Kwiiteknoloji zanamhlanje zokugquma nge-vacuum, ulawulo lwe-bias voltage luphawu olubalulekileyo oluchaphazela ngokuthe ngqo ulwakhiwo lwe-thin film microstructure, uxinano, uxinzelelo lwangaphakathi, kunye namandla okunamathela. Nokuba kukwii-hard coating, iifilimu zokuhombisa, okanye ii-optical coating, ulawulo olufanelekileyo lwe-substrate bias voltage alugcini nje ngokulawula i-plasma dynamics, kodwa lukwaphucula ukusebenza kunye nokuthembeka kweefilimu eziphumayo.
Hayi.1 Yintoni uLawulo lweVolthi yeBias?
Ulawulo lwe-voltage olukhethayoibhekisa kwindlela yokusebenzisa amandla angalunganga kwi-substrate ngexesha lokufakwa, okwenza ukuba ibe phantsi ngombane kune-plasma ejikelezileyo. Le ndlela isetyenziswa kakhulu kwiinkqubo ze-PVD (Physical Vapor Deposition), ingakumbi kwiinkqubo ze-magnetron sputtering, i-ion plating, kunye neenkqubo ze-cathodic arc deposition.
I-substrate bias ingasetyenziswa ngokusebenzisa izixhobo zamandla ze-DC (Direct Current), i-MF (Mid-Frequency), okanye i-RF (Radio Frequency). Indima yayo ephambili kukukhawulezisa ii-ions ezintle kwi-plasma ukuya kumphezulu we-substrate, okuvumela ukuqhushumba kwee-ion okukhuthaza iimpawu zokukhula kwefilimu ezinqwenelekayo.
Hayi.2 Indlela iBias Voltage echaphazela ngayo iiPropati zeFilimu
Indlela esisiseko yolawulo lwe-bias voltage ikwindlela yokuguqula i-kinetics yokukhula kwefilimu ngokusebenzisa amandla ee-ions ezingenayo. Impembelelo yayo ibonakala kwiinkalo ezininzi ezibalulekileyo:
Uxinano:
Ukukhetha okungalunganga okufanelekileyo kwandisa amandla e-kinetic ee-ions ezifika kwi-substrate, nto leyo ekhuthaza ukuhamba komphezulu kunye nokuhlelwa kwakhona kwee-adatoms. Oku kukhokelela kwiifilimu ezixineneyo ezinokumelana nokugqwala okuphuculweyo, ubulukhuni, kunye nokumelana nokuguguleka.
Ulawulo loxinzelelo:
Ukuqhushumba kwe-ion kukwazisa uxinzelelo olushiyekileyo kwifilimu. Ukukhetha okugqithisileyo kunokubangela uxinzelelo oluxinzelelweyo, okunokubangela ukuqhekeka okanye ukwahlukana. Ke ngoko, amanqanaba okukhetha afanelekileyo kufuneka akhethwe ngononophelo ngokusekelwe kwizinto zefilimu, uhlobo lwesiseko, kunye nobukhulu bengubo.
Ukuphucula ukunamathela:
I-Bias voltage iphucula ukusebenzisana phakathi kwe-interfacial ngokukhuthaza ukuxubana phakathi kwe-interlayer okanye ukwenza ii-interfaces ezilinganisiweyo, ngaloo ndlela iphucula ukunamathelana kwefilimu ukuya kwi-substrate—ingakumbi kubaluleke kakhulu kwiingubo eziqinileyo okanye izakhiwo ze-multilayer.
Ukunciphisa iinxalenye kunye nokuSmoothing Surface:
Ukuthambekela okufanelekileyo kunokuthintela ukufakwa kwamasuntswana amakhulu kwaye kunciphise uburhabaxa bomphezulu, ngaloo ndlela kunciphisa ukulahleka kokusasazeka kwiifilimu ze-optical kunye nokuphucula umgangatho womphezulu.
Iintlobo zeendlela zokulawula ucalucalulo
I-DC Bias: Isetyenziswa rhoqo kwi-substrates eziqhubayo, inikezela ngolawulo olulula kunye nokuphendula ngokukhawuleza. Iqhelekile kwiingubo zokuhombisa kunye neengubo eziqinileyo.
I-RF Bias: Ilungele izinto ezingasetyenziswayo njengeglasi, i-ceramics, kunye nee-polymers. Inika ukuhambelana okubanzi kwezinto kodwa ifuna ukuhlanganiswa kwenkqubo okuntsonkothileyo kunye nokulungiswa kwenkqubo.
I-Pulsed Bias: Ibandakanya ukusebenzisa ii-periodic bias pulses, ukulinganisela izinga lokufakwa kunye namandla e-ion. Ifanelekile kwiingubo ezishushu okanye iijiyometri ezintsonkothileyo.
Ukongeza, ezinye iinkqubo eziphambili zisebenzisa ulawulo lwe-closed-loop bias, olujonga iimpawu ze-plasma kunye ne-bias current ngexesha langempela ukugcina ifestile yenkqubo ezinzileyo kunye nokuqinisekisa ukufana kwe-coating kuzo zonke iibhetshi.
—Eli nqaku lipapashwe ngu izixhobo zokugquma nge-vacuumumenzi we-Zhenhua Vacuum
Ixesha leposi: Julayi-17-2025