Vacuum sputtering coating of optical recording media(pvd vacuum sputtering coating machine)
The pvd vacuum sputtering coating machine of optical recording media requires sputtering targets with good sputtering efficiency, film characteristics, crystal image uniformity, cleanliness, and recycling system characteristics.
Under high vacuum, the electron beam coating machine emits thermionic electrons, which are accelerated by the accelerating anode, and obtain huge kinetic energy to bombard the evaporation material. The kinetic energy is converted into heat to heat the evaporation material to realize the electron beam evaporation coating. The electron beam coating machine consists of a hot cathode emitting electrons, an electron accelerating electrode and a coating material as an anode. The energy of the electron beam evaporation source can be highly concentrated, so that the coating material locally reaches a high temperature and evaporates. By adjusting the power of the electron beam, the evaporation rate of the coating material can be conveniently controlled, especially for metals and compound materials with high melting point and high purity.
Characteristics of Electron Beam Coating Machine Coating
Electron beam coating machine is a thin film manufacturing equipment commonly used in industry. Due to the characteristics of the evaporative coating machine, it plays an important role in film production. The film is mainly produced by the heating of the electron beam in the coating machine.
1. Advantages of electron beam coating machine
(1) The electron beam heating method in the coater is compared with the traditional resistance heating method. The electron beam heating will produce a higher flux density, which is conducive to the evaporation of high melting point materials, and can also increase the evaporation rate to a certain extent.
(2) When the electron beam coating machine is working, the raw material to be evaporated is put into a water-cooled copper crucible, which can prevent the material from being contaminated and produce a high-purity thin film.
The kinetic energy of the particles evaporated by the electron beam is relatively large, which is conducive to the precision and binding force of the film.
2. Disadvantages of electron beam coating machine
The overall structure of the electron beam evaporation coating machine is relatively complicated, and the price is relatively high compared to other coating equipment.
When the coating machine is working, if the vapor density near the evaporation source is relatively high, the electron beam current will interact with the vapor particles to a certain extent, which will affect the electron flux and cause the electron flux to lose or deviate from the track. At the same time, you may also cause the excitation and ionization of steam and residual gas, which will affect the quality of the entire film.
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