— Uhlalutyo oluCwangcisiweyo ukusuka kwiSakhiwo seFilimu ukuya kuLawulo lweNkqubo
1. Kuthetha ukuthini ngokwenene "Ukuphela kombala emva kokugquma"?
Kwiimboni yokwaleka nge-vacuum, ukufiphala kombala akukokutshintsha kombala okubonakalayo nje kuphela. Ngokuqhelekileyo kubonakala ngolu hlobo:
Ukonakala kombala kancinci kancinci okanye ukutshintsha kwexesha
Ukuphambuka kombala emva kokufuma, ukuguga kobushushu, okanye uvavanyo lokuvezwa yi-UV
Ukutshintsha kombala wendawo, ukuba ngwevu, okanye ukulahleka kokukhanya kwesinyithi
Ngokusisiseko, ukufiphala kombala akubangelwa ngumbala ongazinzile ngokwawo, kodwa kukusilela kwesakhiwo, izinto, okanye iinkqubo kwinkqubo yokugquma.
2. Izizathu eziphambili zokuphela kombala emva kokwambathisa nge-vacuum
2.1 Ubuninzi beFilimu obunganelanga obukhokelela kwi-Oxidation okanye ukungena komswakama
Ngexesha lokuphuma kwe-PVD okanye ukutshiza kwe-magnetron, amandla okugcina angonelanga okanye uxinano oluphantsi lwe-plasma kunokubangela isakhiwo sokukhula kwe-columnar esine-porosity ephezulu.
Iifilimu ezinjalo zinokubangela oku kulandelayo:
Ukusasazwa kweoksijini kunye nokufuma kwimida yeenkozo
Ukubola okanye ukubola komaleko wesinyithi
Utshintsho kwiimeko zokuphazamiseka kwamehlo
Oku ekugqibeleni kukhokelela ekuwohlokeni kombala okanye ekuguqulweni kwawo.
2.2 Ukukhethwa Okungafanelekanga Kweenkqubo Zezinto Zokugquma
Izinto ezahlukeneyo zokugquma zibonisa uzinzo oluhluke kakhulu kokusingqongileyo:
Iifilimu zesinyithi ezicocekileyo (umz., i-Al, i-Cr) zichaphazeleka kakhulu yi-oxidation ngaphandle kweengqimba zokukhusela
Iintsimbi ezithile ezinemibala okanye ii-alloys zinovelwano kwiindawo ezifumileyo nezishushu
Ukushukuma kwesalathisi sokujika kwe-Refractive kwi-dielectric layers kubangela ngokuthe ngqo ukwahluka kombala
Ngaphandle komaleko wesinyithi oyilwe kakuhle kunye nolwakhiwo lomaleko wokukhusela i-dielectric, umngcipheko wokuphela kombala uyanda kakhulu.
2.3 Ulawulo olungonelanga lokutyeba kwefilimu kunye nokungazinzi kokuphazamiseka
Imibala yokuhombisa neyokusebenza kakuhle idla ngokuveliswa ziziphumo zokuphazamiseka kwembonakalo, ezibuthathaka kakhulu kubukhulu befilimu.
Imiba efana nale:
I-Quartz crystal monitor drift okanye indawo engafanelekanga ye-sensor positioning
Ukuguquguquka kwesantya sokubekwa kwemali
Ukujikeleza okanye ukhuselo lwe-substrate olungalinganiyo
kunokubangela ukuphambuka kobukhulu, okukhokelela ekutshintsheni kombala kunye nokungalingani kwebhetshi.
2.4 Ukuncamathela okunganelanga okubangela ukuqhekeka okuncinci
Ukuba ukucocwa kwe-substrate akwanelanga, okanye unyango lwangaphambi kwe-plasma kunye nokusebenza kwe-ion akwanelanga, ukunamathelana phakathi kwefilimu kunye ne-substrate kunokuba buthathaka.
Phantsi komjikelo wobushushu, uxinzelelo loomatshini, okanye ukwaluphala kwendalo, ukuqhekeka okuncinci okanye ukwahlukana kwendawo kunokwenzeka, okubonakala ngathi kukuphela kombala okanye ukungalingani.
2.5 Ukungabikho koYilo oluSebenzayo lweLayer yoKhuseleko
Kwiindawo ezingaphakathi kweemoto, ekukhanyeni, okanye kwiindawo ezinomswakama ophezulu, ukungabikho kwezi zinto zilandelayo:
Iileya zokukhusela i-dielectric ezixineneyo ezifana ne-SiO₂ okanye i-SiNx
Iingubo eziphezulu ezichasene nokunyatheliswa kweminwe (AF) okanye ezingagugiyo
iveza ifilimu ngqo kuhlaselo lokusingqongileyo, ikhawulezisa ukuguga kunye nokunyamalala kombala.
3. Izisombululo zoBunjineli zokuthintela ukuFipha kweMbala
3.1 Ukuphucula Amandla okubeka kunye nobuninzi befilimu
Ngokwenza ngcono:
Uxinano lwamandla okutshiza iMagnetron
Iiparameter ze-Ion-assisted deposition (IAD)
Ukukhetha okungaphantsi komhlaba kunye nobushushu
Uxinano lwefilimu lungaphuculwa kakhulu, nto leyo ethintela ngempumelelo ukungena kwe-oxidation kunye nokufuma.
3.2 Ukuphucula Uyilo lweStack yokuGcina
Ukwamkela iileya ezibonisa ukukhanya kwesinyithi kunye nezakhiwo zokukhusela i-dielectric ezineeleya ezininzi kuqinisekisa ukusebenza okubonakalayo kunye nokuzinza kokusingqongileyo kwexesha elide.
3.3 Ukuphumeza Ukubeka Esweni Nokulawula Ubukhulu Be-Closed-Loop
Iinkqubo zokubeka esweni iikristale zeQuartz kunye nee-algorithms zokulawula ezivaliweyo ziqinisekisa ukuphindaphindeka kobukhulu obuphezulu kunye nokuhambelana kwebhetshi nebhetshi.
3.4 Ukuqinisa Unyango Lwangaphambi Komphezulu kunye noBunjineli boMdibaniso
Ukucocwa kweplasma kunye nokusebenza kwe-ion bombardment kuphucula amandla okubopha phakathi kwengubo kunye ne-substrate.
4. Isiphelo
Ukuphela kombala emva kokufakwa kwe-vacuum akusoloko kubangelwe yimpazamo enye yeparameter. Kubangelwa kukusilela kwinqanaba lenkqubo okubandakanya ukukhethwa kwezinto, uyilo lwe-coating stack, kunye nolawulo lwenkqubo.
Kuphela yindlela yobunjineli obupheleleyo apho ukuzinza kombala ixesha elide kunye nokuhambelana kwemveliso ngobuninzi kungenziwa khona.
–Eli nqaku lipapashwe nguizixhobo zokugquma nge-vacuumumenzi we-Zhenhua Vacuum
Ixesha leposi: Disemba-18-2025
