What is the resistance evaporation source evaporation(vacuum evaporation coating machine)?
The resistance evaporation source evaporation method is a basic vacuum evaporation coating machine method. "Evaporation" refers to heating and evaporating the coating material to be formed into a thin film in the vacuum chamber, so that the atoms or molecules of the material are vaporized from the surface and escaped. It is a thin film preparation method that forms a vapor flow phenomenon, which is incident on the surface of the substrate or substrate, and finally condenses to form a solid thin film.
The so-called resistance evaporation source evaporation method is to use high melting point metals such as tantalum, molybdenum, tungsten, etc., to make an evaporation source of appropriate shape, on which the material to be evaporated is filled, the airflow is passed, and the evaporated material is directly heated and evaporated, or the material to be evaporated is directly heated and evaporated. The evaporating material is put into a crucible such as alumina, beryllium oxide, etc. for indirect heating and evaporation. This is the resistance heating evaporation method.
The vacuum evaporation coating machine that uses resistance heaters to heat and evaporate has the advantages of simple structure, low cost and reliable use. It can be used for evaporation coating of materials with a low melting point, and is especially suitable for mass production with low requirements for coating quality. To date, in the production of aluminum-plated mirrors, there is still a large amount of resistance heating evaporation coating machine technology put into use.
The shortcomings of the resistance evaporation source evaporation method are: the maximum temperature that can be reached by heating is limited, and the life of the heater is also short. In recent years, in order to improve the service life of the resistance evaporation source, domestic and foreign vacuum coating equipment factories have adopted the long-lived conductive ceramic material synthesized by boron nitride as the evaporation source. According to a Japanese patent report, it can use a material composed of 20%-30% boron nitride and a refractory material that can be melted to make an evaporation source (crucible), and coat it with a layer Containing 62%-82% zirconium, the rest is zirconium-silicon alloy material.
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