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High-tech vacuum plasma cleaning machine design

High-tech vacuum plasma cleaning machine design

2020-02-07

The small size coating machine for vacuum coating in research, education, electric component and paint production.

Advantage: Small size with beautiful appearance, compact conformation, multi-function, easy to operate and low power consumption. Can be selectived between  manual, half-automatic and fully automatic. Multiple size is avaliable.

Plasma is a type of ionized gas which positive ion and electron density roughly equal.Consist of ions, electrons, free radicals, and neutral particles.Belonging to the fourth state of matter.Because the plasma is combination which has a higher energy than gas,when in Plasma Environment matter can gain much more physical and chemical characteristics. Plasma cleaning equipment operating principle is depend on the "activization" of matter whcin in "plasma state" to remove the stains of production surface.Judging from present various types of cleaning method,plasma cleaning is the most thorough ablative way of all cleaning ways.Equipment can widely applied to semiconductor,microelectronics,front COG,LCD,LCM and LED processing, precision cleaning before device package,vacuum electron,connector,electric relay and the solar PV industry etc.Also applied to the field of surface cleaning of plastic,rubber,metal and ceramics,etching process,ashing process,surface activation and Life Science Experiment etc.


Remark:The chamber size can be designed by customers' product and special process request.



Non-uniform film thickness of vacuum plating equipment

If the film thickness at this location of the vacuum plating equipment is not absolutely uniform, then the substrate far from the center cannot obtain a uniform thickness. Although the shield can eliminate the long-term non-uniformity, some changes in film thickness are caused by the instability of the evaporation source or the different performance of the film material, so it is almost impossible to eliminate, but the structure of the vacuum chamber The proper choice of evaporation source can minimize these effects.

In the past few years, more and more users have requested coating system manufacturers to provide high-performance, small-sized, simple optical coating systems. At the same time, users have not only reduced the performance requirements, but have improved them, especially in thin films Density and guaranteed minimum spectral changes after absorbing water.

At present, the average size of the system has been reduced, and the application of small-sized equipment for the production of optical coatings has also turned into a pure technical problem. Therefore, the key to choosing a modern optical coating system depends on careful consideration of the expected performance of the coated product, the size and physical characteristics of the substrate, and all the technical factors necessary to ensure a highly consistent process.

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