CVD thev naus laus zis yog ua raws cov tshuaj tiv thaiv. Cov tshuaj tiv thaiv uas cov reactants nyob rau hauv lub xeev gaseous thiab ib qho ntawm cov khoom yog nyob rau hauv cov khoom yog feem ntau hu ua CVD cov tshuaj tiv thaiv, yog li nws cov tshuaj tiv thaiv kab mob yuav tsum ua kom tiav peb yam hauv qab no.
(1) Thaum qhov kub ntawm qhov tso tawm, cov reactants yuav tsum muaj lub siab txaus vapor siab. Yog hais tias cov reactants yog tag nrho cov gaseous nyob rau hauv chav tsev kub, lub deposition ntaus ntawv yog qhov yooj yim, yog hais tias cov reactants yog volatile nyob rau hauv chav tsev kub yog heev me me, nws yuav tsum tau rhuab kom nws volatile, thiab tej zaum yuav tsum tau siv cov cab kuj gas coj nws mus rau cov tshuaj tiv thaiv chamber.
(2) Ntawm cov khoom siv tshuaj tiv thaiv, tag nrho cov tshuaj yuav tsum nyob rau hauv lub xeev gaseous tshwj tsis yog rau qhov xav tau tso nyiaj, uas yog nyob rau hauv lub xeev cov khoom.
(3) Lub vapor siab ntawm cov zaj duab xis deposited yuav tsum tsawg txaus kom ntseeg tau tias cov deposited zaj duab xis yog nrees txuas mus rau ib tug substrate muaj ib tug tej yam deposition kub thaum lub sij hawm deposition cov tshuaj tiv thaiv. Lub vapor siab ntawm cov khoom siv substrate ntawm qhov ntsuas kub ntawm qhov tso tawm kuj yuav tsum qis txaus.
Cov deposition reactants tau muab faib ua peb lub ntsiab hauv qab no.
(1) Gaseous xeev. Cov ntaub ntawv uas yog gaseous ntawm chav tsev kub, xws li methane, carbon dioxide, ammonia, chlorine, thiab lwm yam, uas yog feem ntau conducive rau chemical vapor deposition, thiab rau cov flow rate yog yooj yim tswj.
(2) Ua kua. Qee cov tshuaj tiv thaiv nyob rau hauv chav tsev kub lossis kub me ntsis, muaj lub siab vapor siab, xws li TiCI4, SiCl4, CH3SiCl3, thiab lwm yam, tuaj yeem siv los nqa cov pa roj (xws li H2, N2, Ar) ntws los ntawm cov kua los yog cov kua hauv cov npuas, thiab tom qab ntawd nqa cov vapors saturated ntawm cov khoom mus rau hauv lub studio.
(3) Lub xeev muaj zog. Thaum tsis muaj qhov tsim nyog gaseous lossis kua qhov chaw, tsuas yog cov khoom siv hauv lub xeev tuaj yeem siv tau. Qee lub ntsiab lus los yog lawv cov tebchaw hauv ntau pua degrees muaj qhov muaj zog vapor siab, xws li TaCl5, Nbcl5, ZrCl4, thiab lwm yam, tuaj yeem nqa mus rau hauv lub studio siv cov roj nqa khoom tso rau hauv txheej zaj duab xis.
Cov xwm txheej ntau dua los ntawm qee cov pa roj thiab cov khoom siv roj-khoom siv los yog roj-kua cov tshuaj tiv thaiv, tsim cov khoom tsim nyog gaseous mus rau studio xa khoom. Piv txwv li, HCl roj thiab hlau Ga react tsim gaseous tivthaiv GaCl, uas yog thauj mus rau lub studio nyob rau hauv daim ntawv ntawm GaCl.
– Zaj lus no yog tso tawm los ntawmtshuab nqus tsev txheej tshuab manufacturersGuangdong Zhenhua
Post lub sij hawm: Nov-16-2023