Process and general terms of coating technology for PVD vacuum coating equipment
1.1 Vacuum coating: A method of making a film on a substrate under vacuum.
1.2 Substrate: Film bearer.
1.3 Testing substrate: A substrate used for measurement and/or testing at the beginning, during or after the coating.
1.4 coating material: the raw material used to make the film.
1.5 evaporation material evaporation material: the coating material used to evaporate in vacuum evaporation.
1.6 sputtering material: there are coating materials used for sputtering in vacuum sputtering.
1.7 Film material (film material) film material: the material that composes the film.
1.8 evaporation rate: in a given time interval, the amount of material evaporated, divided by the time interval
1.9 Sputtering rate: In a given time interval, the amount of material sputtered, divided by the time interval.
1.10 Deposition rate: In a given time interval, the amount of material deposited on the substrate, divided by the time interval and the surface area of the substrate.
1.11 Coating angle: The angle between the direction of particles incident on the substrate and the normal of the coated surface.
2.1 Vacuum evaporation coating: the process of vacuum coating to evaporate the coating material.
2.1.1 Simultaneous evaporation: vacuum evaporation in which several evaporators are used to evaporate various evaporation materials onto the substrate at the same time.
2.1.2 Evaporation fiedevaporation: vacuum evaporation in which materials evaporated at the same time from the evaporation field are deposited on the substrate (this process is applied to large-area evaporation to obtain the ideal film thickness distribution).
2.1.3 Reactive vacuum evaporation: Reactive vacuum evaporation: the vacuum evaporation of the film material that obtains the ideal chemical composition by reacting with gas.
2.1.4 reactive vacuum evaporation in evaporator: reactive vacuum evaporation in evaporator: reacts with various evaporation materials in the evaporator to obtain the vacuum evaporation of the ideal chemical composition film material.
2.1.5 Direct heating evaporation: The heat necessary for the evaporation of the evaporation material is the evaporation of the evaporation material (in the crucible or without the crucible) itself.
2.1.6 Induction heating evaporation: the evaporation of the evaporation material heated by the induction eddy current.
2.1.7 electron beam evaporation electron beame vaporation: the evaporation of heating the evaporation material by electron bombardment.
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