Ho roala ha vacuum haholo-holo ho kenyelletsa ho kenngoa ha mouoane oa vacuum, ho roala ha metsi le ho roala ha ion, tseo kaofela li sebelisetsoang ho beha lifilimi tse sa tšoaneng tsa tšepe le tse seng tsa tšepe holim'a likarolo tsa polasetiki ka distillation kapa sputtering tlas'a maemo a vacuum, a ka fumanang lesela le lesesaane haholo. ka molemo o hlahelletseng oa ho khomarela ka potlako, empa theko e boetse e phahame, 'me mefuta ea litšepe tse ka sebelisoang e fokotsehile,' me ka kakaretso e sebelisoa bakeng sa ho roala ha lihlahisoa tsa lihlahisoa tse phahameng.
Vacuum vapor deposition ke mokhoa oa ho futhumatsa tšepe tlas'a vacuum e phahameng, e etsa hore e qhibilihe, e fetohe mouoane, 'me e thehe filimi e tšesaane ea tšepe holim'a sampuli ka mor'a ho pholile, e nang le botenya ba 0.8-1.2 mm.E tlatsa likaroloana tse nyenyane tsa concave le li-convex holim'a sehlahisoa se entsoeng ho fumana seipone se kang seipone. e tlameha ho koaheloa.
Hangata ho sputtering ho bolela magnetron sputtering, e leng mokhoa oa lebelo le tlaase oa mocheso o tlaase.Ts'ebetso e hloka vacuum ea hoo e ka bang 1 × 10-3Torr, ke hore 1.3 × 10-3Pa vacuum state e tlatsitsoeng ka argon ea khase ea inert (Ar), le lipakeng tsa substrate ea polasetiki (anode) le sepheo sa tšepe (cathode) hammoho le matla a phahameng a motlakase. hona joale ka ho toba, ka lebaka la ho tsosoa ha elektronike ea khase e sa sebetseng e hlahisoang ke ho tsoa ha khanya, ho hlahisa plasma, plasma e tla phatloha liathomo tsa sepheo sa tšepe ebe e li beha holim'a substrate ea polasetiki.Boholo ba likhoele tse akaretsang tsa tšepe li sebelisa sputtering ea DC, athe lisebelisoa tsa ceramic tse sa sebetseng li sebelisa RF AC sputtering.
Ho roala ha ion ke mokhoa oo ho ntšoang khase ho sebelisoang ho kenya khase e itseng kapa ntho e mouoane tlas'a maemo a vacuum, 'me ntho e mouoane kapa li-reactants tsa eona li beoa holim'a substrate ka ho phatloha ha li-ion tsa khase kapa li-ion tsa ntho e mouoane.Tsena li kenyelletsa magnetron sputtering ion coating, reactive ion coating, hollow cathode discharge ion coating (hollow cathode vapor deposition method), le multi-arc ion coating (cathode arc ion coating).
E otlolohileng ka mahlakoreng a mabeli magnetron sputtering coating coating in line
Ts'ebeliso e pharalletseng, e ka sebelisoa bakeng sa lihlahisoa tsa elektroniki joalo ka lesela le sireletsang la EMI la notebook shell, lihlahisoa tse bataletseng, esita le lihlahisoa tsohle tsa senoelo sa lebone ka har'a maemo a itseng a bophahamo li ka hlahisoa.Bophahamo bo boholo ba ho belesa, ho thinya ha compact le ho thekesela ho thekeselang ha likopi tse bobebe tsa conical bakeng sa ho roala ka mahlakoreng a mabeli, tse ka bang le matla a maholo a ho laela.Boleng bo tsitsitseng, botsitso bo botle ba lera la filimi ho tloha ho sehlopha ho ea ho sehlopha.Tekanyo e phahameng ea boiketsetso le litšenyehelo tse tlase tsa basebetsi.
Nako ea poso: Nov-07-2022