Mehlaleng ea sejoale-joale ea ho roala ka vacuum, taolo ea motlakase oa leeme ke parameter ea bohlokoa e susumetsang ka ho toba sebopeho se senyenyane sa filimi, bongata, khatello ea ka hare le matla a ho khomarela. Ebang ke liphahlong tse thata, lifiliming tse khabisitsoeng, kapa liphahlong tsa optical, taolo e nepahetseng ea motlakase oa leeme oa substrate ha e fetole feela matla a plasma, empa hape e ntlafatsa ts'ebetso le ts'epo ea lifilimi tse hlahisoang.
Tjhe. 1 Taolo ea Lehlakore la Tekano ke Eng?
Taolo ea motlakase ea leemee bua ka mokhoa oa ho sebelisa matla a fosahetseng ho substrate nakong ea ho kenngoa ha metsi, e leng se etsang hore e be tlase ka motlakase ho feta plasma e potolohileng. Mokhoa ona o sebelisoa haholo lits'ebetsong tsa PVD (Physical Vapor Deposition), haholo-holo ho sputtering ea magnetron, plating ea ion, le litsamaiso tsa ho kenngoa ha arc ea cathodic.
Leeme la substrate le ka sebediswa ka dihlahiswa tsa motlakase tsa DC (Direct Current), MF (Mid-Frequency), kapa RF (Radio Frequency). Karolo ya yona ya mantlha ke ho potlakisa di-ion tse ntle ka hara plasma ho ya bokahodimong ba substrate, ho nolofalletsa ho phatloha ha di-ion tse kgothaletsang dibopeho tse lakatsehang tsa kgolo ya filimi.
Che.2 Kamoo Leeme Voltage e Amang Thepa ea Filimi Kateng
Mokhoa oa motheo oa taolo ea motlakase oa leeme o lutse ho fetoleng kinetics ea kholo ea filimi ka matla a li-ion tse kenang. Tšusumetso ea eona e bonahala likarolong tse 'maloa tsa bohlokoa:
Ho teteana ha matla:
Leeme le nepahetseng le fosahetseng le eketsa matla a kinetic a li-ion tse fihlang substrate, e leng se khothalletsang ho tsamaea ha bokaholimo le ho hlophisoa bocha ha li-adatoms. Sena se lebisa lifiliming tse teteaneng tse nang le khanyetso e ntlafetseng ea mafome, ho thatafala le khanyetso ea ho tsofala.
Taolo ea Khatello ea Kelello:
Ho phatloha ha li-ion ho boetse ho hlahisa khatello e setseng ka har'a filimi. Khethollo e feteletseng e ka baka khatello ea khatello, e ka 'nang ea baka ho petsoha kapa ho arohana. Ka hona, maemo a nepahetseng a khethollo a tlameha ho khethoa ka hloko ho latela thepa ea filimi, mofuta oa substrate le botenya ba ho roala.
Ntlafatso ea Khomarelo:
Motlakase oa leeme o ntlafatsa likamano tsa li-interfacial ka ho khothaletsa ho kopanya li-interlayer kapa ho theha li-interface tse hlophisitsoeng ka maemo, ka hona ho ntlafatsa ho khomarela filimi ho isa ho substrate—haholo-holo ho bohlokoa bakeng sa ho roala ka thata kapa meaho ea li-multilayer.
Ho Hatelloa ha Likaroloana le ho Boreletsa Bokaholimo:
Leeme le loketseng le ka thibela ho kenyelletsoa ha likaroloana tse kholo le ho fokotsa ho teteana ha bokaholimo, ka hona la fokotsa tahlehelo ea ho hasana lifiliming tsa mahlo le ho ntlafatsa boleng ba bokaholimo.
Mefuta ea 3 ea Mekhoa ea Taolo ea Leeme
Leeme la DC: E sebediswa hangata bakeng sa di-substrate tse tsamaisang motlakase, e fanang ka taolo e bonolo le karabelo e potlakileng. E tlwaelehile ho di-coat tse kgabisitsweng le di-coat tse thata.
RF Bias: E loketse di-substrate tse sa tsamaiseng motlakase tse kang khalase, letsopa le di-polymer. E fana ka ho tsamaellana ha thepa ka bophara empa e hloka kopanyo e rarahaneng ya sistimi le tokiso ya tshebetso.
Pulsed Bias: E kenyelletsa ho sebelisa li-pulse tsa periodic bias, ho leka-lekanya sekhahla sa deposition le matla a ion. E loketse hantle bakeng sa ho roala mocheso o tlase kapa li-geometri tse rarahaneng.
Ho phaella moo, ditsamaiso tse ding tse tswetseng pele di sebedisa taolo ya leeme le koetsoeng, e lekolang dibopeho tsa plasma le leeme la hona jwale ka nako ya sebele ho boloka fensetere ya tshebetso e tsitsitseng le ho netefatsa ho tshwana ha leeme ho pholletsa le dihlopha.
—Sengoloa sena se phatlalalitsoe ke lisebelisoa tsa ho roala ka vacuummoetsi oa Zhenhua Vacuum
Nako ea poso: Phupu-17-2025