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Brief introduction of several vacuum coating equipment

Brief introduction of several vacuum coating equipment

2022-02-05

Brief introduction of several vacuum coating equipment







Vacuum Evaporation Coating Machine: Evaporation coating equipment is the first successfully developed coating equipment among all coating equipment in China. It has been successfully developed in China in the 1950s. There are many varieties of evaporation coating equipment, including optical coatings for coating optical films. The equipment is mainly used for optical equipment, laser equipment and microelectronic equipment, etc., as well as coil coating equipment made by the principle of evaporation coating, which is used in decoration, electronic equipment packaging and other industries.


Sputtering Coater: The ion target is sputtered and deposited on the substrate to form a thin film. The sputtering coating equipment can coat various thin films such as ITO conductive film, dielectric film, semiconductor film, metal film, magnetic film, high temperature superconducting film, single crystal film, decoration film, etc. , Disk film plating. Curtain wall glass film used in construction industry, capacitor film in electronic industry, solid smooth film in aerospace vehicle, solar cell in power, and gas, packaging, infrared technology and many other industries.


Ion coating machine: Ion coating equipment can be divided into arc ion coating, radio frequency discharge ion coating, hollow cathode ion plating, etc. Ion plating is determined by its coating principle to have fast accumulation speed, dense coating quality, and good film adhesion. . It is widely used in tools, molds and other industries, and can be plated with metal film, hard film, imitation gold film and so on.


Chemical vapor deposition equipment: Chemical vapor deposition equipment is a chemical reaction method to make films, which can be used to coat surface protective films and semiconductor and electronic materials.


Ion beam etching equipment: As an ultra-fine processing technology in the semiconductor industry, etching has become an indispensable and important equipment with the increase in the integration of large-scale integrated circuits. Compared with other chemical corrosion, plasma sputtering and other technologies, ion beam etching technology has no selectivity for processing materials, can perform ultra-fine processing, and can etch very fine grooves. The edge of the etched pattern is clear and the accuracy is high. . Ion beam etching equipment can be divided into vertical and horizontal types. The vacuum system of domestic equipment is mainly based on oil dispersion pump and water-cooled baffle, and foreign countries often use cryogenic pumping system.


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