Njengoko usetyenziso lwefilimu encinci luqhubeka lutshintsha, umaleko omnye wokugquma udla ngokungasaneli ukuhlangabezana neemfuno ezidibeneyo zokusebenza kwe-optical, ukuhanjiswa kombane, ukumelana nokuguguleka, ukumelana nokugqwala, uzinzo lokusingqongileyo, amandla omphezulu, kunye nenkangeleko yokuhombisa. Kwiimveliso ezininzi eziphambili, ukusebenza okufunekayo kufezekiswa nge-multilayer film stack apho umaleko ngamnye wenza umsebenzi othile kwaye usebenzisana namaleko angaphezulu nangaphantsi kwawo.
Izakhiwo eziqhelekileyo zingabandakanya umaleko wokunamathela, umaleko osebenzayo wesinyithi okanye we-dielectric, umaleko wohlengahlengiso lwe-optical, umqobo wokusasazwa, umaleko okhuselayo oqinileyo, kunye ne-topcoat enamandla aphantsi. Kwizicelo ze-optical, izixhobo ezitshintshanayo ze-high-and-low-refractive-index zingasetyenziselwa ukulawula ukuhanjiswa, ukubonakalisa, umbala, kunye nempendulo ye-spectral. Kwizicelo ze-elektroniki kunye ne-photovoltaic, ii-oxides ezihambisayo ezibonakalayo, ii-electrode zesinyithi, ii-buffer layers, kunye nee-barrier layers zinokufuneka zifakwe ngokulandelelana. Kwizicelo ze-automotive kunye ne-consumer-electronics, ii-metalized layers zinokudityaniswa nee-protective coating, ii-non-conductive vacuum metallization layers, ii-carbon coating ezifana nedayimani, okanye ii-anti-fingerprint layers.
Ukusebenza kwezi nkqubo ze-multilayer akuxhomekanga kuphela ekubeni isixhobo ngasinye sinokufakwa ngempumelelo na. Kuxhomekeke ekubeni yonke inkqubo yokugquma i-vacuum ingakwazi na ukulungelelanisa iimeko ze-vacuum, imithombo yokugquma, iigesi zenkqubo, intshukumo ye-substrate, ubushushu, i-bias voltage, ukujonga ubukhulu befilimu, kunye nexesha lokutshintsha kwe-layer kulo lonke umjikelo wokugquma.
Ngenxa yesi sizathu, ukufakwa kwefilimu esebenza ngamanqwanqwa amaninzi akufanele kuqondwe njengokuphindaphindwa nje kweenkqubo ezininzi zamanqwanqwa omnye. Ngumsebenzi wokuvelisa osekwe kulungelelwaniso oluchanekileyo lwezixhobo.
I-Film Stack kufuneka iphathwe njengenkqubo eqhubekayo
Kwingubo enezingqimba ezininzi, ukugqitywa komaleko omnye kukwayimeko yokuqala kolandelayo. Ukwakheka komphezulu, uburhabaxa, ubushushu, uxinzelelo olushiyekileyo, igesi efunxwayo, ukuvezwa kweplasma, kunye nongcoliseko lwe-interface konke oku kunokuchaphazela i-nucleation kunye nokukhula komaleko olandelayo.
Umaleko ohlangabezana nobukhulu bawo obuzimeleyo okanye injongo yokwakheka kwawo usenokubangela iingxaki kwi-stack epheleleyo yefilimu. Ukuqhushumba kwee-ion ezininzi ngexesha lokufakwa komaleko osebenzayo onobunzima kunokunyusa uxinzelelo lokucinezela. Ixesha elide lokulinda phakathi kwamaleko amabini linokuvumela iigesi eziseleyo ukuba zifunxe phezu komphezulu. Ukutshintsha okungalunganga kwegesi esabelayo kunokubangela ukungcola okunqamlezileyo okanye ukwakheka kwe-compound engazinzile. Ukufudumala okugqithisileyo kwe-substrate kunokuphucula uxinano lomaleko omnye ngelixa kudlula ukunyamezela kobushushu be-substrate okanye kuwonakalisa amaleko abekwe ngaphambili.
Inkqubo yolawulo ke ngoko kufuneka ilawule i-stack yefilimu njengenkqubo enye eqhubekayo kunokuba ibe yingqokelela yamanyathelo okubeka azimeleyo. Umaleko ngamnye kufuneka ube neemeko zokungena ezichazwe ngokucacileyo, iimeko zokubeka, iikhrayitheriya zokuphelisa, kunye neemeko zotshintsho.
Ngaphambi kokuba umaleko olandelayo uqale, izixhobo zinokufuna ukuqinisekisa ukuba uxinzelelo lwegumbi, inqanaba legesi eseleyo, ubushushu be-substrate, imeko ekujoliswe kuyo, ukwakheka kwegesi, imeko yonikezelo lwamandla, kunye nendawo ye-substrate ifikelele kwifestile yenkqubo echaziweyo. Le ngqiqo yokusebenza enemiqathango ithembekile ngakumbi kunokutshintsha amaleya ngokwexesha elimiselweyo lodwa.
Kwii-stacks ezintsonkothileyo, iiresiphi zenkqubo kufuneka ziqulathe imisebenzi ye-interlayer efana nokucoca i-plasma, ukusebenza kwe-ion, ukucoca igesi, ukuthintela umthombo, ukutshintsha i-shutter, ukurhangqa amandla, ukupholisa i-substrate, okanye ukulinda okulawulwayo. Le misebenzi yenguqu iyinxalenye ebalulekileyo yenkqubo yokugquma kuba ichaphazela ngokuthe ngqo ukunamathela kwe-interface, ukwakheka kweekhemikhali, ukusasazwa koburhabaxa, kunye noxinzelelo olushiyekileyo.
Ulungelelwaniso lweNkqubo yoVutho-moya luseka isiseko seNkqubo eQhelekileyo
Zonke iileya kwisakhiwo esineeleya ezininzi zabelana ngemeko efanayo yokungafumani manzi, kodwa izixhobo ezahlukeneyo kunye neenkqubo zokufaka izinto zinokufuna uxinzelelo oluhlukeneyo lokusebenza, ukwakheka kwegesi, isantya sokumpompa, kunye namaqhinga okulawula ungcoliseko.
Inkqubo yokufunxa kufuneka iqale inike uxinzelelo olusisiseko olucocekileyo noluzinzileyo ngaphambi kokuba iqale ukufakwa. Umphunga wamanzi, ioksijini, iihydrocarbon, kunye neegesi zenkqubo ezisele zinokuchaphazela ubumsulwa befilimu, ukunamathela, ukufunxwa kwe-optical, ukumelana nombane, kunye nozinzo lwe-interface. Kwiileya ezibuthathaka kumswakama okanye kwioksijini, notshintsho oluncinci kwisakhiwo segesi esisele lunokutshintsha iipropati zokugqibela ze-stack.
Nangona kunjalo, uxinzelelo oluphantsi kakhulu lwegumbi alusoloko luyinjongo yodwa. Ngexesha lokufakwa, inkqubo kufuneka igcine ibhalansi echanekileyo phakathi kokufakwa kwegesi kunye nesantya sokumpompa esisebenzayo. Ivalvu yokulawula uxinzelelo, iipompo zevacuum, abalawuli bokuhamba kobuninzi, inkqubo yokusasazwa kwegesi, kunye nokuhanjiswa kwegumbi kufuneka basebenzisane ukugcina uxinzelelo oluzinzileyo lwenkqubo kulo lonke umaleko ngamnye.
Xa inkqubo itshintsha ukusuka ekutshizeni ngesinyithi ukuya ekutshizeni okusabelayo, okanye ukusuka ekucoceni i-argon plasma ukuya ekufakweni kweoksijini okanye i-nitrogen, umoya wegumbi awunakutshintshwa ngoko nangoko. Inkqubo yolawulo kufuneka iqwalasele ixesha lokuhlala kwegesi, ukufunxwa kodonga, impendulo ekujoliswe kuyo, kunye neempawu zempendulo zenkqubo yokumpompa. Utshintsho olungalawulwa kakuhle lunokubangela ukuba ukuqala komaleko olandelayo kubekwe phantsi kolwakhiwo lwegesi olungazinzanga.
Le ngxaki ibaluleke kakhulu kwi-reactive magnetron sputtering. Iinkqubo ze-reactive sputtering zinokubonisa ubudlelwane obungangqalanga phakathi kokuhamba kwegesi esabelayo, imeko yomphezulu wethagethi, i-discharge voltage, i-deposition rate, kunye ne-film stoichiometry. Ukusebenza kufutshane notshintsho phakathi kwe-metallic kunye ne-poisoned target states kusenokungazinzi ngaphandle kolawulo olufanelekileyo lwempendulo. Ukubeka iliso kuxinzelelo oluyinxenye, ukubeka iliso kwi-plasma-emission, impendulo ye-target-voltage, kunye nolawulo lokuhamba kobunzima obuphezulu ngoko ke zinokudityaniswa ukuze kuzinziswe inkqubo.
Kwiinkqubo zokugquma ezinamagumbi amaninzi okanye ezikwimigca ethe tyaba, ukulungelelaniswa kwe-vacuum kukwabandakanya ukwahlulwa koxinzelelo phakathi kweendawo zenkqubo ezikufutshane. Amagumbi okutshixa umthwalo, amagumbi okubamba, amagumbi okudlulisa, iivalvu eziqhekekileyo, amacandelo okupompa ahlukeneyo, kunye nezakhiwo zokwahlulwa kwegesi zinokunciphisa ungcoliseko olunqamlezileyo kwaye zivumele ukuba iileya ezahlukeneyo zibekwe phantsi kweemeko ezizimeleyo.
Kwiinkqubo zokuqengqeleka ukuya ekuqengqelekeni kunye neenkqubo eziqhubekayo ezikwimigca ethe tyaba, iindawo zokugquma ezikufutshane zinokuqulatha iinkqubo ezahlukeneyo zesinyithi, ze-dielectric, okanye ze-reactive. Ukwahlulwa kwegesi, ukupompa okulawulwayo, ulawulo lobushushu be-substrate, kunye nokulinganiswa kwendawo kufuneka kusebenze kunye ukuthintela icandelo lenkqubo elinye ekuchaphazeleni elinye.
Imithombo Yokufaka Izinto, Izixhobo Zombane, kunye Nokuhanjiswa Kwegesi Kufuneka Zisebenze Njengenkqubo Enye
Iifilimu ezisebenzayo ze-multilayer zinokufuna ubuchwepheshe obuhlukeneyo bokubeka ngaphakathi kweqonga lezixhobo ezifanayo. Ngokuxhomekeke kwisicelo, inkqubo inokudibanisa i-DC magnetron sputtering, i-pulsed DC sputtering, i-mid-frequency sputtering, i-radio-frequency sputtering, i-HiPIMS, i-thermal evaporation, i-electron-beam evaporation, i-ion-assisted deposition, i-PECVD, okanye i-spatial ALD.
Umthombo ngamnye uneempawu zawo zokutsha, impendulo yamandla, indlela yokuziphatha kwesantya sokufakwa, umthwalo wobushushu, ukusasazwa kweplasma, kunye nepateni yokusetyenziswa kwezinto. Imveliso ezinzileyo yeleya ezininzi ixhomekeke kwindlela ezilungelelaniswe ngayo ezi mithombo kunokuba ixhomekeke nje ekubeni zingaphi imithombo efakiweyo.
Ngaphambi kokuba ithagethi isetyenziswe ekubekeni imveliso, inkqubo inokufuna ukwenza i-pre-sputtering okanye i-target conditioning xa i-shutter ivaliwe. Oku kususa ungcoliseko lomphezulu kwaye kuzinzise i-voltage ekujoliswe kuyo, umbane okhutshwayo, kunye nesantya sokufaka. Xa utshintsha ukusuka kwenye into ukuya kwenye, isikhuselo somthombo, indawo ye-shutter, ukwakheka kwegesi, i-power ramp, kunye nendawo ye-substrate kufuneka zenziwe ngokulandelelana okuchanekileyo.
Izixhobo zamandla akufuneki zisoloko zitshintshwa ukusuka ku-zero ukuya kwindawo yokugqibela. Ulandelelwano olulawulwayo lokunyuka nokuhla kwe-ramp lunokunciphisa ukukhutshwa okungaqhelekanga, ukuveliswa kwamasuntswana, ukutshayiswa kobushushu, kunye neziganeko ze-arc. Kwiinkqubo ezisabelayo, ulawulo lwamandla kufuneka lulungelelaniswe nokuhamba kwegesi kunye nokuphendula kokumpompa ukuze kuthintelwe ukuqhuba ithagethi ngokukhawuleza kwindawo yokusebenza engazinzile.
Kwinkqubo yokufakwa kwe-hybrid, ulungelelwaniso luba lubaluleke ngakumbi. Umzekelo, umaleko wesinyithi unokufakwa yi-DC magnetron sputtering, ngelixa umaleko we-dielectric ufuna i-pulsed DC, i-mid-frequency, okanye i-RF excitation. Umaleko ofana ne-polymer okhuselayo unokufakwa yi-PECVD. Umlawuli wenkqubo kufuneka alawule uyilo lwamandla olwahlukeneyo, iinethiwekhi ezihambelanayo, iziteshi zokuhambisa igesi, iimeko zokutsha kwe-plasma, kunye ne-interlocks zokhuseleko ngaphakathi kweresiphi enye.
Izixhobo mazithintele ukusebenzisana okungafunekiyo komthombo. Ii-cathode ezisebenzayo ngaxeshanye zinokuchaphazela uxinano lwe-plasma, amandla egumbi, ukusetyenziswa kwegesi esebenzayo, kunye nokufudumeza kwe-substrate yendawo. Ukuba imithombo emininzi isetyenziselwa ukubekwa kunye, ulawulo lokwakheka luxhomekeke kumlinganiselo ozinzileyo phakathi kwamazinga okubekwa kwawo ngabanye. Oku kunokufuna impendulo yamandla ezimeleyo, iimodeli zezinga lokubekwa ezilinganisiweyo, okanye ukujonga ukwakheka okuvaliweyo.
Uyilo lokusasazwa kwegesi lubaluleke ngokulinganayo. Ukuhamba kwegesi iyonke kukodwa akuchazi ukufana kwefilimu okanye i-stoichiometry. Indawo yokungena kwegesi, izibuko zokumpompa, ii-cathodes, ii-substrate carriers, kunye nee-chamber shields zimisela uxinano lwegesi lwengingqi kunye nokusingqongileyo kwe-plasma. Isicwangciso sokulawula izixhobo kufuneka ke ngoko siphuhliswe kunye nesakhiwo sechamber kunye noyilo lomthombo endaweni yokongezwa emva kokuba uyilo loomatshini lugqityiwe.
I-Substrate Motion Coordinates Ukulingana, Ubukhulu Beeleya, kunye Nomthwalo Wobushushu
Inkqubo ye-substrate-motion yinxalenye ephambili ye-multilayer deposition kuba imisela indlela ummandla ngamnye womphezulu ochatshazelwa ngayo yi-deposition flux, i-plasma, ubushushu, kunye ne-reactive-gas environment.
Kwizixhobo zokugquma ngebhetshi, ukujikeleza kwe-substrate, ukujikeleza, intshukumo yeplanethi, ukushukuma, okanye intshukumo ye-multi-axis ingasetyenziselwa ukuphucula ukufana kwe-coating kwiindawo zokusebenza ezithe tyaba, ezigobileyo, okanye ezinemilinganiselo emithathu. Kwiinkqubo eziqhubekayo, isantya sothutho kunye nokuhambelana phakathi kweendawo zenkqubo kumisela ngokuthe ngqo ixesha lokubeka kunye nobukhulu be-layer eqokelelweyo.
Isicwangciso sokuhamba asinakuyilwa ngokwaso kumaleko ngamnye. Isantya okanye indlela efanelekileyo kumaleko wesinyithi isenokungabi yeyona ifanelekileyo kumaleko we-dielectric onokusasazwa kokubekwa okwahlukileyo. Ngokufanayo, umlinganiselo wokujikeleza kweplanethi ozinzileyo unokuvelisa ukulingana okuhle kobukhulu obuphakathi ngelixa udala imbali eyahlukeneyo yokuvezwa kweplasma kwiindawo ezintsonkothileyo ezinemilinganiselo emithathu.
Umlawuli kufuneka alungelelanise indawo ye-substrate kunye namandla omthombo, imeko ye-shutter, ukuhamba kwegesi, kunye nendawo yokuphela kwe-layer. Ukubekwa kwayo kufuneka kuqale kuphela xa i-substrate carrier ingenile kwindawo echaziweyo yokugquma kwaye ifikelele kwimeko yokunyakaza ezinzileyo. Xa i-layer igqityiwe, amandla omthombo okanye indawo ye-shutter inokufuneka itshintshe kwindawo ethile ye-angular ukuthintela ukugquma okungaphezulu kwendawo.
Ukujikeleza kweplanethi kunye nokuhamba kwe-substrate okulawulwayo kusetyenziswa kakhulu kwizixhobo zokugquma ezibonakalayo ngokuchanekileyo ukuphucula ukusasazwa kobukhulu kunye nokuphindaphinda kumphezulu we-substrate.
Kwiglasi enkulu, ii-semiconductor wafers, ii-substrates eziguquguqukayo, kunye nezixhobo zewebhu eziqhubekayo, ukuzinza kwentshukumo kuba yinxalenye yeluphu yolawulo lobukhulu befilimu. Utshintsho kwisantya sothutho, ubushushu bedrama, uxinzelelo lwewebhu, isithuba somthwali, okanye indawo yokuma kunokubangela ukuphambuka kobukhulu, umahluko wemibala, ukumelana nephepha elingalinganiyo, okanye ukusebenza okungaguqukiyo kokukhanya.
Ulawulo lobushushu kufuneka luhambelane nokuhamba kwe-substrate. Ukukhanya okuvela kwimithombo yokufuma, i-ion bombardment, ukufudumeza kwe-plasma, kunye namandla okufuma kunokubangela ukuba ubushushu be-substrate bunyuke ngokuthe ngcembe ngexesha lenkqubo ende ye-multilayer. Ukuba izixhobo zilawula kuphela imveliso ye-heater ngaphandle kokuqwalasela ubushushu benkqubo eqokelelweyo, ubushushu bokwenyani be-substrate bunokwahluka kakhulu kwindawo ebekiweyo yeresiphi.
Ngoko ke inkqubo kufuneka ilungelelanise ukufudumeza, ukupholisa, intshukumo ye-substrate, amandla okubeka, kunye namaxesha okulinda ngokwebhajethi yobushushu ye-stack yonke. Iidrama ezilawulwa bubushushu, ukupholisa ngasemva, ukupholisa komthwali, iiprofayili zokufudumeza ezicwangcisiweyo, kunye namanyathelo okupholisa phakathi kwe-interlayer anokufuneka kwi-substrates ezinobushushu okanye izakhiwo zefilimu ezinobushushu.
Ukubeka iliso kwiNdawo ethile kudibanisa i-Stack eyiliweyo ne-Stack egciniweyo
Uyilo lwefilimu eneziteya ezininzi luchaza ubukhulu bethiyori, isalathisi sokujika, ukwakheka, kunye nolandelelwano lweziteya nganye. Izixhobo kufuneka ziguqule olu yilo lube yingqokelela yoqobo yokugquma phantsi kweemeko zemveliso ezitshintshayo.
Izinga lokuchithwa kwenkunkuma linokwahluka njengoko ithagethi iphela, umthombo womphunga utshintsha ijiyometri, izikhuselo zegumbi ziqokelela ulwelo, okanye iimeko zegesi ezisabelayo zitshintsha. Ke ngoko, ukulawula umaleko ngamnye usebenzisa ixesha elimiselweyo lodwa kunokunyusa kancinci umahluko phakathi kwe-stack yethiyori kunye neyokwenyani.
Ii-microbalances zekristale yeQuartz ziqhele ukusetyenziswa ukujonga izinga lokufakwa kunye nobukhulu obuqokelelweyo bomzimba. Kwiingubo ze-optical ezinee-multilayer, ukujonga ngqo i-optical kunokubonelela ngolwazi olongezelelweyo malunga nempendulo ye-optical yefilimu ekhulayo. Ngokuxhomekeke kwinkqubo, ukudluliselwa, ukubonakaliswa, okanye impendulo ye-spectral ye-broadband inokulinganiswa kwindawo.
Ukubeka iliso kwi-optical kubaluleke kakhulu kuba ukusebenza kokugqibela kwe-optical stack kuxhomekeke kubukhulu be-optical endaweni yobukhulu bejometri kuphela. Inkqubo inokuphelisa umaleko ngamnye ngokwempendulo yayo yokukhanya elinganisiweyo kwaye, kwizicwangciso eziphambili, ihlawulele ukuphambuka okuncinci ngokulungisa ubukhulu be-layers ezilandelayo.
Iinkqubo zanamhlanje zokujonga izinto ezibonakalayo zinokulinganisa ukukhula kwe-multilayer ngokuthe ngqo kwii-substrate holders ezijikelezayo kwaye zibonelele ngolawulo lwe-endpoint kwii-layers nganye nganye.
Kwizinto ezisebenzisa umbane, i-semiconductor, kunye neengubo ezinxulumene namandla, ukujonga indawo kungabandakanya i-ellipsometry ye-spectroscopic, i-plasma-emission spectroscopy, uhlalutyo lwegesi eseleyo, umlinganiselo wokumelana neshiti, okanye ezinye izinzwa ezithile zenkqubo. Indlela yokujonga kufuneka ikhethwe ngokwempawu yokusebenza ebonakala kakhulu kutshintsho lwenkqubo.
Inkqubo yokubeka esweni ethembekileyo ifuna okungaphezulu kokufakela isenzi. Indawo yesenzi, isixhobo sokufaka izixhobo, indlela yokukhanya, ukucoca isignali, imvamisa yokulinganisa, ixesha lokuvala, kunye nokuvumelanisa idatha konke oku kuchaphazela ukuchaneka kokulinganisa. Umlawuli kufuneka ahlule phakathi kotshintsho oluqhelekileyo lwesignali olubangelwa kukukhula komaleko kunye notshintsho olungaqhelekanga olubangelwa kukutshintshatshintsha kweplasma, ukugquma kwesinzwa, ukungazinzi komthombo, okanye intshukumo yesiseko.
Eyona ndlela isebenzayo yokulawula idla ngokudibanisa i-feedforward kunye ne-feedback logic. Ulawulo lwe-Feedforward lusebenzisa iimodeli zenkqubo ezilungisiweyo, i-target-life compensation, kunye neemeko zegumbi ezaziwayo ukumisela useto lweparameter yokuqala. Ulawulo lwe-feedback emva koko lusebenzisa imilinganiselo yexesha langempela ukulungisa ukuphambuka ngexesha lokufakwa.
Ulawulo lwe-Interface luchonga ukuba iileya zomntu ngamnye ziba yi-Functional Stack
Unxibelelwano phakathi kweeleya ezimbini ludla ngokuba lubaluleke ngakumbi kuneempawu zobuninzi zeleya nganye yodwa. Ukuncamathela, ukusasazwa phakathi kweeleya, i-oxidation, uburhabaxa, ukungalingani kwelatisi, ungcoliseko, kunye nokudluliselwa koxinzelelo zonke ezi zinto zenzeka kwi-interface.
Ukuba umphezulu womaleko wangaphambili ungcolisiwe okanye awuzinzanga ngokweekhemikhali, umaleko olandelayo unokubonisa ukuba i-nucleation ayisebenzi kakuhle okanye ukubambana okubuthathaka. Ukuba i-ion bombardment enamandla inamandla kakhulu, inokuphucula uxinano kodwa ikwabangela ukuphindaphindeka, ukuxubana kwe-interface, ukwakheka kweziphene, okanye uxinzelelo olugqithisileyo. Ukuba ibuthathaka kakhulu, ugqubuthelo lunokuphuhlisa isakhiwo esineembobo okanye sekholamu.
Ngoko ke izixhobo kufuneka zibonelele ngolawulo oluthile lwe-layer lwe-substrate bias, amandla e-ion-source, uxinano lwe-plasma, ubushushu be-substrate, kunye nexesha lokutshintsha. Ezi parameters akufuneki zihlale zingatshintshi kuyo yonke inkqubo ye-multilayer.
Umaleko wokunamathela ungafuna ukusebenza okunamandla komphezulu kunye noncedo oluphezulu lwee-ion. Umaleko obonakalayo onobuthathaka ungadinga amandla aphantsi e-ion ukunciphisa ukufunxa kunye nokuxubana kwe-interface. Umaleko okhuselayo oqinileyo ungadinga ukwanda koxinano lwe-plasma okanye i-bias ukuze ufumane uxinano nobunzima obaneleyo. I-topcoat enamandla aphantsi ingadinga ubushushu obuphantsi be-substrate kunye nokuhanjiswa kwangaphambili okulawulwa ngononophelo.
Uburhabaxa phakathi kweeleya bunokwanda nge-stack. Nje ukuba iziphene zomphezulu okanye ukukhula kwamaqhuqhuva kuqale, iileya ezilandelayo zinokwandisa. Le nkqubo ke ngoko kufuneka ilawule ukuveliswa kwamasuntswana, ukucinezelwa kwe-arc, ukucoceka komthombo, ungcoliseko lwezixhobo, kunye nemeko yesikhuseli ukusuka kwileya yokuqala ukuya phambili.
Kwi-multilayers zesikali se-nanometer, uburhabaxa be-interface kunye nokwakheka kwe-interlayer kunokuchaphazela ngokuthe ngqo ukusebenza kwe-optical okanye ye-elektroniki, okwenza uzinzo lomthombo, ukuchaneka kwentshukumo, kunye nolawulo lwe-interface lungahlukani noyilo lwezixhobo.
Ulawulo loxinzelelo kufuneka luqwalaselwe nakwi-stack epheleleyo. Isixhobo ngasinye sinokuzisa uxinzelelo lokuxinana okanye lokuxinzelela ngokuxhomekeke kuxinzelelo lokufakwa, amandla e-ion, ubushushu, isakhiwo se-microstructure, kunye nobukhulu. Nokuba uxinzelelo lomaleko ngamnye lwamkelekile, uxinzelelo oluqokelelweyo lwesakhiwo esinamaleko amaninzi lunokubangela ukuguquka, ukuqhekeka, ukuxobuka, okanye ukuphazamiseka kokubona.
Iresiphi yezixhobo kufuneka ke ngoko ilinganisele ulandelelwano lwemaleko, amandla okubeka, iprofayili yobushushu, ukusasazwa kobukhulu, kunye neemeko zokupholisa. Kwezinye iinkqubo, amaleko okunciphisa uxinzelelo okanye ii-interfaces ezilinganisiweyo zinokungeniswa ukuphucula uzinzo lwesakhiwo.
Ukuhlelwa Kweresiphi Kuguqula Ulwazi Lwenkqubo Lube Yimveliso Ephindaphindwayo
Ingqiqo epheleleyo yokulungelelanisa ukufakwa kwe-multilayer ekugqibeleni iphunyezwa ngeresiphi yenkqubo kunye noyilo lolawulo oluzenzekelayo.
Iresiphi yeleya ezininzi akufuneki ibe namagama eleya kuphela, ixesha lokufakwa, ukuhamba kwegesi, kunye noseto lwamandla. Kufuneka ichaze imeko epheleleyo yotshintsho lwezixhobo, kubandakanya iimeko zokumpompa, isiqinisekiso soxinzelelo lwesiseko, imeko yomthombo, ukufudumeza i-substrate, ukucocwa kwe-plasma, ukuzinzisa igesi, ukurhangqa kwamandla, ukusebenza kwe-shutter, ukuvumelanisa intshukumo, ukufunyanwa kwesiphelo, ukutshintshwa kweleya phakathi, ukupholisa, ukukhupha umoya, kunye nokukhupha impahla.
Umsebenzi ngamnye kufuneka uqhagamshelwe kwiimeko zenkqubo kunokuba uqhagamshelwe kwixesha elidlulileyo kuphela. Umzekelo, ukufakwa kwe-deposit akufuneki kuqale kuba nje isibali-xesha sokumpompa siphelelwe lixesha. Inkqubo kufuneka iqinisekise ukuba uxinzelelo, isantya sokuvuza, ubushushu be-substrate, imeko yamanzi okupholisa, kunye nokulungelelaniswa komthombo kuyahlangabezana neemeko ezifunekayo.
Ngokufanayo, umaleko olandelayo akufuneki uqale kwangoko emva kokuba umthombo wangaphambili ucinyiwe. Umlawuli unokufuna ukuqinisekisa ukuba igesi yangaphambili ikhutshiwe, ukuhamba kwegesi entsha kuzinzile, ithagethi igqibile ukutshiza kwangaphambili, kwaye isiseko sifikelele kwindawo efanelekileyo kunye nobushushu.
Ulawulo lwenguqulelo yeresiphi lubalulekile nakwimveliso enkulu. Utshintsho kumandla, uxinzelelo, ukuhamba kwegesi, ubukhulu beleya, i-bias voltage, okanye i-endpoint criteria kufuneka zirekhodwe kwaye ziqhagamshelwe kwibhetshi yemveliso ehambelanayo. Oku kwenza kube nokwenzeka ukulandelela umahluko wokusebenza kwefilimu ukuya kwiiparamitha zezixhobo kunye notshintsho lwenkqubo.
Kwiimveliso ezineenkcazo ezahlukeneyo, izixhobo kufuneka zixhase izakhiwo zeresiphi ezimiselweyo. Imisebenzi eqhelekileyo efana nokupompa, ukucoca iplasma, ukubekwa kwe-adhesion-layer, okanye ukupholisa ingacwangciswa njengeemodyuli zenkqubo ezinokusetyenziswa kwakhona, ngelixa ii-stacks ze-layer ezithile zemveliso zihlala zilawulwa ngokwahlukeneyo.
Inkqubo yokwenza izinto ngokuzenzekelayo kufuneka ilawule neemeko ezingaqhelekanga ngokwemaleko yangoku. Isiganeko esifutshane se-arc ngexesha lomaleko wesinyithi otyebileyo sinokuphathwa ngokucinezelwa kwe-arc ngokuzenzekelayo kunye nokufakwa okuqhubekayo. Isiganeko esifanayo ngexesha lomaleko we-optical we-nanometer-scale sinokufuna ukuba inkqubo ime, ihlawule, iphinda umaleko, okanye iphawule ibhetshi ukuze ihlolwe.
Le ngqiqo yokuphatha izinto ngaphandle eyaziyo iileya ngumahluko obalulekileyo phakathi kokuzenzekela koomatshini abasisiseko kunye nokuzenzekela kwenkqubo yokwenyani.
Ukusuka ekuzinzeni kwezixhobo zomntu ngamnye ukuya ekuhambelaneni kwe-Whole-Stack
Eyona njongo iphambili yokulungelelanisa izixhobo ayikokugqibezela nje inyathelo ngalinye lenkqubo ngokuzenzekelayo. Kukuqinisekisa ukuba isitaki esinee-multilayer ezigciniweyo siphinda rhoqo ukusebenza okucwangcisiweyo.
Oku kufuna ulungelelwaniso kumanqanaba amane. Eyokuqala kukulungelelaniswa kwezixhobo phakathi kweepompo zevacuum, iivalvu, izixhobo zamandla, iinkqubo zegesi, imithombo, izifudumezi, iindlela zokuhamba, izinzwa, kunye neesekethe zokupholisa. Eyesibini kukulungelelaniswa kwenkqubo phakathi kokucoca, ukusebenza, ukufakwa, ukusabela, ukuguquka, kunye nokupholisa. Eyesithathu kukulungelelaniswa kwedatha phakathi kweendlela zokupheka, imiqondiso yesinzwa, iirekhodi ze-alamu, iziphumo zesiphelo, kunye nokulinganiswa komgangatho. Eyesine kukulungelelaniswa komjikelo wobomi, kubandakanya ukukhukuliseka okujoliswe kuko, ukugcinwa komthombo, ukucocwa kwegumbi, ukulinganiswa kwesinzwa, imeko yesixhobo, kunye nokubuyiselwa kwenkqubo.
Njengoko iingubo ezisebenzayo zisiba nzima ngakumbi, amandla ezixhobo aya kuvavanywa ngakumbi ngokukwazi kwazo ukulawula inqwaba yefilimu epheleleyo endaweni yomthombo omnye wokubeka. Imibuzo ebalulekileyo ayisayi kuthintelwa kukuba ingaba umatshini unokufaka izinto ezithile na. Abavelisi baya kufuneka babonise ukuba ngaba izixhobo zinokugcina umgangatho womdibaniso, zilawule uxinzelelo oluqokelelweyo, zinciphise ungcoliseko olunqamlezileyo, zibuyisele ukushukuma komthombo, zivelise ukusebenza kwe-spectral okanye umbane, kwaye zifezekise ukuhambelana kwebhetshi nebhetshi.
Ukubekwa kwefilimu esebenzayo yeeleya ezininzi ngoko ke kukunxibelelana okudibeneyo phakathi koyilo lwezixhobo kunye nobunjineli benkqubo. Uzinzo lwe-vacuum lubonelela ngesiseko sokusingqongileyo, umthombo kunye nolungelelwaniso lwamandla ukumisela ukuhanjiswa kwezinto, ulawulo lwegesi lulawula ukwakheka, intshukumo ye-substrate imisela ukufana kwendawo, ulawulo lobushushu kunye nokhetho luchaphazela ukukhula kwefilimu, kwaye ukujonga kwindawo ethile kudibanisa isiphumo sokwenyani sokwambathisa kunye ne-stack yomaleko eyilwe.
Kuphela xa ezi nkqubo zingaphantsi zisebenza phantsi kwesicwangciso esidibeneyo sokulawula inkqubo apho iileya ezininzi ngazinye ziba yinkqubo yefilimu esebenzayo ezinzileyo, ephindaphindwayo, neveliswa ngobuninzi.
-Eli nqaku lipapashwe nguumenzi wezixhobo zokugquma nge-vacuumI-Zhenhua Vacuum
Ixesha leposi: Julayi-16-2026