Nā ʻano Plasma ma ka Cathodic Arc Deposition

He Loiloi ʻenehana mai nā Manaʻo o ke Kaʻina Hana a me nā Lako Hana

Ka waiho ʻana o ke arc CathodicUa ʻike nui ʻia ʻo n he ʻenehana PVD kiʻekiʻe-ionization i hiki ke hana i nā uhi paʻa, paʻa loa, a paʻakikī loa.
Ma ke kikowaena o kēia kaʻina hana aia ka plasma kū hoʻokahi i hana ʻia e nā hoʻokuʻu arc cathodic, nona nā ʻano e hoʻokaʻawale maoli iā ia mai ka magnetron sputtering a me nā ʻano hana PVD ʻē aʻe.

He mea nui ka hoʻomaopopo ʻana i ke ʻano o ka plasma i loko o nā ʻōnaehana arc cathodic no ka kaohi ʻana i ka ʻano o ka uhi ʻana, ka hana, a me ke kūpaʻa o ke kaʻina hana no ka wā lōʻihi.

1. Kumu o ka Plasma Arc Cathodic

I ka waiho ʻana o ke arc cathodic, hoʻopuka ʻia ka plasma ma nā wahi cathode microscopic i hoʻokumu ʻia ma luna o ka ʻili i manaʻo ʻia ke hoʻomaka ʻia kahi hoʻokuʻu arc kiʻekiʻe-aupuni, haʻahaʻa-voltage.

ʻO nā hiʻohiʻona koʻikoʻi o nā kiko cathode:

1. Ka nui o ke au kūloko kiʻekiʻe loa (10⁶–10⁸ A/cm²)

2. ʻO ka mahana kūloko kiʻekiʻe loa

3. Ka mahu pahū wikiwiki o ka mea cathode

Hoʻopuka kēia kaʻina hana i kahi plasma i haku nui ʻia me ka mea i hoʻopili ʻia ionized, ma mua o nā ʻātoma kūlike ʻole.

2. Kekelē Ionization Kiʻekiʻe: He ʻano wehewehe

ʻO kekahi o nā hiʻohiʻona koʻikoʻi o ka plasma arc cathodic ʻo kona ʻāpana ionization kiʻekiʻe loa.

Hiki i nā helu ionization o nā ʻano metala ke ʻoi aku ma mua o 70-90% a he hapa nui o nā ions i hoʻopiʻi nui ʻia (M²⁺, M³⁺).

ʻO kēia pae ionization kiʻekiʻe e hiki ai:

1. Nā pilina ikaika o ka ion-substrate

2. Hoʻonui ʻia ka hoʻonui ʻana o ka ʻiliʻili

3. Hoʻopili maikaʻi loa i ka uhi ʻana ʻoiai ma nā mahana substrate haʻahaʻa

Mai kahi kuanaʻike ʻenekinia, hāʻawi ka ionization kiʻekiʻe i kahi puka makani kaʻina hana ākea a paʻa, ʻoi aku hoʻi no nā uhi paʻakikī a pale.

3. Ka Ikehu Ion Kiʻekiʻe a me ke Kuhikuhi ʻana

Hōʻike ka plasma arc Cathodic i ka ikehu ion intrinsic kiʻekiʻe, maʻamau mai nā ʻumi he nui a ʻoi aku ma mua o hoʻokahi haneli electron volts.

ʻO nā hopena o kēia plasma ikaika e komo pū ana:

1. Hoʻoulu a hoʻomaʻemaʻe pono i ka ʻili

2. Hoʻonui ʻia ka neʻe ʻana o ka adatom ma luna o ka substrate

3. Hoʻokumu ʻia ʻana o nā ʻano kiʻiʻoniʻoni paʻa, maikaʻi a amorphous paha

Ke hui pū ʻia me ka substrate biasing, hiki ke hoʻopilikino pono ʻia ka ikehu ion i ke kaulike:

1. Hoʻonui ʻia ke kiʻiʻoniʻoni

2. Ka hoʻomalu ʻana i ke koʻikoʻi koena

3. Hoʻopili ʻana i ka uhi

ʻO kēia kaohi ʻana kahi pono nui o nā ʻōnaehana arc cathodic i nā noi ʻoihana.

4. Nā ʻano o ka nui o ka plasma a me ka halihali

Ke hoʻohālikelike ʻia me nā plasma PVD ʻē aʻe, hōʻike ka plasma arc cathodic:

1. Kiʻekiʻe loa ka nui o ka plasma

2. Ka hoʻonui ʻana o ka plasma ikaika i hoʻokele ponoʻī ʻia mai ka wahi cathode

Hoʻopili ʻia ka halihali plasma e: ke au Arc; nā kahua hoʻokele magnetic; ke ʻano o ke keʻena;

ʻO ke alakaʻi plasma kūpono e hōʻoiaʻiʻo ana: ʻO ka mānoanoa o ka uhi like; Nā helu waiho paʻa; Nā waiwai uhi kūlike ma nā ʻāpana

5. Nā Macroparticles: He pilikia Plasma kūlohelohe

ʻO kahi hiʻohiʻona kūikawā o ka plasma arc cathodic ka hana like ʻana o nā macroparticles (droplets).

Hoʻomaka kēia mau ʻāpana heheʻe a paʻa paha mai: Ka hoʻokuʻu ʻana o nā mea pahū ma nā wahi cathode; Hiki i nā Macroparticles ke hoʻopilikia maikaʻi ʻole:; ʻO ka ʻili; ʻAno Optical; Hana Tribological

No ka hoʻoponopono ʻana i kēia, hoʻohui pinepine nā ʻōnaehana ʻoihana:

Nā ʻōnaehana plasma arc kānana magnetic a i ʻole duct-type

Nā ʻano hana hoʻokele wahi cathode i hoʻomaikaʻi ʻia

ʻO ka ʻenehana arc kānana e ʻae i ka mālama ʻana i nā pono ionization kiʻekiʻe me ka hoʻemi nui ʻana i ka haumia o nā ʻāpana.

–Ua paʻi ʻia kēia ʻatikala enā lako hana uhi vacuummea hana Zhenhua Vacuum