Vacuum coating inonyanya kusanganisira vacuum vapor deposition, sputtering coating uye ion coating, ese ayo anoshandiswa kuisa akasiyana simbi uye asiri-metal mafirimu pamusoro pezvikamu zvepurasitiki ne distillation kana sputtering pasi pevacuum mamiriro, ayo anogona kuwana yakatetepa kwazvo yekuputira pamusoro neiyo yakasarudzika mukana wekukurumidza adhesion, asi mutengo unoshandiswawo wakakwira simbi, uye mutengo unoshandiswawo wakakwira, uye mutengo unoshandiswawo pamhando dzesimbi. kuvharidzira kunoshanda kwezvigadzirwa zvepamusoro-giredhi.
Vacuum vapor deposition inzira yekudziisa simbi pasi pevhayumu yakakwira, ichiita kuti inyuuke, inyunguduke, uye igadzire firimu resimbi rakatetepa pamusoro pesample mushure mekutonhora, ine ukobvu hwe0.8-1.2 um. Iyo inozadza mudiki concave uye convex zvikamu pamusoro pechigadzirwa chakaumbwa kuti uwane girazi-rakafanana nepamusoro.Kana vacuum vapor deposition inoitwa kana kuwana inofungidzira girazi mhedzisiro kana kuti vacuum vaporize simbi ine yakaderera adhesion, pasi pepamusoro panofanirwa kuvharwa.
Sputtering kazhinji inoreva magnetron sputtering, inova nzira yekumhanyisa yakaderera-tembiricha yekupopota. Iyo nzira inoda vacuum inosvika 1 × 10-3Torr, iyo 1.3 × 10-3Pa vacuum state yakazadzwa neinert gasi argon (Ar), uye pakati pepurasitiki substrate (anode) uye simbi chinangwa (cathode) pamwe nepamusoro-voltage yakananga ikozvino, nekuda kweiyo electron excitation yeinert gasi inogadzirwa nekubuda kweplasma inoputika, kubuda kweplasma inoputika, kubuda kweplasma. yesimbi inotarirwa uye woiisa pane substrate yepurasitiki. Mazhinji eakajairwa simbi machira anoshandisa DC sputtering, nepo zvisiri-conductive ceramic zvinhu zvinoshandisa RF AC sputtering.
Ion coating inzira iyo inoburitsa gasi inoshandiswa kuita ionize gasi kana chinhu chinobuda mumhepo pasi pevacuum mamiriro, uye chinhu chinoputika kana zvinogadzirisa zvinoiswa pane substrate nekubhomba kweiyoni yegasi kana maion echinhu chinoputika. Izvi zvinosanganisira magnetron sputtering ion coating, reactive ion coating, hollow cathode discharge ion coating (hollow cathode vapor deposition method), uye multi-arc ion coating (cathode arc ion coating).
Vertical kaviri-sided magnetron sputtering inopfuurira coating mumutsara
Kushanda kwakakura, kunogona kushandiswa kune zvigadzirwa zvemagetsi senge notebook shell EMI shielding layer, flat products, uye kunyangwe zvese zvigadzirwa zvekapu yemarambi mukati mehumwe hurefu hwekutsanangurwa zvinogona kugadzirwa. Huru hwekurodha huwandu, compact clamping uye kudzika kurovera kweconical mwenje makapu ekuputira-mativi maviri, ayo anogona kuve nehukuru hwekurodha. Hunhu hwakagadzikana, kuenderana kwakanaka kwemufirimu layer kubva pabatch kuenda pabatch. Yakakwira degree re otomatiki uye yakaderera inomhanya mutengo wevashandi.
-Chinyorwa ichi chakaburitswa navacuum coating machine mugadziriGuangdong Zhenhua
Nguva yekutumira: Jan-23-2025