A maara teknụzụ mkpuchi uzuoku nke ọma maka ịdị mma gburugburu ebe obibi ya, arụmọrụ dị elu, ịdị mma nke ihe nkiri ahụ, na njupụta ihe nkiri dị elu. N'ọrụ ụlọ ọrụ mmepụta ihe, a na-ekewa ngwa mkpuchi uzuoku n'ime ụdị abụọ bụ isi: Nwepụ Uzuoku Ahụ (PVD) na Nwepụ Uzuoku Kemịkalụ (CVD).
Sistemụ Nkwanye Uzuoku Anụ Ahụ (PVD) gụnyere evaporation, sputtering, na ion plating. Sistemụ mkpuchi evaporation na-eji ụzọ dị iche iche esi ekpo ọkụ eme ihe mkpuchi, dị ka eguzogide evaporation kpo oku, electron beam evaporation (E-beam), induction heating evaporation, na arc evaporation. N'aka nke ọzọ, sistemụ mkpuchi sputtering na-adabere na ejection atọm ebumnuche nke plasma kpatara ma gụnye sputtering kpọmkwem (DC), sputtering redio frequency (RF), magnetron sputtering, na reactive sputtering usoro. Sistemụ mkpuchi ion na-ejikọta plasma na evaporation ma ọ bụ usoro sputtering iji mee ka njikọta na njupụta nke fim dịkwuo mma, yana teknụzụ ndị a na-ahụkarị gụnyere cathodic arc ion plating, magnetron sputtering ion plating, na hollow cathode ion plating.
Sistemụ mwepụta ikuku kemịkalụ (CVD) gụnyere mmeghachi omume kemịkalụ nke ihe ndị na-ebute gas iji mepụta ihe nkiri siri ike na elu ala. Teknụzụ CVD ndị a na-ahụkarị gụnyere Nchekwa ikuku nke nrụgide kemịkalụ ikuku (APCVD), Nchekwa ikuku kemịkalụ dị ala (LPCVD), Nchekwa ikuku kemịkalụ emelitere nke Plasma (PECVD), Nchekwa ikuku kemịkalụ metal-Organic (MOCVD), na Nchekwa oyi akwa Atomic (ALD), nke ọ bụla dabara na sistemụ ihe na ihe achọrọ maka usoro dị iche iche.
A na-eji teknụzụ mkpuchi uzuoku eme ihe nke ukwuu n'ọtụtụ ụlọ ọrụ dị iche iche, gụnyere mmepụta ụgbọala, ngwa eletrọniki na ngwa eletrọniki ndị ahịa (dịka ekwentị mkpanaaka), ihe ndị na-emepụta semiconductor, ngwa ụlọ, ngwa ịsa ahụ, ngwaahịa kemịkalụ kwa ụbọchị, ihe eji achọ mma, na ihe nkiri na-agbanwe agbanwe.
-E bipụtara akụkọ a site n'aka onye bipụtara yaonye nrụpụta akụrụngwa mkpuchi ikukuZhenhua Vacuum
Oge ozi: Eprel-02-2026