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  • Practical Vacuum Coating Machine

    In the fields of advanced manufacturing and industrial production, the demand for practical vacuum coating machines is increasing. These cutting-edge machines are revolutionizing the way a variety of materials are coated, delivering enhanced durability, performance and aesthetics. In this blog po...
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  • Target Material Selection Principle and Classification

    Target Material Selection Principle and Classification

    With the increasing development of sputtering coating technology, especially magnetron sputtering coating technology, at present, for any material can be prepared by ion bombardment target film, because the target is sputtered in the process of coating it to some kind of substrate, the quality of...
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  • RF Sputtering Coating Main Features

    RF Sputtering Coating Main Features

    A. High sputtering rate. For example, when sputtering SiO2, the deposition rate can be up to 200nm/min, usually up to 10~100nm/min. And the rate of film formation is directly proportional to the high frequency power. B.The adhesion between the film and the substrate is greater than the vacuum vap...
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  • Car Lamp Film Production Coating Lines

    Car lamp film production lines are an essential part of the automotive manufacturing industry. These production lines are responsible for the coating and production of car lamp films, which play a crucial role in enhancing the aesthetics and functionality of car lamps. As the demand for high-qual...
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  • The Role of Magnetic Field in Magnetron Sputtering

    The Role of Magnetic Field in Magnetron Sputtering

    Magnetron sputtering mainly includes discharge plasma transport, target etching, thin film deposition and other processes, the magnetic field on the magnetron sputtering process will have an impact. In the magnetron sputtering system plus orthogonal magnetic field, the electrons are subject to th...
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  • Vacuum Coating Machine Requirements of The Pumping System

    Vacuum Coating Machine Requirements of The Pumping System

    Vacuum coating machine on the pumping system has the following basic requirements: (1) The coating vacuum system should have a sufficiently large pumping rate, which should not only rapidly pump out the gases released from the substrate and evaporated materials and the components in the vacuum ch...
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  • Jewelry PVD Coating Machine

    The jewelry PVD coating machine utilizes a process known as Physical Vapor Deposition (PVD) to apply a thin but durable coating onto jewelry pieces. This process involves the use of high-purity, solid metal targets, which are evaporated in a vacuum environment. The resulting metal vapor then cond...
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  • Small Flexible Pvd Vacuum Coating Machine

    One of the main advantages of small flexible PVD vacuum coating machines is their versatility. These machines are designed to accommodate a variety of substrate sizes and shapes, making them ideal for small-scale or custom manufacturing processes. Additionally, its compact size and flexible confi...
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  • Cutting Tools Vacuum Coating Machine

    In the ever-evolving manufacturing industry, cutting tools play a vital role in shaping the products we use every day. From precision cutting in the aerospace industry to complex designs in the medical field, the demand for high-quality cutting tools continues to rise. To meet this demand, the us...
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  • Effect of ion bombardment on the film layer/substrate interface

    Effect of ion bombardment on the film layer/substrate interface

    When the deposition of membrane atoms begins, ion bombardment has the following effects on the membrane/substrate interface. (1) Physical mixing. Because of high-energy ion injection, sputtering of the deposited atoms and the recoil injection of surface atoms and cascade collision phenomenon, wi...
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  • Vacuum Sputtering Coating Revival and Development

    Vacuum Sputtering Coating Revival and Development

    Sputtering is a phenomenon in which energetic particles (usually positive ions of gases) hit the surface of a solid (below called the target material), causing atoms (or molecules) on the surface of the target material to escape from it.   This phenomenon was discovered by Grove in 1842 when...
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  • Characteristics of magnetron sputtering coating Chapter 2

    Characteristics of magnetron sputtering coating Chapter 2

    Characteristics of magnetron sputtering coating (3) Low energy sputtering. Due to the low cathode voltage applied to the target, the plasma is bound by the magnetic field in the space near the cathode, thus inhibiting the high-energy charged particles to the side of the substrate people shot. The...
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  • Characteristics of magnetron sputtering coating Chapter 1

    Characteristics of magnetron sputtering coating Chapter 1

    Compared with other coating technologies, magnetron sputtering coating is characterized by the following features: the working parameters have a large dynamic adjustment range of coating deposition speed and thickness (the state of the coated area) can be easily controlled, and there is no design...
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  • Ion beam assisted deposition technology

    Ion beam assisted deposition technology

    Ion beam assisted deposition technology is the ion beam injection and vapor deposition coating technology combined with ion surface composite processing technology. In the process of surface modification of ion injected materials, whether semiconductor materials or engineering materials, It is of...
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  • Experiment vacuum coating machine

    In recent years, significant progress and breakthroughs have been made in the field of vacuum coating technology. This is only possible due to tireless efforts in experimentation and research. Among the many machines used in this field, experimental vacuum coating machines are key tools for achie...
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