Chinese stable DLC hard coating machine design
·Achieve Sapphire 9H hardness levels
·With antireflection function, single side coated AR,T≥95 %
·Pass the Steel Wool Friction Test
·Super high durability for AF/AS antifouling and waterproof effect
Vacuum coating technology is generally divided into two categories: physical vapor deposition (PVD) and chemical vapor deposition (CVD).
Physical vapor deposition (PVD) technology refers to the method of directly depositing the plating material on the surface of the substrate by using various physical methods to vaporize the material into atoms, molecules or dissociate it into ions under vacuum. Most of the hard reaction films are prepared by physical vapor deposition, which uses some physical processes, such as the thermal evaporation of materials, or the sputtering of atoms on the surface of materials when bombarded by ions, to realize the controllable transfer process of material atoms from the source materials to the films. Physical vapor deposition technology has many advantages, such as good film / substrate bonding force, uniform and dense film, good film thickness controllability, wide application target, wide sputtering range, thick film deposition, alloy film with stable composition and good repeatability. At the same time, the physical vapor deposition technology can be used as the final treatment process for high-speed steel and cemented carbide thin film cutters because its processing temperature can be controlled below 500 ℃. As the physical vapor deposition technology can greatly improve the cutting performance of the cutting tools, people are competing to develop high-performance and high reliability equipment, but also to expand its application field, especially in the high-speed steel, cemented carbide and ceramic cutting tools.
Chemical vapor deposition (CVD) is a method to produce metal or compound films on the substrate by supplying the elemental gases or compounds which make up the film elements to the substrate. It mainly includes atmospheric pressure CVD, low pressure CVD and plasma CVD.
Compared with wet coating technology, vacuum coating technology has the following advantages:
(1) The film and substrate are widely selected, and the film thickness can be controlled to prepare functional films with various functions.
(2) The environment is clean and the film is not easy to be polluted. Therefore, the film with good density, high purity and uniform coating can be obtained.
(3) The bonding strength between the film and the substrate is good and the film is firm.
(4) The dry-type coating does not produce waste liquid or environmental pollution.
There are 10 chapters in "vacuum coating technology". This paper systematically expounds the basic ideas and basic theories of vacuum coating technology, various film preparation technologies, equipment and processes, vacuum winding coating technology, ITO conductive glass vacuum coating technology, especially introduces some new coating methods and technologies in recent years, such as reactive magnetron sputtering coating technology, intermediate frequency magnetron sputtering coating technology And unbalanced magnetron sputtering coating technology, etc. in addition, the monitoring and measurement of thin film deposition and thickness as well as the analysis and detection of surface and thin film are introduced in detail.
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