A cikin fasahar zamani ta shafa fenti, sarrafa ƙarfin lantarki na bias muhimmin siga ne wanda ke tasiri kai tsaye kan tsarin fim mai siriri, yawan yawa, damuwa ta ciki, da ƙarfin mannewa. Ko a cikin murfin tauri, fina-finan ado, ko murfin gani, sarrafa ƙarfin lantarki na substrate bias ba wai kawai yana daidaita yanayin plasma ba, har ma yana haɓaka aiki da amincin fina-finan da aka samu.
A'a.1 Menene Tsarin Kula da Ƙarfin Wutar Lantarki?
Tsarin sarrafa ƙarfin lantarki na son raiyana nufin dabarar amfani da mummunan ƙarfin abu ga substrate yayin adanawa, wanda hakan ke sa shi ƙasa da plasma da ke kewaye da shi ta hanyar lantarki. Ana amfani da wannan dabarar sosai a cikin hanyoyin PVD (Physical Vapor Deposition), musamman a cikin tsarin magnetron sputtering, ion plating, da tsarin cathodic arc deposition.
Ana iya amfani da bambancin substrate ta hanyar samar da wutar lantarki ta DC (Direct Current), MF (Mid-Frequency), ko RF (Radio Frequency). Babban aikinsa shine hanzarta ions masu kyau a cikin jini zuwa saman substrate, wanda ke ba da damar fashewar ions wanda ke haɓaka halayen haɓakar fim mai kyau.
A'a.2 Yadda Ƙarfin Wutar Lantarki Mai Son Kai Ke Shafar Sifofin Fim
Babban hanyar sarrafa ƙarfin lantarki na bias yana cikin gyaggyara motsin haɓakar fim ta hanyar kuzarin ions masu shigowa. Tasirinsa yana bayyana a cikin manyan fannoni da dama:
Yawan yawa:
Rashin son zuciya mai kyau yana ƙara kuzarin motsi na ions da ke isa ga substrate, yana haɓaka motsi na saman da sake tsara adatoms. Wannan yana haifar da fina-finai masu yawa tare da ingantaccen juriya ga tsatsa, tauri, da juriyar lalacewa.
Dokar Damuwa:
Bombardment na ion kuma yana haifar da damuwa a cikin fim ɗin. Son zuciya fiye da kima na iya haifar da damuwa mai ƙarfi, wanda zai iya haifar da tsagewa ko wargajewa. Saboda haka, dole ne a zaɓi matakan son zuciya mafi kyau bisa ga kayan fim, nau'in substrate, da kauri na shafi.
Inganta Mannewa:
Ƙarfin bias yana haɓaka hulɗar fuska ta hanyar haɓaka haɗakar layuka ko ƙirƙirar hanyoyin haɗin kai masu inganci, ta haka yana inganta mannewa tsakanin layuka da layuka - musamman mahimmin mahimmanci ga rufin tauri ko tsarin layuka da yawa.
Matse Barbashi da kuma daidaita saman:
Daidaiton son zuciya zai iya danne haɗakar ƙwayoyin macro da rage tsatsauran saman, ta haka ne zai rage asarar warwatsewa a cikin fina-finan gani da kuma inganta ingancin saman.
Nau'in Hanyoyin Kula da Son Zuciya Na 3
DC Bias: Ana amfani da shi sosai don substrates masu sarrafawa, yana ba da sauƙin sarrafawa da amsawa cikin sauri. Yawanci a cikin fenti na ado da rufin tauri.
RF Bias: Ya dace da substrates marasa aiki kamar gilashi, yumbu, da polymers. Yana ba da jituwa mai faɗi da kayan aiki amma yana buƙatar haɗin tsarin da daidaitawar tsari mai zurfi.
Bias ɗin da aka zuga: Ya ƙunshi amfani da bugun zuciya na lokaci-lokaci, daidaita ƙimar ajiyar abu da kuzarin ion. Ya dace da murfin zafi mai ƙarancin zafi ko yanayin ƙasa mai rikitarwa.
Bugu da ƙari, wasu tsare-tsare masu ci gaba suna amfani da ikon sarrafa bias na rufewa, wanda ke sa ido kan halayen plasma da kuma bias current a ainihin lokaci don kiyaye tagar tsari mai karko da kuma tabbatar da daidaiton shafi a cikin rukuni-rukuni.
—An buga wannan labarin ne ta hannun kayan aikin shafa injinmasana'anta Zhenhua injin injin
Lokacin Saƙo: Yuli-17-2025