Iimpawu zePlasma kwiCathodic Arc Deposition

Uhlalutyo loBugcisa oluvela kwiNkqubo kunye neeMbono zeZixhobo

Idiphozithi ye-arc yeCathodicI-n yaziwa ngokubanzi njengetekhnoloji ye-PVD ene-ionization ephezulu ekwaziyo ukuvelisa iingubo ezixineneyo, ezinamathelayo kakhulu, neziqinileyo kakhulu.
Eyona nto iphambili kule nkqubo kukukho iplasma ekhethekileyo eveliswa kukukhupha kwe-cathodic arc, eneempawu ezahlula ngokusisiseko kwi-magnetron sputtering kunye nezinye iindlela ze-PVD.

Ukuqonda indlela esebenza ngayo i-plasma kwiinkqubo ze-cathodic arc kubalulekile ekulawuleni ulwakhiwo lwe-coating, ukusebenza, kunye nokuzinza kwenkqubo yexesha elide.

1. Imvelaphi yeCathodic Arc Plasma

Kwi-cathodic arc deposition, i-plasma iveliswa kwiindawo ezincinci ze-cathode ezenziwe kumphezulu ekujoliswe kuwo xa kuqaliswa ukukhupha i-arc ene-high-current, ene-low voltage.

Iimpawu eziphambili zeendawo ze-cathode ziquka:

1. Uxinano lwamandla angaphakathi oluphezulu kakhulu (10⁶–10⁸ A/cm²)

2. Ubushushu obuphezulu kakhulu bendawo

3. Ukufuma okukhawulezayo kwezinto ze-cathode

Le nkqubo ivelisa iplasma equlathe ikakhulu izinto ezijoliswe kuzo ezi-ionized, endaweni yee-athomu ezingathathi cala.

2. Isidanga se-Ionization esiPhakamileyo: Uphawu olucacileyo

Enye yezona zinto zibalulekileyo kwi-cathodic arc plasma kukuba i-ionization fraction yayo iphezulu kakhulu.

Amazinga e-ionization kwiintlobo zesinyithi anokudlula i-70–90% kwaye inxalenye enkulu yee-ions zichajwa ngokuphindaphindiweyo (M²⁺, M³⁺)

Eli nqanaba liphezulu le-ionization lenza:

1. Unxibelelwano oluqinileyo phakathi kwe-ion ne-substrate

2. Ukwandiswa koxinano lwefilimu

3. Ukunamathela okuphezulu kokugquma nokuba kumaqondo obushushu aphantsi kakhulu

Ngokwembono yobunjineli, i-ionization ephezulu inika ithuba elibanzi neliqinileyo lenkqubo, ngakumbi kwiingubo eziqinileyo nezikhuselayo.

3. Amandla e-Ion aphezulu kunye nolwalathiso

I-plasma ye-arc ye-Cathodic ibonisa amandla aphezulu e-ion angaphakathi, adla ngokuqala kwi-tens eziliqela ukuya kwi-electron volts ezingaphezu kwekhulu.

Iziphumo zale plasma enamandla ziquka:

1. Ukusebenza kakuhle komphezulu kunye nokucoca

2. Ukwanda kokuhamba kwe-adatom kwi-substrate

3. Ukwenziwa kwezakhiwo zefilimu ezixineneyo, ezicolekileyo okanye ezingenasimo

Xa zidityaniswe ne-substrate biasing, amandla e-ion anokulungiswa ngokuchanekileyo ukuze alungelelaniswe:

1. Uxinano lwefilimu

2. Ulawulo loxinzelelo oluseleyo

3. Ukunamathela kokwaleka

Olu lawulo luluncedo olukhulu kwiinkqubo ze-cathodic arc kwizicelo zoshishino.

4. Ubuninzi bePlasma kunye neempawu zoThutho

Xa kuthelekiswa nezinye iiplasma zePVD, iplasma ye-cathodic arc ibonisa oku kulandelayo:

1. Uxinano oluphezulu kakhulu lweplasma

2. Ukwandiswa kweplasma okuqhutywa nguwe ngamandla ukusuka kwindawo ye-cathode

Uthutho lweplasma luphenjelelwa zezi: Umsinga we-arc; Amasimi okuqhuba emagnethi; ijiyometri yegumbi;

Isikhokelo esifanelekileyo seplasma siqinisekisa: Ubukhulu obufanayo bokugquma; Amanqanaba okubekwa okuzinzileyo; Iimpawu zokugquma ezihlala zihleli kwiibhetshi

5. IiMacroparticles: Umngeni wePlasma oQhelekileyo

Uphawu olwahlukileyo lwe-cathodic arc plasma kukuveliswa ngaxeshanye kwee-macroparticles (amaconsi).

Ezi particles zinyibilikisiweyo okanye ziqinileyo zivela kwezi zinto zilandelayo: Ukuphuma kwezinto eziqhumayo kwiindawo ze-cathode; ii-Macroparticles zinokuchaphazela kakubi:; Uburhabaxa bomphezulu; Umgangatho wokukhanya; Ukusebenza kwe-tribological

Ukujongana noku, iinkqubo zoshishino zihlala zidibanisa:

Iinkqubo zeplasma ze-arc ezihluziweyo ze-arc ze-magnetic okanye ze-duct

Iindlela zokulawula indawo ye-cathode ezilungiselelweyo

Itekhnoloji ye-arc ehluziweyo ivumela ukugcinwa kweenzuzo eziphezulu ze-ionization ngelixa inciphisa kakhulu ungcoliseko lwamasuntswana.

–Eli nqaku lipapashwe nguizixhobo zokugquma nge-vacuumumenzi we-Zhenhua Vacuum