Process and general terms of coating technology for PVD vacuum coating equipment

    1.1 Vacuum coating: A method of making a film on a substrate under vacuum.

    1.2 Substrate: Film bearer.

    1.3 Testing substrate: A substrate used for measurement and/or testing at the beginning, during or after the coating.

    1.4 coating material: the raw material used to make the film.

    1.5 evaporation material evaporation material: the coating material used to evaporate in vacuum evaporation.

    1.6 sputtering material: there are coating materials used for sputtering in vacuum sputtering.

    1.7 Film material (film material) film material: the material that composes the film.

    1.8 evaporation rate: in a given time interval, the amount of material evaporated, divided by the time interval

    1.9 Sputtering rate: In a given time interval, the amount of material sputtered, divided by the time interval.

    1.10 Deposition rate: In a given time interval, the amount of material deposited on the substrate, divided by the time interval and the surface area of the substrate.

    1.11 Coating angle: The angle between the direction of particles incident on the substrate and the normal of the coated surface.

    2 craft

    2.1 Vacuum evaporation coating: the process of vacuum coating to evaporate the coating material.

    2.1.1 Simultaneous evaporation: vacuum evaporation in which several evaporators are used to evaporate various evaporation materials onto the substrate at the same time.

    2.1.2 Evaporation fiedevaporation: vacuum evaporation in which materials evaporated at the same time from the evaporation field are deposited on the substrate (this process is applied to large-area evaporation to obtain the ideal film thickness distribution).

    2.1.3 Reactive vacuum evaporation: Reactive vacuum evaporation: the vacuum evaporation of the film material that obtains the ideal chemical composition by reacting with gas.

    2.1.4 reactive vacuum evaporation in evaporator: reactive vacuum evaporation in evaporator: reacts with various evaporation materials in the evaporator to obtain the vacuum evaporation of the ideal chemical composition film material.

    2.1.5 Direct heating evaporation: The heat necessary for the evaporation of the evaporation material is the evaporation of the evaporation material (in the crucible or without the crucible) itself.

    2.1.6 Induction heating evaporation: the evaporation of the evaporation material heated by the induction eddy current.

    2.1.7 electron beam evaporation electron beame vaporation: the evaporation of heating the evaporation material by electron bombardment.