A fannin injiniyan saman zamani, Tsarin Fiziki na Tururi (PVD) ya fito a matsayin fasahar rufewa ta injin saboda kyawun aikin fim ɗinsa da kuma halayensa masu kyau ga muhalli. Wannan labarin yana ba da cikakken nazari kan ƙa'idodi, rarrabuwa, da aikace-aikacen da aka saba amfani da su na fasahar PVD, yana ba da fahimtar fasaha ga ƙwararru a fannin.
Ma'auni na 1 na Ka'idojin Fasaha ta PVD
PVD tsari ne da ake gudanarwa a ƙarƙashin yanayin injin daskarewa (yawanci ≤10⁻³ Pa), inda ake tururi da kayan shafa a jiki sannan a naɗe su a saman substrate don samar da fim mai kauri. Wannan dabarar tana da siffa ta:
Ƙananan zafin ajiya (galibi <500°C)
Tsarkakken fim mai girma da kuma abun da za a iya sarrafawa
Yana da kyau ga muhalli (babu fitar da ruwan shara)
Daidaita daidaiton matakin nanometer
Nau'i na 2 naKayan aikin PVDtTsarin aiki
1. Rufin Tururin Injin
Ƙafewar injin tsotsar ruwa ya ƙunshi dumama kayan shafa har sai ya kai matsin tururin da ya cika ya kuma ƙafe. Nau'ikan da aka fi sani sun haɗa da:
Tururin Dumama Mai Juriya
Yana amfani da ƙarfe masu hana narkewa kamar tungsten ko molybdenum a matsayin abubuwan dumama. Ya dace da kayan da ba su da narkewa kamar aluminum (Al) da azurfa (Ag).
Tururin Ƙarfin Hasken Electron (EB-PVD)
Yana amfani da bindigar electron (10-30 kV) don jefa bam a kan kayan da aka nufa, yana samar da yanayin zafi na gida sama da 3000°C. Ya dace da iskar oxygen mai yawan narkewa.
Kwayoyin Halittar Epitaxy (MBE)
Wata dabara mai inganci da aka yi a ƙarƙashin injin tsabtace iska mai ƙarfi (≤10⁻⁸ Pa), wadda ke ba da damar sarrafa matakin atomic don haɓakar fim ɗin epitaxial.
2. Tsarin Bayar da Shawara
Bututun ya ƙunshi barbashi masu ƙarfi da yawa suna jefa bama-bamai a kan wani abu da aka nufa, suna fitar da ƙwayoyin zarra da ke taruwa a kan abin da aka makala. Manyan nau'ikan bututun sun haɗa da:
DC Sputtering (Kai tsaye na yanzu)
Hanyar sputtering ta asali; dole ne abin da aka nufa ya kasance mai amfani da wutar lantarki.
RF Sputtering (Mitar Rediyo)
Yana aiki a 13.56 MHz, yana ba da damar yin amfani da kayan rufewa.
Magnetron Sputtering
Nau'in Daidaitacce: Ƙarfin filin maganadisu na Gauss 100-300 a saman da aka nufa
Nau'in Rashin Daidaituwa: Ingantaccen yaduwar jini don ingantaccen adanawa
Cathode na Twin Mai Tsakiya: Yana magance matsalar "guba mai manufa" a cikin sputtering mai amsawa
Babban ƙarfin Magnetron Sputtering (HIPIMS): Yawan ionization ya fi kashi 90%, yana samar da fina-finai masu yawa, waɗanda ba su da ginshiƙi
No.3 Amfanin Fasahar PVD Na Yau Da Kullum
Rufin Kayan Aiki
Rufin da ke da tauri kamar TiN, TiAlN (taurin > 3000 HV)
Yadu amfani da kayan aikin yankan da kuma kayan haɓaka surface na mold
Rufin Ado
Kammalawa masu kama da zinare ta amfani da ZrN, TiZrN
An yi amfani da shi ga firam ɗin wayar hannu, kayan wanka, da kayayyakin amfani
Fina-finan Aiki Masu Sanyi
Fina-finan ITO (Indium Tin Oxide) masu haske waɗanda ke da juriya ga takardar <10 Ω/□
Rufin kariya daga haske mai haske tare da watsa haske mai gani >99%
Marufi na Semiconductor
Ƙarfe-ƙarfe matakin wafer (haɗin Al, Cu)
Takardar kariya ta amfani da TaN, TiN don juriya ga yaɗuwa
-An fitar da wannan labarin ne daga hannuninjin shafa injin injin Zhenhua injin tsabtace iska.
Lokacin Saƙo: Yuni-18-2025