ʻIkepili o ka ʻenehana uhi paʻakikī: Nā Kumumanaʻo Hana a me ka Noi

I nā ʻōnaehana hana hou, ʻo ka pololei o ka huahana, ka pono o nā lako, a me ke ola lawelawe ʻāpana e hilinaʻi nui ʻia ana i nā holomua o ka ʻenekinia ʻili. Ma ke ʻano he ʻano hana koʻikoʻi o ka mālama ʻana i ka ʻili, ua hoʻohana nui ʻia ka ʻenehana uhi paʻakikī ma nā ʻoihana e like me nā mea hana ʻoki, nā ʻōmole, nā ʻāpana koʻikoʻi o ke kaʻa, a me nā huahana 3C. Hana ia ma ke ʻano he mea hiki ke hoʻoikaika i ka lōʻihi, ka hilinaʻi, a me ka hana holoʻokoʻa.

Helu 1 Wehewehe ʻenehana a me ke kūlana hana

ʻO ka "nā uhi paʻakikī" ma ke ʻano laulā e pili ana i nā ʻili lahilahi hana i waiho ʻia ma luna o kahi substrate ma o nā ʻano Physical Vapor Deposition (PVD) a i ʻole Chemical Vapor Deposition (CVD). ʻO ka mānoanoa o kēia mau uhi maʻamau mai 1 a 5 μm, me ka microhardness kiʻekiʻe (>2000 HV), ka coefficient haʻahaʻa o ka friction (<0.3), ka paʻa wela maikaʻi loa, a me ka hoʻopili interfacial ikaika—e hoʻolōʻihi nui ana i ke ola lawelawe a me nā palena hana o nā mea substrate.

Ma mua o ka hana wale ʻana ma ke ʻano he "uhi" ʻili, ua hana ʻia nā uhi paʻakikī me nā ʻano papa i hoʻomaikaʻi ʻia, nā mea i koho ʻia, a me nā ʻano hana hoʻopili uhi substrate i hana kūikawā ʻia. Hiki i kēia i nā uhi ke kū i nā kūlana hana paʻakikī i ka manawa like e hāʻawi ana i ke kūpaʻa ʻana i ka ʻaʻahu, ke kūpaʻa wela, a me ka pale ʻana i ka pala.

Nā Kumu Hana No.2 o ka Uhi Paʻakikī

Hoʻokomo mua ʻia nā uhi paʻakikī me ka hoʻohana ʻana i ʻelua mau ʻano hana nui: Physical Vapor Deposition (PVD) a me Chemical Vapor Deposition (CVD).

1. Ka Waiho ʻana o ka Mahu Kino (PVD)

He hana hoʻoheheʻe ʻia ka PVD kahi e hoʻoheheʻe ʻia ai ka mea uhi, sputtering, a i ʻole ionization a waiho i kahi ʻili lahilahi ma luna o ka ʻili substrate. ʻO ke kaʻina hana maʻamau e pili ana i:

Ka mahu ʻana o nā mea a i ʻole ka pīpī ʻana

Ka halihali ʻana i ka pae mahu: Neʻe nā ʻātoma/ion i loko o kahi ʻano hakahaka

Hoʻokumu ʻia ʻana o ka ʻiliʻili: Ka hoʻohuihui ʻana a me ka ulu ʻana o kahi uhi mānoanoa ma luna o ka substrate

ʻO nā ʻano hana PVD maʻamau:

Ka mahu wela

Ka hoʻoheheʻe ʻana o Magnetron

Uhi ʻAiona Arc

2. Ka Waiho ʻana o ka mahu kemika (CVD)

ʻO ka CVD e pili ana i ka hoʻolauna ʻana i nā precursors gaseous ma nā mahana kiʻekiʻe e hana kemika ma luna o ka ʻili substrate, e hana ana i kahi uhi paʻa. He kūpono kēia ʻano hana no nā uhi paʻa wela e like me TiC, TiN, a me SiC.

Nā ʻano koʻikoʻi:

Hoʻopili ikaika i ka substrate

Ka hiki ke hana i nā uhi mānoanoa

Nā mahana hana kiʻekiʻe e koi ana i nā substrates pale wela

Nā Hiʻohiʻona Noi No.3

Ma nā ʻano ʻoihana e pili ana i nā ukana kiʻekiʻe a me ka hana alapine kiʻekiʻe, ua pilikia nā ʻāpana i ka friction, corrosion, a me ka haʻalulu wela. Hoʻokumu nā uhi paʻa i kahi papa pale paʻakikī kiʻekiʻe, haʻahaʻa friction, a me ka pale wela e hoʻonui nui i ka hana ʻāpana a me ke ola:

Nā Mea Hana ʻokiʻoki: Hoʻomaikaʻi nui nā uhi e like me TiAlN a me AlCrN i ke kūpaʻa wela a me ka hana ʻaʻahu, e hoʻolōʻihi ana i ke ola o ka mea hana ma 2 a 5 mau manawa, e hōʻemi ana i nā hoʻololi mea hana, a me ka hoʻomaikaʻi ʻana i ke kūlike o ka mīkini.

Nā ʻŌpala a me nā Kuʻi: Hoʻēmi nā uhi ʻana o TiCrAlN a me AlCrN i ke komo ʻana, ka ʻeha, a me ka nahā ʻana o ka luhi wela—hoʻonui i ke ola lawelawe ʻana o ka ʻōpala, ka maikaʻi o nā ʻāpana, a me ka hoʻēmi ʻana i ka manawa hana ʻole.

Nā ʻĀpana Kaʻa: ʻO nā uhi DLC (Diamond-Like Carbon) ma nā ʻāpana e like me nā tappets, nā pine piston, a me nā mea hāpai valve e hoʻohaʻahaʻa i ka friction a me ka nui o ke komo ʻana, hoʻolōʻihi i nā manawa hoʻololi, a hoʻomaikaʻi i ka pono o ka wahie.

3C Mea kūʻai aku uila: Hāʻawi ʻo TiN, CrN, a me nā uhi paʻakikī hoʻonaninani ʻē aʻe ma nā hale kelepona a me nā bezel kāmela i ke kūpaʻa ʻana i ke kahakaha a me ka pale ʻana i ka pala ʻoiai e mālama ana i kahi ʻano metala no ka ʻike mea hoʻohana i hoʻomaikaʻi ʻia.

ʻIkepili Noi ma ka ʻoihana

Nā Hoʻonā Hoʻokaʻawale Uhi Paʻakikī NO.5 o Zhenhua Vacuum: Ke Hoʻā nei

Hana Hana Kiʻekiʻe

No ka hoʻokō ʻana i ke koi e piʻi nei no nā uhi hana kiʻekiʻe ma nā ʻoihana, hāʻawi ʻo Zhenhua Vacuum i nā hoʻonā waiho uhi paʻakikī holomua e hōʻike ana i ka pono o ka waiho ʻana kiʻekiʻe a me ka hoʻohālikelike ʻana i nā kaʻina hana he nui—kūpono no ka hana pololei ʻana i nā ʻōmole, nā mea ʻoki, a me nā ʻāpana kaʻa.

Nā Pōmaikaʻi Koʻikoʻi:

Kānana plasma arc kūpono no ka hōʻemi ʻana o ka macroparticle

Nā uhi Ta-C hana kiʻekiʻe e hoʻohui ana i ka pono a me ke kūpaʻa

ʻO ka paʻakikī kiʻekiʻe loa (a hiki i ka 63 GPa), ka helu haʻahaʻa haʻalulu, a me ke kūpaʻa ʻino loa

Nā ʻAno Uhi Pili:

Kākoʻo ka ʻōnaehana i ka waiho ʻana o nā uhi wela kiʻekiʻe, paʻakikī loa e like me AlTiN, AlCrN, TiCrAlN, TiAlSiN, CrN, a me nā mea ʻē aʻe—i hoʻohana nui ʻia i nā ʻōmole, nā mea ʻokiʻoki, nā punches, nā ʻāpana kaʻa, a me nā pistons.

Manaʻo Lako:

(Loaʻa nā ana o ka ʻōnaehana i hoʻopilikino ʻia ma ke noi.)

1.MA0605 Mīkini Uhi PVD ʻili paʻakikī

2.Mīkini Uhi ʻAiʻoniʻoni Paʻakikī HDA1200

3.Mīkini uhi uhi pale lole HDA1112

–Ua hoʻokuʻu ʻia kēia ʻatikala e mīkini uhi hakahakamea hana ʻO Zhenhua Vacuum.