Ukwethulwa kokufakwa kwe-vacuum vapor, i-sputtering kanye ne-ion coating

I-vacuum coating ikakhulukazi ihlanganisa ukufakwa kwe-vacuum vapor, i-sputtering coating kanye ne-ion coating, konke okusetshenziselwa ukufaka amafilimu ahlukahlukene ensimbi kanye ne-non-metal ebusweni bezingxenye zepulasitiki nge-distillation noma i-sputtering ngaphansi kwezimo ze-vacuum, ezingathola i-surface coating encane kakhulu ngenzuzo evelele yokunamathela okusheshayo, kodwa intengo ingasetshenziswa futhi izinhlobo eziphakeme kakhulu zensimbi, futhi intengo ingasetshenziswa kakhulu, futhi intengo ingasetshenziswa kakhulu, futhi intengo ingasetshenziswa futhi. ukunamathela okusebenzayo kwemikhiqizo yezinga eliphezulu.
I-vacuum vapor deposition yindlela yokushisisa insimbi ngaphansi kwe-vacuum ephezulu, iyenze inyibilike, ihwamuke, futhi yakhe ifilimu yensimbi encane ebusweni besampula ngemva kokupholisa, enogqinsi luka-0.8-1.2 um. Igcwalisa izingxenye ezincane ze-concave kanye ne-convex ebusweni bomkhiqizo owenziwe ukuze kutholwe indawo efana nesibuko.Lapho ukufakwa kwe-vacuum vapor kwenziwa ukuze kutholwe umphumela wesibuko esikhanyayo noma ukuthungatha insimbi ngokunamathela okuphansi, indawo engaphansi kufanele iboshwe.

I-sputtering ngokuvamile ibhekisela ku-magnetron sputtering, okuyindlela ye-sputtering enezinga eliphezulu elinesivinini esiphansi. Inqubo idinga vacuum cishe 1 × 10-3Torr, okungukuthi 1.3 × 10-3Pa isimo vacuum egcwele inert gas argon (Ar), futhi phakathi substrate plastic (anode) kanye target metal (cathode) plus high-voltage wamanje oqondile, ngenxa excitation electron of inert gas engenzi lutho olukhiqizwe yi-producing the plasmatomto , i-producing the plasmatos, yethagethi yensimbi bese iwafaka ku-substrate yepulasitiki. Iningi lezingubo zensimbi ezijwayelekile zisebenzisa i-DC sputtering, kuyilapho izinto zobumba ezingaqhubeki zisebenzisa i-RF AC sputtering.

Ukugcotshwa kwe-ion kuyindlela lapho ukuchithwa kwegesi kusetshenziswa khona ukwenza igesi ibe ionini kancane noma into ehwamukile ngaphansi kwezimo ze-vacuum, futhi into ehwamukile noma izinto ezisabela ngayo kuzo zifakwa ku-substrate ngokuqhunyiswa kwama-ion wegesi noma ama-ion wento ehwamukile. Lokhu kufaka i-ion coating ye-magnetron sputtering, i-ion esebenzayo, i-ion yokukhipha i-cathode engenalutho (indlela yokubeka umphunga we-cathode ongenalutho), kanye ne-multi-arc ion coating (i-cathode arc ion coating).

I-magnetron emile emaceleni ekabili ephafaza inamathela eqhubekayo emgqeni
Ukusebenza okubanzi, kungasetshenziselwa imikhiqizo ye-elekthronikhi efana nesendlalelo sokuvikela igobolondo le-EMI, imikhiqizo eyisicaba, kanye nayo yonke imikhiqizo yenkomishi yesibani ngaphakathi kokucaciswa okuthile kobude ingakhiqizwa. Umthamo omkhulu wokulayisha, ukugoqa okuhlangene kanye nokubambeneka okugxaza kwezinkomishi ezikhanyayo zokwemboza okunezinhlangothi ezimbili, okungaba nomthamo omkhulu wokulayisha. Ikhwalithi ezinzile, ukungaguquguquki okuhle kwesendlalelo sefilimu kusuka kunqwaba kuya kunqwaba. Izinga eliphakeme lokuzenzakalelayo kanye nezindleko eziphansi zokusebenza zokusebenza.

-Le ndatshana ikhishwe nguumenzi womshini we-vacuum coatingI-Guangdong Zhenhua