Hoʻomaka i ka waiho ʻana o ka mahu, ka sputtering a me ka uhi ʻana i ka ion

ʻO ka uhi ʻana i ka vacuum ka nui o ka deposition vacuum vapor, sputtering coating a me ka ion coating, ua hoʻohana ʻia ia mau mea āpau e waiho ai i nā ʻano metala a me nā kiʻi ʻoniʻoni ʻole ma luna o ka ʻili o nā ʻāpana plastik e ka distillation a i ʻole ka sputtering ma lalo o nā kūlana vacuum, hiki ke loaʻa i kahi uhi ʻili lahilahi me ka maikaʻi maikaʻi o ka hoʻopili wikiwiki ʻana, akā ʻoi aku ka kiʻekiʻe o ke kumukūʻai, a hiki ke hoʻohana ʻia nā ʻano o ka metala. nā huahana kiʻekiʻe.
ʻO ka hoʻoheheʻe ʻana i ka mahu he ʻano e hoʻomehana ai i ka metala ma lalo o ka ʻūhā kiʻekiʻe, e hoʻoheheʻe, evaporate, a hana i kahi kiʻiʻoniʻoni metala lahilahi ma ka ʻili o ka hāpana ma hope o ka hoʻoluʻu ʻana, me ka mānoanoa o 0.8-1.2 um. Hoʻopiha ia i ka concave liʻiliʻi a me nā ʻāpana convex ma luna o ka ʻili o ka huahana i hoʻokumu ʻia e loaʻa i kahi aniani-like surface.When vacuum vapor deposition i hana ʻia e loaʻa ai ka hopena reflective aniani a i ʻole e hoʻoheheʻe i kahi kila me ka haʻahaʻa adhesion, pono e uhi ʻia ka lalo.

ʻO ka sputtering ka mea maʻamau i ka magnetron sputtering, ʻo ia ke ʻano o ka sputtering haʻahaʻa haʻahaʻa kiʻekiʻe. Pono ke kaʻina hana i kahi ʻūhā ma kahi o 1 × 10-3Torr, ʻo ia ka 1.3 × 10-3Pa vacuum state i hoʻopiha ʻia me ka inert gas argon (Ar), a ma waena o ka substrate plastic (anode) a me ka pahu metala (cathode) me ke kiʻekiʻe-voltage pololei o kēia manawa, ma muli o ka hoʻoulu electron o ke kinoea inert i hoʻokumu ʻia e ka hoʻokuʻu ʻana o ka plasma, ka mea i hoʻokuʻu ʻia i waho o ka plasma. iā lākou ma luna o ka substrate plastic. Hoʻohana ka hapa nui o nā pale metala maʻamau i ka sputtering DC, aʻo nā mea seramika non-conductive e hoʻohana i ka RF AC sputtering.

ʻO ka uhi ʻana o ka Ion he ʻano ia e hoʻohana ʻia ai ka hoʻokuʻu kinoea e hoʻokaʻawale i ke kinoea a i ʻole ka mea i hoʻoheheʻe ʻia ma lalo o nā kūlana ʻawaʻawa, a waiho ʻia ka mea i hoʻoheheʻe ʻia a i ʻole nā ​​​​mea hoʻoheheʻe ʻia ma luna o ka substrate ma o ka hoʻopā ʻana i nā ion kinoea a i ʻole nā ​​​​iona o ka mea i hoʻoheheʻe ʻia. Hoʻopili ʻia kēia mau mea me ka uhi ʻana o ka ion magnetron sputtering, ka uhi ion reactive, ka hollow cathode discharge ion coating (hollow cathode vapor deposition method), a me ka multi-arc ion coating (cathode arc ion coating).

ʻO ka magnetron ʻaoʻao ʻelua ʻaoʻao kū i ka uhi mau ʻana i ka laina
Hiki ke hoʻohana ʻia no nā huahana uila e like me ka puʻupuʻu puʻupuʻu EMI pale pale, nā huahana pālahalaha, a hiki ke hana ʻia nā huahana kīʻaha kukui āpau i loko o kahi kikoʻī kiʻekiʻe. Hiki ke hoʻouka nui, hoʻopaʻa paʻa a me ka hoʻopaʻa ʻana i nā kīʻaha māmā conical no ka uhi ʻaoʻao ʻelua, hiki ke loaʻa ka mana hoʻouka nui. ʻO ka maikaʻi paʻa, ke kūlike maikaʻi o ka papa kiʻiʻoniʻoni mai ka puʻupuʻu a i ka pūʻulu. ʻO ke kūlana kiʻekiʻe o ka automation a me ka uku hana haʻahaʻa.

-Ua hoʻokuʻu ʻia kēia ʻatikala emea hana mīkini hoʻopaʻa haʻahaʻaGuangdong Zhenhua