Plasma is a type of ionized gas which positive ion and electron density roughly equal. Because the plasma is combination which has a higher energy than gas, when in plasma environment matter can gain much more physical and chemical characteristics.
Plasma cleaning equipment operating principle is depend on the "activization" of matter whcin in"plasma state to remove the stains of production surface Judging from present various types of cleaning method, plasma cleaning the most thorough ablative way of all cleaning ways.
Equipment can widely applied to semiconductor, mi-electronics, front COG, LCD, LCM and LED processing, precision cleaning before device package, vacuum electron,connector,electric reloy and the solar PV industry etc, and also applied to the field of surface cleaning of plastic,rubber,metal and ceramics, etching process, ashing process,surlace activation and Life Science Experiment etc.
|Inner size of vacuum room||Ф500*600mm|
|Equipment Data||Weight:1200KGS,Power:85KW, Voltage:380V|
|Film Forming||Decorative color film (golden color, siver color, coffee color, blue color,etc) function film (AF, ITO, etc)|
|Coating Technology||Magnetron sputtering coating|
|Substrate||Metal, Glass,ceramics, plastic, etc.|
|The material of chamber||SUS304 stain steel|
|Coating Feature||Decorative film or special function film, bright color, not easy polluted, good uniformity|
|Control system||Manual,Semi-automatic, Fully automatic|
|Operation system||Touch screen+PLC|
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