Special Price for Rf Sputtering Equipment - Vacuum plasma cleaning equipment – Zhenhua
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PRODUCT DESCRIPTION
Vacuum plasma cleaning equipment adopts integrated structure, equipped with RF ion cleaning system, fully automatic control, convenient operation and maintenance.
The RF high-frequency generator can generate high-density plasma, activate, etch and ashing the workpiece surface, effectively remove the dust and grease on the product surface, release the surface stress, and obtain various modifications on the workpiece surface.
It is applicable to rubber, glass, ceramic, metal and other products, and is applied to microelectronics, LCD, LED, LCM, PCB circuit board, semiconductor packaging, medical devices, life science experiments and other fields.
Optional models
| VLY1000 | VLY0810 |
φ1000*H1000(mm) |
φ800*H1000(mm) |
PRODUCT FEATURE
INDUSTRY APPLICATION
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