multi-arc ion sputtering coating machine
Multi arc spraying coating machine has the advantages of fast deposition speed, high ionization rate, high ion energy, good film binding force, simple equipment operation, low operation cost and high production efficiency. The hard coating with micron thickness can effectively protect the appearance of the product to be plated. Low temperature coating process can achieve deposition on a variety of materials, and a variety of combinations of coating process can produce more colors.
Introduction of vacuum coating machine:
The vacuum coating machine needs to be coated as a substrate and the plated material as a target. The substrate is in the vacuum chamber with the target. Vacuum coating machine mainly refers to a type of coating that needs to be performed under a higher vacuum degree. The main idea is to divide into two types: evaporation and sputtering. Evaporation coating generally heats the target material to evaporate surface components in the form of atomic groups or ions, and settles on the surface of the substrate to form a thin film through a film formation process.
For sputtering coatings, it can be simply understood as the use of electrons or high-energy lasers to bombard the target and cause the surface components to be sputtered in the form of atomic groups or ions, and finally deposited on the substrate surface, undergoing the film-forming process, and finally forming a thin film .
PVD is the abbreviation of English Physical Vapor Deposition (Physical Vapor Deposition), which refers to the use of low-voltage, high-current arc discharge technology under vacuum conditions, using gas discharge to evaporate the target and ionize both the vaporized substance and the gas. Utilizing the acceleration of the electric field, the evaporated substance and its reaction products are deposited on the workpiece.
multi arc magnetron sputtering coating machine/PVD Vacuum coating machine/multi arc magnetron sputtering coating machine/PVD Vacuum coating machine
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