Hoʻonui ʻia ka waiho ʻana o ka mahu kemika plasma

Nā waiwai plasma
ʻO ke ʻano o ka plasma i loko o ka waiho ʻana o ka mahu kemika i hoʻonui ʻia e ka plasma, ʻo ia ka hilinaʻi ʻana i ka ikehu kinetic o nā electrons i loko o ka plasma e hoʻāla i nā hopena kemika i loko o ke ʻano kinoea. ʻOiai ʻo ka plasma kahi hōʻiliʻili o nā ions, nā electrons, nā ʻātoma kūlike ʻole a me nā molekala, he kūlike ʻole ia ma ka pae macroscopic. I loko o kahi plasma, ua mālama ʻia ka nui o ka ikehu i loko o ka ikehu kūloko o ka plasma. Ua māhele mua ʻia ka plasma i ka plasma wela a me ka plasma anuanu. ma ka ʻōnaehana PECVD he plasma anuanu ia i hoʻokumu ʻia e ka hoʻokuʻu ʻana o ke kinoea haʻahaʻa. ʻO kēia plasma i hana ʻia e ka hoʻokuʻu ʻana o ke kaomi haʻahaʻa ma lalo o kekahi mau haneli Pa he plasma kinoea kaulike ʻole.
ʻO ke ʻano o kēia plasma penei:
(1)ʻOi aku ka neʻe wela kūpono ʻole o nā electrons a me nā ions ma mua o kā lākou neʻe kuhikuhi.
(2) ʻO ke kumu nui o kāna kaʻina hana ionization ʻo ia ke kuʻi ʻana o nā electrons wikiwiki me nā molekala kinoea.
(3) ʻO ka ikehu neʻe wela awelika o nā electrons he 1 a 2 mau kauoha o ka nui i ʻoi aku ma mua o nā ʻāpana kaumaha, e like me nā molekala, nā ʻātoma, nā ion a me nā radical manuahi.
(4) Hiki ke uku ʻia ka nalowale o ka ikehu ma hope o ke kuʻi ʻana o nā electrons a me nā ʻāpana kaumaha mai ke kahua uila ma waena o nā kuʻi ʻana.
He mea paʻakikī ke wehewehe i kahi plasma nonequilibrium haʻahaʻa me kahi helu liʻiliʻi o nā palena, no ka mea, he plasma nonequilibrium haʻahaʻa ia i loko o kahi ʻōnaehana PECVD, kahi i like ʻole ai ka mahana o ka electron Te me ka mahana Tj o nā ʻāpana kaumaha. Ma ka ʻenehana PECVD, ʻo ka hana nui o ka plasma ka hana ʻana i nā ion hana kemika a me nā radical manuahi. Hoʻopili kēia mau ion a me nā radical manuahi me nā ion ʻē aʻe, nā ʻātoma a me nā molekala i loko o ke kahua kinoea a i ʻole e hōʻino i ka lattice a me nā hopena kemika ma ka ʻili substrate, a ʻo ka hua o ka mea hana he hana ia o ka nui o ka electron, ka nui o ka reactant a me ka coefficient hua. I nā huaʻōlelo ʻē aʻe, hilinaʻi ka hua o ka mea hana i ka ikaika o ke kahua uila, ke kaomi kinoea, a me ka awelika manuahi o nā ʻāpana i ka manawa o ke kuʻi ʻana. I ka wā e hoʻokaʻawale ai ke kinoea reactant i loko o ka plasma ma muli o ke kuʻi ʻana o nā electrons ikehu kiʻekiʻe, hiki ke lanakila i ka pale hoʻāla o ka hopena kemika a hiki ke hoʻemi ʻia ka mahana o ke kinoea reactant. ʻO ka ʻokoʻa nui ma waena o PECVD a me CVD maʻamau, ʻo ia ka ʻokoʻa o nā kumumanaʻo thermodynamic o ka hopena kemika. ʻAʻole koho ʻia ka hoʻokaʻawale ʻana o nā molekala kinoea i loko o ka plasma, no laila ʻokoʻa loa ka papa kiʻiʻoniʻoni i waiho ʻia e PECVD mai ka CVD maʻamau. ʻO ka haku mele ʻana o ka pae i hana ʻia e PECVD he kū hoʻokahi ʻole ia, a ʻaʻole i kaupalena ʻia kona hoʻokumu ʻia e nā kinetics kaulike. ʻO ka papa kiʻiʻoniʻoni maʻamau loa he kūlana amorphous.

Nā hiʻohiʻona PECVD
(1) Haʻahaʻa ka mahana waiho ʻana.
(2) E hōʻemi i ke kaumaha kūloko i hoʻokumu ʻia e ka mismatch o ka coefficient hoʻonui linear o ka membrane/base material.
(3) He kiʻekiʻe loa ka nui o ka waiho ʻana, ʻoiai ka waiho ʻana i ka mahana haʻahaʻa, kahi mea e kūpono ai i ka loaʻa ʻana o nā kiʻiʻoniʻoni amorphous a me microcrystalline.

Ma muli o ke kaʻina hana haʻahaʻa o ka PECVD, hiki ke hoʻemi ʻia ka pōʻino wela, hiki ke hoʻemi ʻia ka hoʻolaha like ʻana a me ka hopena ma waena o ka papa kiʻiʻoniʻoni a me ka mea substrate, a pēlā aku, i hiki ke uhi ʻia nā ʻāpana uila ma mua o ka hana ʻia ʻana a i ʻole ma muli o ka pono no ka hana hou ʻana. No ka hana ʻana o nā kaapuni hoʻohuihui nui loa (VLSI, ULSI), ua hoʻopili pono ʻia ka ʻenehana PECVD i ka hoʻokumu ʻana o ka kiʻiʻoniʻoni silicon nitride (SiN) ma ke ʻano he kiʻiʻoniʻoni pale hope loa ma hope o ka hoʻokumu ʻana o ka uea electrode Al, a me ka hoʻopalahalaha ʻana a me ka hoʻokumu ʻana o ka kiʻiʻoniʻoni silicon oxide ma ke ʻano he insulation interlayer. Ma ke ʻano he mau mea hana kiʻiʻoniʻoni lahilahi, ua hoʻopili pono ʻia ka ʻenehana PECVD i ka hana ʻana o nā transistors kiʻiʻoniʻoni lahilahi (TFTs) no nā hōʻike LCD, a pēlā aku, me ka hoʻohana ʻana i ke aniani ma ke ʻano he substrate i ke ʻano matrix hana. Me ka hoʻomohala ʻana o nā kaapuni hoʻohuihui i ka nui a me ka hoʻohui kiʻekiʻe a me ka hoʻohana nui ʻana o nā mea hana semiconductor hui, pono e hana ʻia ka PECVD ma ka mahana haʻahaʻa a me nā kaʻina hana ikehu electron kiʻekiʻe. No ka hoʻokō ʻana i kēia koi, pono e hoʻomohala ʻia nā ʻenehana e hiki ke synthesize i nā kiʻiʻoniʻoni flatness kiʻekiʻe ma nā mahana haʻahaʻa. Ua aʻo nui ʻia nā kiʻiʻoniʻoni SiN a me SiOx me ka hoʻohana ʻana i ka plasma ECR a me kahi ʻenehana hoʻokaʻawale vapor kemika plasma hou (PCVD) me kahi plasma helical, a ua hōʻea i kahi pae kūpono i ka hoʻohana ʻana i nā kiʻiʻoniʻoni insulation interlayer no nā kaapuni hoʻohui nui aʻe, a pēlā aku.