawo zvakabudirira pakugadzirwa kwemaonda-film transistors (TFTs) yeLCD kuratidza, nezvimwewo, vachishandisa girazi se substrate mune inoshanda matrix nzira.Nekuvandudzwa kwemasekete akabatanidzwa kusvika kuhukuru hukuru uye kubatanidzwa kwepamusoro uye kushandiswa kwakawanda kwemakomponi semiconductor zvishandiso, PECVD inofanirwa kuitwa pakadzika tembiricha uye yakakwira magetsi emagetsi maitiro.Kuti zvizadzise zvinodiwa izvi, matekinoroji anogona kugadzira mafirimu epamusoro-soro patembiricha yakaderera anogadzirwa.Mafirimu eSiN neSiOx akadzidzwa zvakanyanya pachishandiswa ECR plasma uye tekinoroji itsva yeplasma kemikari vapor deposition (PCVD) ine helical plasma, uye asvika padanho rinoshanda mukushandiswa kwemafirimu ekuvharisa mafirimu ezvikamu zvakakura zvakabatanidzwa, nezvimwe.


Nguva yekutumira: Nov-08-2022