Sezvo mashandisirwo emafirimu matete achiramba achichinja, jira rimwe chete rekufukidza harichakwani kusangana nezvinodiwa zvekushanda kwemaziso, kufambisa magetsi, kuramba kupfeka, kuramba ngura, kugadzikana kwezvakatipoteredza, simba repamusoro, uye chitarisiko chekushongedza. Muzvigadzirwa zvakawanda zvepamusoro, kushanda kunodiwa kunowanikwa kuburikidza nefirimu rine jira rakawanda umo jira rega rega rinoita basa rakati uye rinobatana nejira riri pamusoro neriri pasi paro.
Zvivakwa zvakajairika zvinogona kusanganisira jira rekunamatira, jira resimbi kana redielectric rinoshanda, jira rekugadzirisa optical, chidziviriro chekupararira, jira rakasimba rekudzivirira, uye topcoat ine simba shoma. Mukushandiswa kwe optical, zvinhu zvinochinjana-chinjana-zvakakwirira nezviri pasi-refractive-index zvinogona kushandiswa kudzora kutumirwa, kuratidzwa, ruvara, uye mhinduro ye spectral. Mukushandiswa kwemagetsi ne photovoltaic, ma oxide e transparent conductive, ma electrodes esimbi, ma buffer layers, uye ma barrier layers zvinogona kuda kuiswa zvakatevedzana. Mukushandiswa kwemotokari ne consumer-electronics, ma metalized layers anogona kusanganiswa ne protective coatings, non-conductive vacuum metallization layers, diamond-like carbon coatings, kana anti-fingerprint layers.
Kushanda kwemasystem aya ane ma multilayer hakungotsamiri chete pakuti chinhu chimwe nechimwe chinogona kuiswa zvakanaka here. Zvinotsamira pakuti system yese ye vacuum coating inogona here kurongeka mamiriro e vacuum, manyuko ekuisa zvinhu, magasi ekushanda, kufamba kwe substrate, tembiricha, bias voltage, kutarisa ukobvu hwefirimu, uye nguva yekuchinja kwe layer mukati me coating cycle yese.
Nekuda kwechikonzero ichi, kuiswa kwefirimu rine mativi akawanda hakufanirwe kunzwisiswa sekudzokororwa kuri nyore kwemaitiro akati wandei ane jira rimwe chete. Ibasa rekugadzira remazinga ehurongwa rakavakirwa pakubatanidza michina kwakanyatsojeka.
Firimu Rinofanira Kuonekwa Senzira Inoramba Ichienderera Mberi
Muchifukidziro chine jira rakawanda, kupera kwejira rimwe chete ndiko kutanga kwerinotevera. Maumbirwo epamusoro, kuomarara, tembiricha, kushushikana kwasara, gasi rinonyungudika, kusvibiswa kweplasma, uye kusvibiswa kwechimiro chemukati zvese zvinogona kukanganisa nucleation nekukura kwejira rinotevera.
Dura rinosvika pakukora kwaro kana chinangwa charo chekuumbwa rinogona kukonzera matambudziko emuunganidzwa wese wefirimu. Kuputika kwemaion akawanda panguva yekuiswa kwedura rakakora kunogona kuwedzera kumanikidzwa. Nguva yakareba yekumirira pakati pedura mbiri inogona kubvumira magasi akasara kuti anyure pamusoro. Kuchinjana kwegasi remagetsi zvisina kunaka kunogona kukonzera kusvibiswa kwakasiyana kana kuumbwa kwemakemikari asina kugadzikana. Kupisa kwakanyanya kwedura kunogona kuwedzera huwandu hwedura rimwe uku kuchipfuura kushivirira kwedura kana kuderedza zvidimbu zvakamboiswa.
Saka sisitimu yekudzora inofanirwa kutarisira firimu senzira imwe chete inoenderera mberi kwete semuunganidzwa wematanho ekuisa akazvimiririra. Danho rega rega rinofanira kunge riine mamiriro ekupinda akajeka, mamiriro ekuisa, zvinodiwa zvekugumisa, uye mamiriro ekuchinja.
Usati watanga kugadzira layer rinotevera, michina ingangoda kusimbisa kuti kumanikidzwa kwemukamuri, huwandu hwegasi rinosara, tembiricha ye substrate, mamiriro echinangwa, kuumbwa kwegasi, mamiriro emagetsi, uye nzvimbo ye substrate zvasvika pahwindo remaitiro akatarwa. Pfungwa iyi yekushanda ine conditional yakavimbika kupfuura kuchinja layer zvichienderana nenguva yakatarwa chete.
Pama stacks akaomarara, ma process recipes anofanirawo kunge aine interlayer operations dzakadai se plasma cleaning, ion activation, gas purging, source shielding, shutter switching, power ramping, substrate cooling, kana controlled waiting. Aya ma transitional operations ndiwo akakosha mu coating process nekuti anokanganisa zvakananga interface adhesion, chemical composition, roughness propagation, uye residual stress.
Kurongeka kweSisitimu yeVacuum Kunogadza Hwaro Hwekutanga hweMaitiro Akafanana
Matinji ese ari muchimiro che multilayer ane nzvimbo imwechete ye vacuum, asi zvinhu zvakasiyana uye maitiro ekuisa zvinhu zvinogona kuda kumanikidzwa kwakasiyana kwekushanda, magadzirirwo emagasi, kumhanya kwekupomba, uye nzira dzekudzora kusvibiswa.
Sisitimu yekuputira mweya inofanira kutanga yapa simba rakachena uye rakagadzikana pasi pesimba isati yatanga kuiswa. Utsi hwemvura, okisijeni, mahydrocarbon, uye magasi ekugadzirisa zvinhu zvinogona kukanganisa kuchena kwefirimu, kunamira, kunyudzwa kwemaziso, kusimba kwemagetsi, uye kugadzikana kwenzvimbo. Kune ma layers anonzwa hunyoro kana oxygen, kunyangwe shanduko diki muhuwandu hwegasi rinosara inogona kuchinja hunhu hwekupedzisira hwe stack.
Zvisinei, kumanikidzwa kwemukamuri kwakaderera zvakanyanya hakusi iko chete chinangwa. Panguva yekuisa, sisitimu inofanira kuchengetedza chiyero chakakodzera pakati pekupinda kwegasi uye kumhanya kwekupomba kunobudirira. Vharuvhu yekudzora kumanikidzwa, mapombi evacuum, mass flow controllers, sisitimu yekugovera gasi, uye kufambisa kwemukamuri zvinofanirwa kushanda pamwe chete kuchengetedza kumanikidzwa kwakasimba kwemaitiro mukati mechikamu chimwe nechimwe.
Kana maitiro acho achichinja kubva pakusvipa kwesimbi kuenda pakusvipa kwemweya, kana kubva pakucheneswa kweargon plasma kuenda pakuiswa kweoxygen- kana nitrogen-assisted, mhepo yemukamuri haigone kuchinjwa ipapo ipapo. Sisitimu yekudzora inofanirwa kuverengera nguva yekugara kwegasi, kusvipa kwemadziro, maitiro ekunanga, uye maitiro ekupindura kwesisitimu yekupomba. Kuchinja kusina kudzorwa zvakanaka kunogona kukonzera kutanga kwechikamu chinotevera kuiswa pasi pehuwandu hwegasi husina kugadzikana.
Nyaya iyi inonyanya kukosha mukupukutira kwemagnetron. Masisitimu ekupukutira anogona kuratidza hukama husina kurongeka pakati pekuyerera kwegasi rinoita basa, mamiriro enzvimbo inotarwa, voltage inobuda, chiyero chekuisa mweya, uye stoichiometry yefirimu. Kushanda pedyo nekuchinja pakati pemamiriro esimbi neane chepfu kunogona kusagadzikana pasina kudzora kwakakodzera kwemhinduro. Kutarisa kumanikidzwa kwechikamu, kutarisa kweplasma-emission, mhinduro yevoltage, uye kutonga kwehuwandu hwemhinduro yepamusoro zvinogona kubatanidzwa kuti zvigadzikane maitiro acho.
Mumasystem ekuputira ane makamuri akawanda kana kuti ari mumutsara, kurongeka kwevacuum kunosanganisirawo kupatsanurwa kwesimba pakati penzvimbo dziri pedyo dzekushanda. Makamuri ekukiya mutoro, makamuri ekudzivirira, makamuri ekutamisa, mavharuvhu anotsemuka, zvikamu zvekupomba zvakasiyana, uye zvivakwa zvekuparadzanisa gasi zvinogona kuderedza kusvibiswa kwemuchina uye kubvumira kuti zvikamu zvakasiyana zviiswe pasi pemhepo yakazvimirira.
Kune masisitimu ekutenderera-kutenderera uye anoenderera mberi ari mumutsara, nzvimbo dzekufukidza dziri pedyo dzinogona kunge dziine maitiro akasiyana esimbi, e-dielectric, kana e-reactive. Kupatsanurwa kwegasi, kupomba kunodzorwa, kutonga tembiricha yesubstrate, uye kuyerwa kwe-in-situ kunofanirwa kushanda pamwe chete kudzivirira chikamu chimwe chemaitiro kuti chisakanganisa chimwe.
Manyuko ekuisa zvinhu, magetsi, uye kuendeswa kwegasi zvinofanira kushanda senzira imwe chete
Mafirimu anoshanda akawanda anogona kuda matekinoroji akasiyana-siyana ekuisa zvinhu mukati mepuratifomu imwe chete yemuchina. Zvichienderana nekushandiswa, sisitimu iyi inogona kubatanidza DC magnetron sputtering, pulsed DC sputtering, mid-frequency sputtering, radio-frequency sputtering, HiPIMS, thermal evaporation, electron-beam evaporation, ion-assisted deposition, PECVD, kana spatial ALD.
Soko rega rega rine hunhu hwaro hwekubatidza, simba rinoita sei, maitiro ekuisa simba, mutoro wekupisa, kugoverwa kweplasma, uye maitiro ekushandiswa kwezvinhu. Kugadzirwa kwakasimba kwe multilayer kunoenderana nekuti masosi aya akarongeka sei kwete kungoenderana nekuti masosi mangani akaiswa.
Chinangwa chisati chashandiswa pakuiswa kwechigadzirwa, sisitimu yacho ingangoda kuita pre-sputtering kana target conditioning shutter yakavharwa. Izvi zvinobvisa kusvibiswa kwepamusoro uye zvinodzikamisa voltage yechinangwa, discharge current, uye deposition rate. Pakuchinja kubva pane chimwe chinhu kuenda kune chimwe, source shield, shutter position, gas composition, power ramp, uye substrate position zvinofanirwa kuitwa nenzira kwayo.
Magetsi haafanirwe kuchinjwa kubva pa zero kuenda panzvimbo yekupedzisira. Kutevedzana kwekukwira nekudzika kunogona kuderedza kubuda kwemagetsi kusingawanzoitiki, kugadzirwa kwezvikamu, kuvhunduka kwekupisa, uye zviitiko zve arc. Kune maitiro ekugadzirisa, kutonga kwemagetsi kunofanirwawo kurongeka nekuyerera kwegasi uye kupomba kuti zvisafambise chinangwa nekukurumidza munzvimbo isina kugadzikana yekushanda.
Muhurongwa hwehybrid deposition, kubatana kunonyanya kukosha. Semuenzaniso, simbi inogona kuiswa neDC magnetron sputtering, nepo dielectric layer ichida pulsed DC, mid-frequency, kana RF excitation. Rutivi rwakafanana nepolymer runodzivirira runogona kuiswa nePECVD. Process controller inofanira kutarisira magadzirirwo akasiyana esimba, ma network anoenderana, nzira dzekuendesa gasi, mamiriro ekupisa plasma, uye kuchengetedzeka mukati meimwe nzira.
Midziyo iyi inofanirawo kudzivirira kusangana kwechinhu chisingatarisirwi. Ma cathode anoshanda panguva imwe chete anogona kukanganisa huwandu hweplasma, kugona kwekamuri, kushandiswa kwegasi rinoita basa, uye kupisa kwe substrate. Kana zvinhu zvakawanda zvikashandiswa pamwe chete, kutonga kwechinhu kunoenderana nechiyero chakagadzikana pakati pehuwandu hwezvinhu zvinoiswa muchinhu chimwe nechimwe. Izvi zvinogona kuda mhinduro yesimba yakazvimirira, mamodheru ekuenzanisa, kana kutarisa kwechinhu chinoiswa muchinhu chimwe chete.
Dhizaini yekugoverwa kwegasi yakakosha zvakaenzana. Kuyerera kwegasi rose chete hakuratidzi kufanana kwefirimu kana stoichiometry. Nzvimbo yekupinda kwegasi, nzvimbo dzekupomba, ma cathode, zvifambiso zve substrate, uye zvidziviriro zvemakamuri zvinosarudza huwandu hwegasi munharaunda uye nharaunda yeplasma. Saka hurongwa hwekudzora michina hunofanirwa kugadzirwa pamwe chete nechimiro chekamuri uye marongerwo enzvimbo pane kuwedzerwa mushure mekunge dhizaini yemakanika yapera.
Kufamba kweSubstrate Kunobatanidza Kufanana, Ukobvu hweLayer, uye Thermal Load
Sisitimu yekufamba kwesubstrate chikamu chikuru chekuiswa kwe multilayer nekuti ndiyo inosarudza kuti nzvimbo yega yega inosanganisirwa sei ne deposition flux, plasma, kupisa, uye reactive-gas environment.
Mumidziyo yekuputira yebatch, kutenderera kwesubstrate, revolution, planetary motion, oscillation, kana multi-axis movement zvinogona kushandiswa kuvandudza kufanana kwecoating pa workpieces dzakati sandara, dzakakombama, kana dzine mativi matatu. Mumasystem anoenderera mberi, kumhanya kwekutakura uye kuenderana pakati penzvimbo dzeprocess kunosarudza zvakananga nguva yekuisa uye ukobvu hwe layer hwakaunganidzwa.
Nzira yekufamba haigone kugadzirwa yega yega yechikamu chimwe nechimwe. Kumhanya kana nzira yakakodzera chikamu chesimbi inogona kunge isiri iyo yakakodzera chikamu che dielectric chine distribution yakasiyana. Saizvozvowo, chiyero che fixed planetary rotation chinogona kugadzira avhareji yakanaka yeukobvu uku ichigadzira nhoroondo dzakasiyana dze plasma-exposure pazvikamu zvakaoma zve three-dimensional.
Mutongi anofanira kubatanidza nzvimbo ye substrate nesimba renzvimbo, mamiriro e shutter, kuyerera kwegasi, uye nzvimbo yekupedzisira ye layer. Kuiswa kwe substrate kunofanira kutanga chete kana substrate carrier yapinda munzvimbo yakatarwa ye coating uye yasvika mamiriro ekufamba akagadzikana. Kana layer yapera, simba renzvimbo kana nzvimbo ye shutter ingangoda kuchinja panzvimbo chaiyo ye angular kudzivirira overcoating iri munzvimbo.
Kutenderera kwepasi uye kufamba kwepasi kunodzora zvinoshandiswa zvakanyanya mumidziyo yekumonera yemaziso yakanyatsogadzirwa kuti ivandudze kupararira kweukobvu uye kudzokorora kwenzvimbo yacho pamusoro pepasi.
Kune magirazi makuru, mawafer e semiconductor, ma substrates anochinjika, uye zvinhu zvewebhu zvinoramba zvichienderera mberi, kugadzikana kwekufamba kunova chikamu chechikamu chekudzora ukobvu hwefirimu. Kusiyana kwekumhanya kwekutakura, tembiricha yemadhiramu, kusimba kwewebhu, nzvimbo yekutakura, kana nzvimbo yekumira kunogona kukonzera kutsauka kweukobvu, kusiyana kwemavara, kuramba kwepepa kusingaenderane, kana kushanda kwemaziso kusingaenderane.
Kutarisirwa kwekupisa kunofanirawo kuenderana nekufamba kwe substrate. Kupisa kunobva mumhepo inobva mumhepo, ion bombardment, plasma heating, uye condensation energy zvinogona kukonzera kuti tembiricha ye substrate ikwire zvishoma nezvishoma panguva yakareba ye multilayer process. Kana michina ikangodzora chete heater output pasina kufunga nezve process heat yakaunganidzwa, tembiricha chaiyo ye substrate inogona kusiyana zvakanyanya kubva pane resipi setpoint.
Saka sisitimu iyi inofanira kurongedza kupisa, kutonhora, kufamba kwe substrate, simba rekuisa, uye nguva yekumirira zvichienderana nebhajeti yekupisa ye stack yese. Madhiramu anodzorwa nekupisa, kutonhora kwemashure, kutonhora kwekutakura, ma profiles ekupisa akarongwa, uye matanho ekutonhodza pakati pezvikamu zvinogona kudiwa kune substrates dzinonzwa kupisa kana ma structures efirimu anonzwa kupisa.
Kutarisa Munzvimbo Inobatanidza Stack Yakagadzirwa NeStack Yakachengetwa
Dhizaini yefirimu rine zvidimbu zvakawanda inotsanangura ukobvu hwedzidziso, indekisi ye refractive, chimiro, uye kutevedzana kwechikamu chimwe nechimwe. Midziyo inofanira kushandura dhizaini iyi kuita jira rekupenda chairo pasi pemamiriro ekugadzira anochinja.
Mwero wekubviswa kwechinhu unogona kusiyana kana chinangwa chichiparara, sosi yemvura ichichinja maitiro, zvidziviriro zvemakamuri zvichiunganidza coating, kana kuti mamiriro egasi anochinja. Saka, kudzora jira rega rega uchishandisa nguva yakatarwa chete kunogona kuwedzera zvishoma nezvishoma musiyano uripo pakati pechinhu chedzidziso nechechokwadi.
Quartz crystal microbalances inowanzo shandiswa kutarisa mwero wekuisa uye ukobvu hwemuviri hwakaunganidzwa. Kune multilayer optical coatings, direct optical monitoring inogona kupa rumwe ruzivo nezve optical response yefirimu rinokura. Zvichienderana nesystem, transmittance, reflectance, kana broadband spectral response inogona kuyerwa in situ.
Kutarisa kwemaziso kunokosha zvikuru nekuti mashandiro ekupedzisira e optical stack anoenderana nehukobvu hwe optical kwete hukobvu hwe geometric chete. Sisitimu iyi inogona kugumisa layer yega yega zvichienderana nemhinduro yayo ye optical uye, mune mamwe maitiro epamusoro, inotsiva kutsauka kudiki nekugadzirisa ukobvu hwe layer dzinotevera.
Masisitimu emazuva ano ekutarisa magirazi anogona kuyera kukura kwezvikamu zvakawanda zvakananga pazvibati zvezvikamu zvinotenderera uye kupa simba rekutonga zvikamu zvakasiyana-siyana.
Pakupfeka zvinofambisa mhepo, semiconductor, uye zvine chekuita nesimba, kutarisa kwemukati meimba kunogona kusanganisira spectroscopic ellipsometry, plasma-emission spectroscopy, residual gas analysis, sheet-resistance measurement, kana mamwe ma process-specific sensors. Nzira yekutarisa inofanira kusarudzwa zvichienderana ne functional characteristic iyo inonyanya kuenderana nekusiyana kwe process.
Sisitimu yekutarisa yakavimbika inoda zvinopfuura kungoisa sensor. Nzvimbo ye sensor, tooling factor, optical path, signal filtering, calibration frequency, shutter timing, uye data synchronization zvese zvinokanganisa kurongeka kwekuyera. Mutongi anofanira kusiyanisa pakati pekuchinja kwechiratidzo kwakajairika kunokonzerwa nekukura kwe layer uye kuchinja kusingawanzoitika kunokonzerwa nekuchinja kweplasma, sensor coating, source instability, kana substrate movement.
Nzira yekudzora inoshanda zvakanyanya inowanzo sanganisa feedforward ne feedback logic. Feedforward control inoshandisa calibrated process models, target-life compensation, uye mamiriro emukamuri anozivikanwa kuti aone marongero ekutanga eparameter. Feedback control inoshandisa real-time measurements kugadzirisa kutsauka panguva yekuisa data.
Kutarisirwa kweInterface Kunoona Kana MaLayers Ega Ega Achiva Anoshanda
Kubatana pakati pezvikamu zviviri kunowanzova kwakakosha kupfuura hunhu hwakawanda hwezvikamu zvacho chete. Kubatana, kupararira pakati pezvikamu, oxidation, roughness, lattice mismatch, kusvibiswa, uye stress transfer zvese zvinoitika panzvimbo yacho.
Kana pamusoro pechikamu chekare pakasvibiswa kana kuti pakasagadzikana nemakemikari, chikamu chinotevera chinogona kuratidza kusasimba kwe nucleation kana kusasimba kwekubatana. Kana simba remaion rakanyanya kusimba, rinogona kuwedzera huwandu hwezvinhu asi zvakare kukonzera kusanganiswa kwemavara, kusanganiswa kwemavara, kuumbwa kwezvikanganiso, kana kumanikidzwa kwakanyanya. Kana chisina kusimba, chifukidziro chinogona kuita chimiro chine maburi kana kuti columnar.
Saka michina iyi inofanira kupa kudzora kwakanangana nechikamu che substrate bias, simba re ion-source, plasma density, substrate tembiricha, uye transition time. Izvi hazvifanirwe kuramba zvisina kuchinja mukati me multilayer process yese.
Chikamu chinonamatira chingada kushanda kwakasimba pamusoro uye rubatsiro rwakanyanya rwemaion. Chikamu chinoona zviri mukati chinogona kuda simba shoma reion kuderedza kunyudzwa uye kusanganiswa kweinterface. Chikamu chinochengetedza chakasimba chingada kuwedzera huwandu hweplasma kana bias kuti chiwane huwandu hwakakwana uye kuomarara. Chigadziko chine simba shoma chinogona kuda tembiricha yakaderera yesubstrate uye kudzorwa kwakanyatsorongeka kweprecursor.
Kuomarara kwezvikamu zviviri kunogonawo kupararira kuburikidza nepakati pezvikamu. Kana zvikanganiso zvepadenga kana kuti maronda zvatanga kukura, zvikamu zvinotevera zvinogona kuzviwedzera. Saka maitiro acho anofanira kudzora kugadzirwa kwezvikamu, kudzvinyirirwa kwearc, kuchena kwenzvimbo, kusvibiswa kwezvigadziko, uye mamiriro ekudzivirira kubva pachikamu chekutanga zvichienda mberi.
Kune nanometer-scale multilayers, roughness interface uye interlayer formation zvinogona kukanganisa zvakananga mashandiro e optical kana electronic, zvichiita kuti source stability, movement accuracy, uye interface control zvisiyane kubva pakugadzirwa kwemidziyo.
Kudzora kushushikana kunofanirawo kufungwa nezvako mudura rese. Chinhu chimwe nechimwe chinogona kukonzera kushushikana kana kumanikidzwa zvichienderana nekumanikidzwa kwekuisa, simba reion, tembiricha, chimiro chidiki, uye ukobvu. Kunyangwe kana kushushikana kwechikamu chimwe nechimwe kuchigamuchirwa, kushushikana kwakaunganidzwa kwechimiro chakakora che multilayer kunogona kukonzera kuchinjika, kutsemuka, kukwenya, kana kukanganisa kwemaziso.
Saka nzira yekushandisa michina iyi inofanira kuenzana nekutevedzana kwezvikamu, simba rekuisa zvinhu, chimiro chetembiricha, kugoverwa kweukobvu, uye mamiriro ekutonhodza. Mune mamwe mashandisirwo, zvikamu zvinoderedza kushushikana kana ma interfaces akarongwa zvinogona kuiswa kuti zvivandudze kugadzikana kwechimiro.
Kurongeka Kwemaresipi Kunoshandura Ruzivo Rwemaitiro Kuita Kugadzirwa Kunodzokororwa
Pfungwa yakakwana yekubatanidza mafambiro e multilayer inozopedzisira yaitwa kuburikidza nemaitiro ekubika uye otomatiki-kutonga dhizaini.
Resipi ye multilayer haifanirwe kunge iine mazita e layer chete, nguva yekuisa, kufamba kwegasi, uye magadzirirwo emagetsi. Inofanira kutsanangura mamiriro ese ekuchinja kwemidziyo, kusanganisira mamiriro ekupomba, kusimbiswa kwebase-pressure, source conditioning, substrate heating, plasma cleaning, gas stabilization, power ramping, shutter operation, motion synchronization, endpoint detection, interlayer transition, cooling, venting, uye unloading.
Basa rega rega rinofanira kunge rakabatana nemamiriro ekushanda kwete nguva yapera chete. Semuenzaniso, kuiswa kwemvura hakufanirwe kutanga nekuti nguva yekupomba yapera. Sisitimu inofanira kusimbisa kuti kumanikidzwa, mwero wekubuda kwemvura, tembiricha yesubstrate, mamiriro emvura inotonhorera, uye kugadzirira kwemvura zvinosangana nemamiriro ezvinhu anodiwa.
Saizvozvowo, chikamu chinotevera hachifanirwe kutanga pakarepo mushure mekunge kwadzimwa kwacho. Mutongi angangoda kuona kuti gasi rekare rabviswa, kuyerera kwegasi idzva kwagadzikana, chinangwa chapedza kupfungaira kwemvura, uye substrate yasvika panzvimbo chaiyo uye tembiricha.
Kudzora shanduro yekubika kwakakoshawo pakugadzirwa kwehuwandu. Kuchinja kwesimba, kumanikidzwa, kuyerera kwegasi, ukobvu hwechikamu, bias voltage, kana endpoint criteria zvinofanirwa kunyorwa uye kubatanidzwa kune inoenderana kugadzirwa. Izvi zvinoita kuti zvikwanisike kutevedzera kusiyana kwekushanda kwefirimu kudzokera kumatanho emidziyo uye shanduko dzemaitiro.
Kune zvigadzirwa zvine maitiro akasiyana-siyana, michina inofanira kutsigira magadzirirwo emaresipi emodular. Mabasa akajairika akadai sekupomba, kuchenesa plasma, kuisa adhesion-layer deposition, kana kutonhora anogona kugadziriswa semamodules ekugadzirisa anogona kushandiswazve, nepo ma layer stacks echigadzirwa achiramba achidzorwa zvakasiyana.
Sisitimu ye automation inofanirawo kugadzirisa mamiriro asina kujairika zvichienderana ne layer iripo. Chiitiko chipfupi che arc panguva ye layer yakakora yesimbi chinogona kugadziriswa kuburikidza nekudzvanywa kwe arc otomatiki uye kuramba uchiisa. Chiitiko chimwe chete panguva ye nanometer-scale optical layer chingada kuti sisitimu imire, idzokorore layer, idzokorore layer, kana kuti imake batch kuti iongororwe.
Iyi nzira yekubata zvinhu zvakasiyana-siyana inozivikanwa nezvikamu zvakasiyana-siyana musiyano wakakosha pakati pekutanga otomatiki yemuchina uye otomatiki chaiyo yemaitiro.
Kubva paKugadzikana kweMidziyo Yega Yega kusvika paKuenderana kweStack Yese
Chinangwa chikuru chekubatanidza michina hachisi kungopedzisa nhanho yega yega yekushanda otomatiki. Chinokosha ndechekuona kuti multilayer stack yakaiswa inoramba ichidzokorora mashandiro akagadzirwa.
Izvi zvinoda kurongeka kwezvikamu zvina. Chekutanga kurongeka kwemidziyo pakati pemapombi evacuum, mavharuvhu, magetsi, masisitimu egasi, masosi, maheater, mashandiro ekufamba, masensa, uye maseketi ekutonhodza. Chechipiri kurongeka kwemaitiro pakati pekuchenesa, kuvhura, kuisa, kuita, kuchinja, uye kutonhodza. Chechitatu kurongeka kwedata pakati pemaresipi, masaini e sensor, marekodhi ealarm, mhedzisiro ye endpoint, uye kuyerwa kwemhando. Chechina kurongeka kwehupenyu, kusanganisira kukanganiswa kwechinangwa, kugadziriswa kwenzvimbo, kuchenesa kamuri, kugadzirisa masensa, mamiriro ezvishandiso, uye muripo wemaitiro.
Sezvo machira anoshanda achinyanya kuoma, kugona kwemidziyo kuchaongororwa zvakanyanya nekugona kwayo kudzora firimu rese pane nzvimbo imwe chete yekuburitsa zvinhu. Mibvunzo yakakosha haizogumiri pakuti muchina unogona here kuisa chimwe chinhu. Vagadziri vachafanirawo kuratidza kana michina ichigona kuchengetedza kunaka kweinterface, kudzora kushushikana kwakaunganidzwa, kuderedza kusvibiswa, kugadzirisa kudonha kwechinhu, kubereka mashandiro emagetsi kana emagetsi, uye kuwana kugadzikana kwebatch-to-batch.
Saka, kuiswa kwemafirimu akawanda kunobatanidza kudyidzana pakati pekuvaka michina nekugadzira michina. Kugadzikana kwevacuum kunoita kuti pave nehwaro hwezvakatipoteredza, manyuko uye simba rekugadzirisa zvinhu, kudzora gasi kunodzora kuumbwa kwaro, kufamba kwepasi kunosarudza kufanana kwenzvimbo, kudzora kupisa uye kusarura kunokanganisa kukura kwefirimu, uye kutarisa mukati menzvimbo kunobatanidza mhedzisiro chaiyo yekuputira nechikamu chechikamu chakagadzirwa.
Kana masisitimu aya achishanda pasi pehurongwa hwakabatana hwekudzora maitiro ndipo chete apo zvikamu zvakawanda zvemafirimu zvinogona kuva sisitimu yefirimu inoshanda zvakanaka, inodzokororwa, uye inogadzirwa zvakawanda.
-Chinyorwa ichi chakabudiswa namugadziri wemidziyo yekuputira vacuumZhenhua Vacuum
Nguva yekutumira: Chikunguru-16-2026