Kubuchwepheshe besimanje bokumboza nge-vacuum, ukulawulwa kwe-bias voltage kuyipharamitha ebalulekile ethinta ngqo isakhiwo sefilimu encane, ubuningi, ukucindezeleka kwangaphakathi, kanye namandla okunamathela. Kungakhathaliseki ukuthi kusezimbozweni eziqinile, amafilimu okuhlobisa, noma ezimbozweni ezibonakalayo, ukulawulwa okufanele kwe-substrate bias voltage akugcini nje ngokulawula amandla e-plasma, kodwa futhi kuthuthukisa ukusebenza kanye nokuthembeka kwamafilimu atholakele.
Cha.1 Kuyini Ukulawulwa Kwe-Bias Voltage?
Ukulawulwa kwe-voltage okubandlululayoibhekisela enkambisweni yokusebenzisa amandla angemahle ku-substrate ngesikhathi sokufakwa, okwenza kube ngaphansi ngogesi kune-plasma ezungezile. Le nqubo isetshenziswa kabanzi ezinqubweni ze-PVD (Physical Vapor Deposition), ikakhulukazi ekufakweni kwe-magnetron, ukufakwa kwe-ion plating, kanye nezinhlelo zokufakwa kwe-cathodic arc.
Ukubandlulula kwe-substrate kungasetshenziswa nge-DC (Direct Current), i-MF (Mid-Frequency), noma i-RF (Radio Frequency). Indima yayo eyinhloko ukusheshisa ama-ion amahle ku-plasma abheke ebusweni be-substrate, okuvumela ukuqhuma kwama-ion okukhuthaza izici zokukhula kwefilimu ezifiselekayo.
Cha.2 Indlela i-Bias Voltage ethinta ngayo izakhiwo zefilimu
Indlela eyisisekelo yokulawula i-bias voltage ilele ekuguquleni i-kinetics yokukhula kwefilimu ngamandla ama-ion angenayo. Umthelela wayo ubonakala ezicini eziningana ezibalulekile:
Ukuqina:
Ukukhetha okungalungile okufanele kwandisa amandla e-kinetic ama-ion afika ku-substrate, okukhuthaza ukuhamba komhlaba kanye nokuhlelwa kabusha kwama-adatoms. Lokhu kuholela kumafilimu aminyene anokumelana nokugqwala okuthuthukisiwe, ubulukhuni, kanye nokumelana nokuguguleka.
Ukulawulwa Kokucindezeleka:
Ukuqhuma kwe-ion nakho kuletha ukucindezeleka okusele ngaphakathi kwefilimu. Ubandlululo oluningi lungabangela ukucindezeleka okucindezelayo, okungase kubangele ukuqhekeka noma ukuhlukana. Ngakho-ke, amazinga obandlululo afanele kumele akhethwe ngokucophelela ngokusekelwe ezintweni zefilimu, uhlobo lwe-substrate, kanye nobukhulu be-coating.
Ukuthuthukiswa Kokunamathela:
I-Bias voltage ithuthukisa ukusebenzisana kwe-interfacial ngokukhuthaza ukuxubana kwe-interlayer noma ukwakha ama-interface ahlelwe ngokwezinga, ngaleyo ndlela kuthuthukiswe ukunamathela kwefilimu kuya ku-substrate—okubaluleke kakhulu ekumbozweni okuqinile noma ezakhiweni ze-multilayer.
Ukucindezela Izinhlayiya Nokushelela Komphezulu:
Ukuthambekela okufanele kungacindezela ukufakwa kwezinhlayiya ezinkulu futhi kunciphise ubulukhuni bomphezulu, ngaleyo ndlela kuncishiswe ukulahleka kokuhlakazeka kwamafilimu okukhanya futhi kuthuthukiswe ikhwalithi yomphezulu.
Izinhlobo Ezi-3 Zezindlela Zokulawula Ubandlululo
I-DC Bias: Ivame ukusetshenziswa kuma-substrate aqhubayo, inikeza ukulawula okulula kanye nokuphendula okusheshayo. Okujwayelekile kuma-coating okuhlobisa kanye nama-coating aqinile.
I-RF Bias: Ilungele izinto ezingezona ezihambisa umoya njengengilazi, izinto zobumba, kanye nama-polymer. Inikeza ukuhambisana okubanzi kwezinto kodwa idinga ukuhlanganiswa kwesistimu okuyinkimbinkimbi kakhulu kanye nokulungiswa kwenqubo.
I-Pulsed Bias: Kuhilela ukusebenzisa ama-periodic bias pulses, ukulinganisela izinga lokufakwa kanye namandla e-ion. Ifaneleka kahle ezimbozweni ezisezingeni eliphansi lokushisa noma ama-geometri ayinkimbinkimbi.
Ngaphezu kwalokho, ezinye izinhlelo ezithuthukisiwe zisebenzisa ukulawulwa kwe-closed-loop bias, okuqapha izici ze-plasma kanye ne-bias current ngesikhathi sangempela ukuze kugcinwe iwindi lenqubo elizinzile futhi kuqinisekiswe ukufana kokumboza kuzo zonke izinqwaba.
—Lesi sihloko sishicilelwe ngu imishini yokumboza nge-vacuumumenzi we-Zhenhua Vacuum
Isikhathi sokuthunyelwe: Julayi-17-2025