Iimeko zokugquma i-ion ye-cathode engenanto

Ezi meko zilandelayo ziyafuneka ukuze kuvuthelwe isibane se-cathode arc esingenanto:

1. Isibhamu se-cathode esingenanto esenziwe ngetyhubhu ye-tantalum sifakwe eludongeni lwegumbi lokugquma kwaye singasetyenziselwa ukukhupha ukuhamba kwe-electron eshushu. Ububanzi bangaphakathi betyhubhu ethe tyaba yi-φ 6~ φ 15mm, kunye nobukhulu bodonga obuyi-0.8-2mm.

1. Umbane wenziwe ngombane oqala nge-arc kunye nombane ogcina i-arc ngaxeshanye. I-voltage yombane obetha nge-arc yi-800-1000V, kwaye i-arc striking current yi-30-50A; I-arc voltage yi-40-70V, kwaye i-arc current yi-80-300A.

Inkqubo yokukhupha i-hollow cathode arc ilandela inkqubo yokuguqula ukusuka ekukhutshweni okungaqhelekanga kokukhanya ukuya ekukhutshweni kwe-arc kwi-"volt ampere characteristic curve". Okokuqala, kufuneka umbane ukuze kubonelelwe nge-800V starting voltage ukuvelisa ukukhutshelwa kokukhanya kwityhubhu ye-tantalum. Ii-argon ion eziphezulu ngaphakathi kwityhubhu ye-tantalum ziqhuma kwaye zifudumale ityhubhu ukuya kubushushu apho kukhutshwa khona ii-electron ezishushu, nto leyo ebangela ukuba kubekho ukuhamba okukhulu kwe-plasma electron kunye nokwanda ngequbuliso komsinga we-hollow cathode arc. Emva koko, kufuneka umbane ophezulu wamandla ukuze kugcinwe ukukhutshelwa kwe-arc. Inkqubo yokuguqula ukusuka ekukhutshelweni kokukhanya ukuya ekukhutshweni kwe-arc izenzekela ngokuzenzekelayo, ngoko ke kuyimfuneko ukumisela umbane onokukhupha zombini i-voltage ephezulu kunye nomsinga ophezulu.

Ukuba ezi mfuno zimbini zigxile kumthombo omnye wamandla, isiphelo sesibini sokukhupha amandla esiguquliweyo kufuneka sivalwe ngeengcingo ezixineneyo kakhulu kangangeenguqu ezininzi ukuze kukhutshwe i-voltage ephezulu kunye ne-current ephezulu, eya kuba ngumthombo wamandla omkhulu. Emva kweminyaka yokuphuculwa, kunokwenzeka ukulinganisa umbane omncinci wokuqala we-arc ngombane we-arc wokulungisa. Umbane wokuqala we-arc usebenzisa iingcingo ezincinci ukujikajika ezininzi, ezinokukhupha i-voltage ephezulu ye-800V ukutshisa iityhubhu ze-tantalum kunye nokuvelisa i-glow discharge; Umbane we-arc unokukhupha amashumi ee-volts kunye namakhulu ee-amperes zamandla ngokujika i-wire exineneyo ene-turns ezimbalwa ukugcina uzinzo lwe-hollow cathode arc discharge. Ngenxa yoqhagamshelo oluhambelanayo lwezixhobo zamandla ezimbini kwiityhubhu ze-tantalum, ngexesha lenkqubo yokuguqula ukusuka kwi-glow discharge engaqhelekanga ukuya kwi-arc discharge, izixhobo zamandla ezimbini ziya kunxibelelana ngokuzenzekelayo kwaye zitshintshe ukusuka kwi-voltage ephezulu kunye ne-low current ukuya kwi-voltage ephantsi kunye ne-high current.

1. Lungisa ngokukhawuleza inqanaba le-vacuum. Inqanaba le-vacuum lokukhupha ukukhanya kwiityhubhu ze-tantalum limalunga ne-100Pa, kwaye isakhiwo sefilimu efakwe phantsi kweemeko ezinjalo ze-vacuum eziphantsi ngokungenakuphepheka sirhabaxa. Ke ngoko, emva kokutshisa i-arc discharge, kuyimfuneko ukunciphisa ngoko nangoko inani lokuhamba komoya kwaye ulungise ngokukhawuleza inqanaba le-vacuum ukuya kwi-8×10-1~2Pa ukuze ufumane isakhiwo sefilimu sokuqala esihle.

1. I-turntable yomsebenzi ifakwe ejikeleze igumbi lokugquma, apho i-workpiece iqhagamshelwe kwi-negative pole yombane we-bias kwaye igumbi le-vacuum liqhagamshelwe kwi-positive pole. Ngenxa yoxinano oluphezulu lwangoku lwe-hollow cathode arc, i-bias voltage ye-ion coated workpiece ayifuni ukufikelela kwi-1000V, ngesiqhelo i-50-200V.

5. Beka ikhoyili ye-electromagnetic egxile kwi-Gan collapse, kwaye intsimi ye-electromagnetic eyenziwe ngokusebenzisa umbane kwikhoyili inokujolisa umqadi we-electron embindini we-ingot yesinyithi, inyuse uxinano lwamandla okuhamba kwe-electron.