Itekhnoloji ye-CVD isekwe kwi-chemical reaction. Ukusabela apho ii-reactants zikwimo yegesi kwaye enye yeemveliso ikwimo eqinileyo idla ngokubizwa ngokuba yi-CVD reaction, ngoko ke inkqubo yayo yekhemikhali yokusabela kufuneka izalisekise le miqathango mithathu ilandelayo.
(1) Kwiqondo lokushisa lokubeka, ii-reactants kufuneka zibe noxinzelelo olwaneleyo lomphunga. Ukuba i-reactants i-gaseous yonke kwiqondo lokushisa, i-deposit device ilula, ukuba i-reactants iguquguqukayo kwiqondo lokushisa elincinane kakhulu, kufuneka ifudunyezwe ukuze iyenze ibe yinto eguquguqukayo, kwaye ngamanye amaxesha kufuneka isebenzise igesi yokuthwala ukuyizisa kwigumbi lokuphendula.
(2) Kwiimveliso zokusabela, zonke izinto kufuneka zibe kwimo yegesi ngaphandle kwediphozithi efunwayo, ekwimeko eqinileyo.
(3) Uxinzelelo lomphunga wefilimu ediphozithiweyo kufuneka lubephantsi ngokwaneleyo ukuze kuqinisekiswe ukuba ifilim ediphozithiweyo incanyathiselwe ngokuqinileyo kwisubstrate enobushushu obuthile obubekiweyo ngexesha lokusabela kokubekwa. Uxinzelelo lomphunga we-substrate kwiqondo lokushisa lokubeka kufuneka libe phantsi ngokwaneleyo.
I-deposition reactants yahlulwe yangamazwe amathathu alandelayo.
(1) Ubume begesi. Izinto zomthombo ezinegesi kwiqondo lobushushu begumbi, njengemethane, ikharbon diokside, iammonia, iklorini, njl.njl., ezona zinceda kakhulu ekubekeni umphunga wekhemikhali, kwaye isantya sokuhamba silawulwa ngokulula.
(2) Ulwelo. Ezinye izinto zokusabela kwiqondo lobushushu begumbi okanye ubushushu obuphezulu kancinane, kukho uxinzelelo lomphunga oluphezulu, olufana ne-TiCI4, iSiCl4, CH3SiCl3, njl., lunokusetyenziselwa ukuthwala irhasi (efana ne-H2, N2, Ar) ihamba ngomphezulu wolwelo okanye ulwelo olungaphakathi kwiqamza, emva koko uthwale umphunga ogcweleyo wento kwisitudiyo.
(3) Isimo esiqinileyo. Xa kungekho mthombo ofanelekileyo wegesi okanye we-liquid, kunokusetyenziswa kuphela i-slid-state feedstocks. Ezinye izinto okanye iikhompawundi zazo kumakhulu eedigri zinoxinzelelo olukhulu lomphunga, olufana ne-TaCl5, Nbcl5, ZrCl4, njl. njl., zinokuthwalwa kwisitudiyo kusetyenziswa irhasi yokuthwala efakwe kumaleko wefilimu.
Uhlobo lwemeko eqhelekileyo ngakumbi ngegesi ethile kunye nomthombo wegesi-eqinile okanye i-gas-liquid reaction, ukubunjwa kwamacandelo afanelekileyo e-gaseous kwi-studio yokuhanjiswa. Ngokomzekelo, i-HCl igesi kunye ne-metal Ga isabela ukwenza i-gaseous component GaCl, ehanjiswa kwi-studio ngendlela ye-GaCl.
–Eli nqaku likhutshwa nguumenzi womatshini wokugqumaGuangdong Zhenhua
Ixesha lokuposa: Nov-16-2023