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​The cleaning of the surface of the substrate of the vacuum coating machine is more important

​The cleaning of the surface of the substrate of the vacuum coating machine is more important

2020-12-10

The cleaning of the surface of the substrate of the vacuum coating machine is more important


In the electric vacuum process, through various cleaning methods, the adhesion of grease, dust, surface attachments, metal fines, excess oxide film, graphite film and other contaminants can be completely removed from the equipment, thereby improving the life of the electric vacuum machinery And mechanical reliability.


vacuum coating machine



The working principle of the vacuum coating machine is as follows:


  In the field of coating, the thickness of the film sample after coating is an important factor affecting the performance of the film. Therefore, when evaluating the performance of a film sample, it is necessary to test the performance of the film sample under different thicknesses. In the case of vacuum coating, this often requires multiple sample preparations. However, there are two problems in preparing samples for multiple times: firstly, different growth samples have different instrument conditions, so that the factor that affects the performance of the film sample may not only be the thickness; secondly, the sample needs to be vacuumed again in the vacuum coating experiment. Obtaining is very time-consuming. Increase the cost of production and testing.


Therefore, a multi-functional magnetron sputtering coating system is provided. This system is composed of a vacuum coating system and a glove box system. It can complete thin film evaporation in a high vacuum evaporation chamber and has high purity inert gas in the glove box. The storage and preparation of samples and the detection of samples after evaporation are carried out in an atmosphere. The combination of evaporation coating and glove box realizes the fully enclosed production of evaporation, encapsulation, testing and other processes, so that the entire film growth and device preparation process is highly integrated in a complete controllable environment atmosphere system, eliminating the organic large-area circuit preparation process The influence of unstable factors in the atmospheric environment guarantees the preparation of high-performance, large-area organic optoelectronic devices and circuits.


   Multifunctional magnetron sputtering coating system is mainly used for the preparation of various metal films, semiconductor films, dielectric films, magnetron films, optical films, superconducting films, sensing films and various special functional films.


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