ʻO nā waiwai plasma
ʻO ke ʻano o ka plasma i loko o ka plasma-enhanced chemical vapor deposition ʻo ia ke hilinaʻi nei i ka ikehu kinetic o nā electrons i loko o ka plasma e hoʻāla ai i nā hopena kemika i ka pae kinoea. No ka mea, ʻo ka plasma ka hōʻiliʻili o nā ion, electron, neutral atoms a me nā molekala, ʻaʻohe uila ma ka pae macroscopic. I loko o kahi plasma, mālama ʻia ka nui o ka ikehu i loko o ka ikehu kūloko o ka plasma. Hoʻokaʻawale mua ʻia ka plasma i ka plasma wela a me ka plasma anu. i loko o ka PECVD ʻōnaehana he plasma anu i hana ʻia e ka haʻahaʻa haʻahaʻa haʻahaʻa kinoea hoʻokuʻu. ʻO kēia plasma i hana ʻia e ka hoʻokuʻu haʻahaʻa haʻahaʻa ma lalo o kahi mau haneli Pa he plasma kinoea non-equilibrium.
ʻO ke ʻano o kēia plasma penei:
(1) ʻOi aku ka neʻe wela o nā electrons a me nā ion i ko lākou neʻe kuhikuhi.
(2) ʻO kāna kaʻina hana ionization ka mea nui ma muli o ka hui ʻana o nā electrons wikiwiki me nā molekole kinoea.
(3) ʻO ka awelika wela o ka ikehu o nā electrons he 1 a 2 mau kauoha o ka nui ma mua o nā ʻāpana koʻikoʻi, e like me nā molekala, nā mana, nā ion a me nā radical manuahi.
(4) Hiki ke hoʻopaʻi ʻia ka nalowale o ka ikehu ma hope o ka hui ʻana o nā electrons a me nā mea kaumaha mai ke kahua uila ma waena o nā collisions.
He mea paʻakikī keʻano o ka plasma nonequilibrium haʻahaʻa me kahi helu liʻiliʻi o nā palena, no ka mea, he plasma nonequilibrium haʻahaʻa haʻahaʻa i loko o kahi pūnaewele PECVD, kahi i likeʻole ai ka mahana electron Te me ka wela Tj o nā mea kaumaha. I ka ʻenehana PECVD, ʻo ka hana mua o ka plasma ka hana ʻana i nā ion chemically active a me nā radical free. Hoʻopili kēia mau ion a me nā radical manuahi me nā ion ʻē aʻe, nā ʻātoma a me nā molekala i loko o ka pae kinoea a i ʻole e hoʻopōʻino i ka lattice a me nā hopena kemika ma ka ʻili o ka substrate, a ʻo ka hāʻawi ʻana o ka mea hana he hana ia o ka electron density, reactant concentration and yiefficient huahua. I nā huaʻōlelo ʻē aʻe, pili ka hua o nā mea hana i ka ikaika o ke kahua uila, ke kaomi kinoea, a me ka awelika manuahi o nā ʻāpana i ka manawa o ka hui ʻana. E like me ke kinoea reactant i loko o ka plasma dissociates ma muli o ka collision o ka ikehu kiʻekiʻe electrons, hiki ke lanakila ka pale ho'āla o ka hopena kemika a hiki ke ho'ēmiʻia ka mahana o ke kinoea reactant. ʻO ka ʻokoʻa nui ma waena o PECVD a me CVD maʻamau ʻo ia ka ʻokoʻa o nā kumu thermodynamic o ka hopena kemika. ʻAʻole koho ka dissociation o nā molekele kinoea i loko o ka plasma, no laila ʻokoʻa loa ka papa kiʻiʻoniʻoni i waiho ʻia e PECVD mai ka CVD maʻamau. ʻO ka haku mele ʻana i hana ʻia e PECVD ʻaʻole hiki ke hoʻohālikelike ʻia, a ʻaʻole i kaupalena ʻia kona hoʻokumu ʻana e nā kinetics equilibrium. ʻO ka papa kiʻiʻoniʻoni maʻamau he kūlana amorphous.
Nā hiʻohiʻona PECVD
(1) Haʻahaʻa deposition wela.
(2) E ho'ēmi i ke koʻikoʻi o loko ma muli o ka like ʻole o ka hoʻonui laina laina o ka membrane/mea kumu.
(3) He kiʻekiʻe ke kiʻekiʻe o ka deposition, ʻoi aku ka haʻahaʻa haʻahaʻa haʻahaʻa, kahi kūpono i ka loaʻa ʻana o nā kiʻi ʻoniʻoni amorphous a me microcrystalline.
Ma muli o ke kaʻina haʻahaʻa haʻahaʻa o PECVD, hiki ke hoʻemi ʻia ka pōʻino wela, hiki ke hoʻemi ʻia ka diffusion a me ka hopena ma waena o ka papa kiʻiʻoniʻoni a me nā mea substrate, a me nā mea ʻē aʻe, i hiki ke uhi ʻia nā mea uila ma mua o ka hana ʻana a i ʻole no ka pono o ka hana hou. No ka hana 'ana i ka ultra-large scale integrated circuits (VLSI, ULSI), PECVD technology is successfully applied to the formation of silicon nitride film (SiN) like me ka hope pale kiʻiʻoniʻoni ma hope o ka hookumu ana o Al electrode wiring, a me ka palahalaha a me ka hookumu ana o ka silicon oxide film like interlayer insulation. Ma ke ʻano he ʻenehana kiʻiʻoniʻoni lahilahi, ua hoʻohana maikaʻi ʻia ka ʻenehana PECVD i ka hana ʻana i nā transistors kiʻiʻoniʻoni lahilahi (TFTs) no nā hōʻike LCD, a me nā mea ʻē aʻe, me ka hoʻohana ʻana i ke aniani ma ke ʻano he substrate i ke ʻano matrix active. Me ka hoʻomohala ʻana o nā kaapuni i hoʻohui ʻia i ka nui a me ka hoʻohui kiʻekiʻe a me ka hoʻohana nui ʻana i nā mea semiconductor compound, pono e hana ʻia ka PECVD ma ka haʻahaʻa haʻahaʻa a me nā kaʻina hana ikehu electron kiʻekiʻe. No ka hoʻokō ʻana i kēia koi, pono e hoʻomohala ʻia nā ʻenehana hiki ke hoʻohui i nā kiʻi ʻoniʻoni palahalaha kiʻekiʻe ma nā haʻahaʻa haʻahaʻa. Ua aʻo nui ʻia nā kiʻi ʻoniʻoni SiN a me SiOx me ka hoʻohana ʻana i ka plasma ECR a me kahi ʻenehana hou plasma chemical vapor deposition (PCVD) me kahi plasma helical, a ua hiki i kahi pae kūpono i ka hoʻohana ʻana i nā kiʻi ʻoniʻoni interlayer insulation no nā kaapuni hoʻohui nui, etc.
Ka manawa hoʻouna: Nov-08-2022