Vacuum coating inonyanya kusanganisira vacuum vapor deposition, sputtering coating uye ion coating, ese ayo anoshandiswa kuisa akasiyana simbi uye asiri-simbi mafirimu pamusoro pezvikamu zvepurasitiki ne distillation kana sputtering pasi pevacuum mamiriro, ayo anogona kuwana yakanyanya kutetepa yekuputira pamusoro. ine mukana wakatanhamara wekutsanya kunamatira, asi mutengo wakakwira zvakare, uye mhando dzesimbi dzinogona kushandiswa ishoma, uye dzinowanzo shandiswa kupfekedza kushanda kwezvigadzirwa zvegiredhi repamusoro.
Vacuum vapor deposition inzira yekudziisa simbi pasi pevhayumu yakakwira, ichiita kuti inyuuke, inyunguduke, uye igadzire firimu resimbi rakatetepa pamusoro pesample mushure mekutonhora, ine ukobvu hwe0.8-1.2 um.Iyo inozadza mudiki diki uye convex zvikamu pamusoro pechigadzirwa chakaumbwa kuti uwane girazi-rakafanana nepamusoro.Kana vacuum vapor deposition inoitwa kana kuwana inopenya girazi mhedzisiro kana vacuum vaporize simbi ine yakaderera adhesion, pasi pepamusoro. inofanira kuvharwa.
Sputtering kazhinji inoreva magnetron sputtering, inova nzira yekumhanyisa yakaderera-tembiricha yekupopota.Iyo nzira inoda vacuum ingangoita 1 × 10-3Torr, iri 1.3 × 10-3Pa vacuum state yakazadzwa inert gasi argon (Ar), uye pakati pepurasitiki substrate (anode) uye simbi inotarirwa (cathode) pamwe nepamusoro-voltage. yakananga ikozvino, nekuda kweiyo maerekitironi excitation yeinert gasi inogadzirwa nekupenya inobuda, ichigadzira plasma, iyo plasma inoputika kunze maatomu esimbi inotangwa uye inoaisa pane yepurasitiki substrate.Mazhinji eakajairwa simbi machira anoshandisa DC sputtering, nepo zvisiri-conductive ceramic zvinhu zvinoshandisa RF AC sputtering.
Ion coating inzira inoshandiswa kuburitsa gasi kuita ionize gasi kana chinhu chinobuda mumhepo pasi pevacuum mamiriro, uye chinhu chinoputika kana zvinogadzirisa zvinoiswa pane substrate nekubhomba kweiyoni yegasi kana maion echinhu chinobuda.Izvi zvinosanganisira magnetron sputtering ion coating, reactive ion coating, hollow cathode discharge ion coating (hollow cathode vapor deposition method), uye multi-arc ion coating (cathode arc ion coating).
Vertical kaviri-sided magnetron sputtering inopfuurira coating mumutsara
Kushanda kwakakura, kunogona kushandiswa kune zvigadzirwa zvemagetsi senge notebook shell EMI shielding layer, flat products, uye kunyangwe zvese zvigadzirwa zvekapu yemarambi mukati mehumwe hurefu hwekutsanangurwa zvinogona kugadzirwa.Huru hwekurodha huwandu, compact clamping uye kudzika kurovera kweconical mwenje makapu ekuputira-mativi maviri, ayo anogona kuve nehukuru hwekurodha.Hunhu hwakagadzikana, kuenderana kwakanaka kwemufirimu layer kubva pabatch kuenda pabatch.Yakakwira degree re otomatiki uye yakaderera inomhanya mutengo wevashandi.
Nguva yekutumira: Nov-07-2022