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Introduction of Coating Technology of Vacuum Evaporation Coating Equipment

Introduction of Coating Technology of Vacuum Evaporation Coating Equipment


Introduction of Coating Technology of Vacuum Evaporation Coating Equipment

Vacuum evaporation coating technology includes resistance evaporation coating, electron beam evaporation coating, laser beam evaporation coating, high frequency induction heating evaporation coating, etc. The following table lists the characteristics of several evaporation coating technologies.

1. Resistance evaporation plating: The resistance evaporation source is used to evaporate low melting point materials, such as gold, silver, zinc sulfide, magnesium fluoride, chromium trioxide, etc. The resistance evaporation source is generally made of tungsten, molybdenum, and tantalum.

2. Electron beam evaporation coating: the use of electron beam heating to vaporize and evaporate the film material, and then condense on the surface of the substrate to form a film is an important heating method in vacuum evaporation technology. There are many types of such devices. With the wide application of thin-film technology, not only is there a wide variety of requirements for membrane types, but also the quality requirements for membranes are more stringent. Resistance evaporation can no longer meet the needs of evaporation of certain metals and non-metals. The electron beam heat source can obtain a much larger energy density than the resistance heat source, and the value can reach 104-109w/cm2, so the film can be heated to 3000-6000c. This provides a better heat source for evaporating refractory metals and non-metal materials such as tungsten, molybdenum, germanium, SiO2, AI2O3, etc. Moreover, because the vapor-deposited material is placed in a water-cooled crucible, the evaporation of the container material and the reaction between the container material and the film material can be avoided, which is extremely important for improving the purity of the film. In addition, heat can be directly added to the surface of the membrane material, so the heat efficiency is high, and the heat conduction and heat radiation losses are small.

3. High frequency induction heating evaporation plating: use the principle of induction heating to heat the metal to the evaporation temperature. Place the crucible containing the film material in the center of the spiral coil (non-contact), and pass a high-frequency current through the coil, which can make the metal film material generate current and heat itself up until it evaporates.

The characteristics of induction heating evaporation source: 1) High evaporation rate 2) The temperature of the evaporation source is uniform and stable, and it is not easy to produce aluminum drop splashing. 3) The evaporation source is charged at one time, no wire feeding mechanism is needed, temperature control is relatively easy, and the operation is simple 4) Filming The material purity requirements are slightly wider.

4. Arc heating evaporation plating: a heating method similar to the electron beam heating method is the arc discharge heating method. It also has the characteristics of avoiding the pollution of resistance heating materials or crucible materials, and the heating temperature is high. It is especially suitable for the evaporation of refractory metals, graphite, etc., which have a high melting point and a certain degree of conductivity. At the same time, the equipment used in this method is simpler than the electron beam heating device, so it is a relatively inexpensive evaporation device.

5. Laser beam evaporation: the method of using high-power density pulsed laser to evaporate the material to form a thin film, generally called laser evaporation.

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