Sifofin plasma
Yanayin plasma a cikin ajiyar tururin sinadarai da aka inganta a cikin plasma shine yana dogara ne akan kuzarin motsi na electrons a cikin plasma don kunna halayen sinadarai a cikin matakin iskar gas. Tunda plasma tarin ions ne, electrons, atoms masu tsaka tsaki da ƙwayoyin halitta, yana tsaka tsaki a wutar lantarki a matakin macroscopic. A cikin plasma, ana adana babban adadin kuzari a cikin kuzarin ciki na plasma. An raba plasma zuwa plasma mai zafi da plasma mai sanyi. A cikin tsarin PECVD, plasma mai sanyi ne wanda aka samar ta hanyar fitar da iskar gas mai ƙarancin matsin lamba. Wannan plasma da aka samar ta hanyar fitar da ƙarancin matsin lamba ƙasa da ƴan Pa kaɗan plasma ne na gas mara daidaito.
Tsarin wannan plasma shine kamar haka:
(1) Motsin zafi mara tsari na electrons da ions ya wuce motsin da aka nuna musu.
(2) Tsarin ionization ɗinsa galibi yana faruwa ne sakamakon karo da electrons masu sauri da ƙwayoyin iskar gas.
(3) Matsakaicin kuzarin motsi na zafi na electrons yana da girma daga 1 zuwa 2 fiye da na barbashi masu nauyi, kamar ƙwayoyin halitta, atom, ions da free radicals.
(4) Ana iya rama asarar makamashi bayan karo na electrons da barbashi masu nauyi daga filin lantarki tsakanin karo.
Yana da wuya a iya kwatanta plasma mai ƙarancin zafin jiki wanda ba shi da daidaito tare da ƙaramin adadin sigogi, saboda plasma ne mai ƙarancin zafin jiki wanda ba shi da daidaito a cikin tsarin PECVD, inda zafin lantarki Te ba iri ɗaya bane da zafin jiki na ƙwayoyin cuta masu nauyi. A cikin fasahar PECVD, babban aikin plasma shine samar da ions masu aiki da sinadarai da ƙwayoyin cuta masu aiki. Waɗannan ions da free-radicals suna amsawa tare da wasu ions, atoms da ƙwayoyin cuta a cikin yanayin iskar gas ko kuma suna haifar da lalacewar lattice da halayen sinadarai a saman substrate, kuma yawan kayan aiki yana aiki ne da yawan electrons, yawan amsawa da kuma yawan samarwa. A wata ma'anar, yawan kayan aiki ya dogara ne akan ƙarfin filin lantarki, matsin iskar gas, da matsakaicin kewayon 'yanci na ƙwayoyin cuta a lokacin karo. Yayin da iskar gas mai amsawa a cikin plasma ke rabuwa saboda karo na electrons masu ƙarfi, ana iya shawo kan shingen kunnawa na amsawar sinadarai kuma ana iya rage zafin iskar gas mai amsawa. Babban bambanci tsakanin PECVD da CVD na al'ada shine cewa ka'idodin thermodynamic na amsawar sinadarai sun bambanta. Rarrabuwar ƙwayoyin iskar gas a cikin plasma ba ta da zaɓi, don haka layin fim ɗin da PECVD ya ajiye ya bambanta gaba ɗaya da na al'ada CVD. Tsarin lokaci da PECVD ya samar na iya zama wanda ba shi da daidaito na musamman, kuma samuwarsa ba ta da iyaka ta hanyar kinetics na daidaito. Mafi yawan layin fim ɗin shine yanayin rashin tsari.
Siffofin PECVD
(1) Ƙananan zafin ajiya.
(2) Rage damuwa ta ciki da rashin daidaiton ma'aunin faɗaɗa layi na membrane/tushe ke haifarwa.
(3) Yawan ajiyar yana da yawa, musamman ajiyar yanayin zafi mai ƙarancin yawa, wanda ke da amfani ga samun fina-finan amorphous da microcrystalline.
Saboda ƙarancin zafin jiki na PECVD, ana iya rage lalacewar zafi, yaduwar juna da amsawa tsakanin layin fim da kayan substrate, da sauransu, ta yadda za a iya rufe sassan lantarki duka kafin a yi su ko kuma saboda buƙatar sake yin aiki. Don ƙera da'irori masu girman gaske (VLSI, ULSI), an yi amfani da fasahar PECVD cikin nasara wajen ƙirƙirar fim ɗin silicon nitride (SiN) a matsayin fim na ƙarshe mai kariya bayan ƙirƙirar wayoyi na lantarki na Al, da kuma daidaita da kuma ƙirƙirar fim ɗin silicon oxide a matsayin rufin da ke tsakanin layuka. A matsayin na'urori masu sirara, an kuma yi amfani da fasahar PECVD cikin nasara wajen ƙera transistors na fim mai sirara (TFTs) don nunin LCD, da sauransu, ta amfani da gilashi a matsayin substrate a cikin hanyar matrix mai aiki. Tare da haɓaka da'irori masu haɗawa zuwa babban sikelin da haɗin kai mafi girma da kuma amfani da na'urorin semiconductor masu haɗawa sosai, ana buƙatar a yi PECVD a ƙananan zafin jiki da kuma hanyoyin makamashin lantarki mafi girma. Don biyan wannan buƙata, za a haɓaka fasahar da za ta iya haɗa manyan fina-finai masu faɗi a ƙananan zafin jiki. An yi nazari sosai kan fina-finan SiN da SiOx ta amfani da sinadarin ECR da sabuwar fasahar adana tururin sinadarai ta plasma (PCVD) tare da sinadarin helical, kuma sun kai matakin amfani da fina-finan kariya tsakanin layuka don manyan da'irori masu hadewa, da sauransu.
Lokacin Saƙo: Nuwamba-08-2022